170 likes | 315 Views
Effect of 25ns, 50ns & 75ns Beam Bunch Spacing upon MKDV Kickers: MD August 12 th to 14 th , 2008. M.J. BARNES, AB/BT Also on behalf of V. Senaj & L. Ducimetière. II. When the beam cannot be extracted: dumping of the beam using the MKD beam dump system (MD, emergencies...)
E N D
Effect of 25ns, 50ns & 75ns Beam Bunch Spacing upon MKDV Kickers: MD August 12th to 14th, 2008 M.J. BARNES, AB/BT Also on behalf of V. Senaj & L. Ducimetière APC: October 3, 2008
II. • When the beam cannot be extracted: dumping of the beam using the MKD beam dump system (MD, emergencies...) • Function of the kicker magnets: • Sweep the beam to distribute the beam energy over a large volume of the absorbed block. MKDH1: V=56mm, H=96mm MKDH2: V=56mm, H=83mm MKDH3: V=60mm, H=105mm H (hap) V (vap) V (hap) MKDV1: V=56mm, H=75mm, 5cells each ~51cm MKDV2: V=56mm, H=83mm, 5cells each ~51cm H (vap) Principle of Beam Dumping APC: October 3, 2008
Normally: MKDV1 temperature>MKDV2 and pressure < 6e-8 mbar (as per 25ns beam); For 75ns beam MKDV2 temperature > MKDV1 and pressure < 6e-8 mbar; For 50ns beam MKDV temperature is not an issue, but pressure is an issue!. 8s resolution for pressure. See slides 6, 7 & 8 MKDV Temperature & Pressure on 12, 13 & 14th August 2008 8s resolution APC: October 3, 2008
1 cell MKDV • No measures taken to reduce beam coupling impedance to ferrite; • No transition pieces, between magnet tank and magnet frame, installed in LSS1 (now installed in spare MKDV1 magnet) ~16cm gap at each end. MKE magnet: APC: October 3, 2008
Courtesy of Giulia Papotti: All bunch spacing hit: ~440.6MHz and ~480.7MHz ZRL 25ns bunch spacing. ~40.05MHz spacing of lines 50ns bunch spacing. ~20.03MHz spacing of lines Also hits: 420.6MHz and 460.6MHz ZRL 75ns bunch spacing. ~13.5MHz spacing of lines Also hits: 334.0MHz and 387.1MHz ZRL Amplitude is already low at 500MHz. MKDV: Longitudinal Impedance • Longitudinal Impedance (ZRL) Theoretical Calculation: CERN-SL-2000-04 AP, by H. Tsutsui, pp7-10. • MKDV1 theoretical ZRL fits baseline of measurement reasonably well. • Cell length of 51cm (λ/4) resonance, for open circuit, of 147MHz (assuming μr & εr of 1). • “Spikes” may also be due to lack of transition pieces?? 11.5MHz APC: October 3, 2008
Single shot of 4 batches of 50ns beam at 2:05hrs: interlock. Information from: Giulia Papotti: Started 1 batch 50ns beam at 1:32hrs, continuously. One shot of 2 batches of 50ns beam at 1:42hrs. One shot of 3 batches of 50ns beam at 1:43hrs: interlock. MKDV Pressure on 14/08/2008, between 01:20hrs & 02:10hrs. 1s resolution Summary: 50ns beam causes pressure rise; high pressure with 3 or 4 batches per shot. APC: October 3, 2008
Summary: 50ns beam causes pressure rise; high pressure with 3 or 4 batches per shot. See next slide One batch per shot of 50ns beam from 6:05hrs to 7:00hrs. Information from: Giulia Papotti: Started 1 batch 50ns beam at 5:13hrs. One shot of 3 batches of 50ns beam at 5:39hrs. Four shots of 4 batches of 50ns beam at 5:41hrs: interlock. Four shots of 4 batches of 50ns beam at 5:45hrs. Two shots of 4 batches of 50ns beam at 5:49hrs. MKDV Pressure on 14/08/2008, between 05:00hrs & 07:00hrs. 1s resolution APC: October 3, 2008
MKDV Pressure on 14/08/2008, between 05:49hrs & 05:50hrs. Limited (1s) resolution for pressure; May miss peaks on graph (interlock requires few 10’s of ms); Fast pressure rise and fall due to surface effect (e.g. electron cloud), or gauge misreading?? Two shots of 4 batches of 50ns beam at 5:49hrs?? APC: October 3, 2008
47MHz Misc. Longitudinal Impedance (Note: impedance data in following plot is scaled according to length of tank rather than magnet length; therefore actual impedance per metre is larger than shown in plot) • Apertures (hap x vap): • MKE-L: 147.7 x 35mm; • MKE-S: 135 x 32mm; • MKI: 54 x 54mm; • MKDV1: 56 x 75mm. Cell Length: • MKE: ~24cm; • MKDV1: ~51cm. For MKE: • Is frequency of onset of spikes dependent upon aperture size? e.g. (MKE-L9 & MKE-S3) ; • Serigraphy generally eliminates spikes up to and beyond 500MHz. MKE: no stripes MKE (S6): stripes on 2 of 7 cells MKE (L10): stripes on all cells MKI: no screen MKDV1: no beam screen or transition pieces. Spikes due to cell length ??? MKI: 15 screen conductors APC: October 3, 2008
