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1. Applications of Plasma-Based Processes in Medicine Andranik Sarkissian
PLASMIONIQUE & INRS
2. Outline Introduction
Plasma-Based Processes
Plasma and Vacuum Based Processing Tools
Examples of Applications
3. Advances in Medical Field
4. Role of Plasma-Based Processes
5. How Biomaterials Field Benefits from Plasma Technology The Non-Equilibrium State of Plasma Allows Development of New Material Coatings Not available by Conventional Means
Charged particles Can Be Manipulated by External Fields in Order to Impart a predetermined energy on the Material surface thus influencing the film Characteristics
Highly Controlled deposition and removal rates
Higher kinetic energy of impinging particles on the surface allows reducing the process temperature
6. Plasma-Based Processes Implantation (1)
Sputtering (2)
Etching (3)
Deposition
Physical (4)
Chemical (5,6)
Others
Arc evaporation
e-beam
Laser ablation
7. Ion Implantation (conventional)
8. Ion Implantation (conventional) Plasma Created
Ions extracted from plasma
Ions accelerated to high energy
Ions Mass Separated Magnetically
Selected Ions Implanted
9. Ion Implantation (Plasma-Based) Plasma Created
Object Immersed in Vacuum
With Potential Distribution Grid
Without PDG
Plasma Created
Pulsed or CW
Object Biased to Negative Voltage
Pulsed or DC
10. Typical Applications of Ion Implantation Implantation of biocompatible atoms into the surfaces of non-biocompatible materials (e.g. carbon atoms into metallic components of heart valves)
Implantation of radioisotopes into ceramic and metallic prosthesis (for treatment of cancer or cardiovascular diseases)
Implantation of Oxygen, Nitrogen, Calcium and Phosphorous into Ti based prosthesis to improve the surface hardness
11. INRS Plasma-Based Ion Implantation System
12. Microwave Plasma Source
13. Experimental Characterization Operation Pressure 0.2 to 2 mTorr (Ar Plasma)
Pulsed Microwave Source 300 W peak Power
Different modes (high and low density)
Pressure Dependent
Parabolic Density profile
Peak density 4*1011 cm-3 (well above the cut off density) at absorption Zone
Peak Electron Temperature is about 9 eV
14. Nitriding Ti nitriding using plasma based implantation
XPS profilometry
Nanoindentation tests
Surface hardness Increased from 3.2 GPa to 5.8 GPa
15. Ni-Ti film Ni sputtered
Ni Deposited on Ti
Ni Implanted in Ti
Ar Ion Mixing
16. Microwave Plasma Sources Microwave Discharge
Remote Plasma (developed by Plasmionique)
Wide Operation Pressure range (5 mTorr to 5 Torr)
Modification of Polymer Films
Functionalization
Grafting
Deposition of Polymeric films
17. RF Plasma Source Developed by Plasmionique
18. Experimental Substrate cleaned with Ar plasma discharges
Substratre to plasma distance of 17 cm
Pressure in the chamber 30 mtorr
Active Gas +Argon Gas
RF Power 600 W
Active cooling -> Substrate temperature 15 C
Deposition Rate is 300 Å/min
Hard Films deposited (Si, Al, Ti)
Were Stable (after 4 months exposed to atmosphere)
Hardness > 20 GPa
19. Magnetron Sputter Deposition DC or RF Biasing
Deposition of metal and dielectric materials
Higher particle energy
Improved adhesion
20. Parylene Coatings Parylene is the generic name for poly-para-xylylene, a completely linear, highly crystalline material
Vapor Deposition in Vacuum (conformal coating)
Excellent Dielectric (> 5000 V/mil)
Excellent Strength (Yield & Tensile strength > 8000 psi)
Highly stable (Insoluble in most Solvents)
Biocompatible
Water absorption (<0.1% in 24hrs)
21. Parylene Deposition Process
22. Applications Coating of Biomedical Implants
Pacemakers
Defibrillators
Medical Devices
Forming Mandrels,
Catheters and Guide Wires
Sensors and Transducers
Stents
Probes and Electrodes
etc
23. Summary Plasma Based Processes have become one of the most important elements that contributes to the rapid advancement of medical technologies.
They contribute to both manufacturing and surface treatment of Implantable Medical devices, prosthesis and their delivery tools.
24. Thank you for your Attention