3 batches, 50ns 4 batches, 50ns 3 batches, 50ns 4 batches, 50ns 50ns beam 50ns beam 50ns beam 50ns beam 75ns beam 75ns beam 4x4 batches, 50ns 4x4 batches, 50ns 4x4 batches, 50ns 4x4 batches, 50ns MKDV1: hap=56mm, vap=75mm MKDV2: hap=56mm, vap=83mm MKE1: hap=147.7mm, vap=35mm MKE2: hap=147.7mm, vap=35mm MKE3: hap=135mm, vap=32mm No transition pieces Ferrite Transition pieces Ferrite 3 batches, 50ns 4 batches, 50ns 3 batches, 50ns 4 batches, 50ns 75ns beam 75ns beam MKDH1: hap=96mm, vap=56mm MKDH2: hap=96mm, vap=56mm MKDH3: hap=105mm, vap=60mm MKQH: hap=135mm, vap=33.9mm MKQV: hap=56mm, vap=102mm No transition pieces. 0.35mm laminated steel No temperature probes. MKQH less sensitive to 50ns & more sensitive to 75 bunch spacing…. No temperature probes. SPS Kickers: Vacuum, August 14, 2008 1s resolution APC: October 3, 2008
3 batches, 50ns 4 batches, 50ns MKE4 50ns beam 50ns beam 50ns beam 75ns beam 75ns beam 4x4 batches, 50ns 4x4 batches, 50ns 4x4 batches, 50ns 3 batches, 50ns 4 batches, 50ns MKDV1: hap=56mm, vap=75mm MKDV2: hap=56mm, vap=83mm MKE1: hap=147.7mm, vap=35mm MKE2: hap=147.7mm, vap=35mm MKE3: hap=135mm, vap=32mm MKE4: hap=135mm, vap=32mm MKE5: hap=147.7mm, vap=35mm No transition pieces Ferrite Transition pieces 4 batches, 50ns 75ns beam 3 batches, 50ns 12xMKP-S: hap=101mm, vap=61mm 4xMKP-L: hap=141mm, vap=54mm SPS Kickers: Vacuum, August 14, 2008 1s resolution APC: October 3, 2008
25ns beam MKE6 temp. not overly sensitive to 50ns or 75 bunch spacing. SPS Kickers: Temperature, August 12-14, 2008 MKDV: 75ns beam to 01:30hrs, 50ns beam 05:13 to 07:00 MKDV: 25ns beam 75ns beam 25ns beam 50ns beam MKE6: 75ns beam to 01:30hrs, 50ns beam 05:13 to 07:00 MKE6: 25ns beam 75ns beam 50ns beam MKE6 temperature rise limited by serigraphy. APC: October 3, 2008
MKP: 25ns beam MKP: 75ns beam to 01:30hrs, 50ns beam 05:13 to 07:00 25ns beam 75ns beam 50ns beam MKE4: 75ns beam to 01:30hrs, 50ns beam 05:13 to 07:00 MKE4: 25ns beam 75ns beam 50ns beam 25ns beam SPS Kickers: Temperature, August 12-14, 2008 MKP temperature probes both on one magnet. MKP temp. not overly sensitive to 50ns or 75 bunch spacing. MKE4 temp. not overly sensitive to 50ns or 75 bunch spacing. APC: October 3, 2008
Summary & Future Plans • “Spikes” on measured MKDV1 longitudinal impedance, which are not present in analytical calculation, are probably attributable to magnet cell length, aperture dimensions and absence of transition pieces. • An MKDV1 magnet is presently being HV conditioned (it has transition pieces). It is planned to make longitudinal impedance measurements on this magnet before installation (during the next shutdown); this will allow effect of transition pieces to be assessed. • Impedance resonances of MKDV2 (not measured) probably cause heating of ferrite with 75ns bunch spacing. • Shielding of MKE magnets eliminated high impedance resonances in longitudinal impedance and thus significantly reduces heating – possible long-term solution for MKDV1 ?? (MKDV2 no-spare exists, so difficult to modify). Could MKDV1 (H=75mm) be used in place of MKDV2 (H=83mm)?. But still see pressure rise with 50ns bunch spacing….. • 50ns bunch spacing causes immediate pressure rise (surface effect-e.g. electron cloud) for both MKDV1 & MKDV2 – but MKDV1 is more significant. • MKE6, MKDH, MKDH & MKQV kickers all show immediate pressure rise with 50ns bunch spacing ….. But MKQH sensitive to 75ns bunch spacing… • Further MD with 50ns beam to confirm, with 3 or 4 batches per shot, as cause of high pressure rise?; electron cloud investigations ????. • Log ion pump current? APC: October 3, 2008
Questions & Comments APC: October 3, 2008
MKDH3 Longitudinal Impedance Measurements MKDH3 no shielding or transition pieces. • No temperature Probes on MKDH magnets; • MKDH3 length=1.256m λ/4 resonance of ~60MHz; • Transverse impedance measurements planned for MKDH3. APC: October 3, 2008
Printed strips in MKE-L10 Interdigital comb structure 20mm spacing surface discharge MKE: Beam Coupling Impedance Reduction • Beam coupling impedance is reduced using conductive stripes (serigraphy), i.e. interleaved comb structure, directly printed onto the ferrite blocks and a reliable contact to the metallic HV plates at either side; • Capacitive coupling between stripes (stripes carry beam image current). APC: October 3, 2008