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Scanning Probe Lithography. Yongshik Park February 13 th , 2008 EE C235/NSE C203. Outline. Scanned Probe Oxidation Generating an Polymer “Resist” Layer using Scanning Probe Lithography High-Field Scanning Probe Lithography in Hexadecane Cons and Pros Conclusions. Scanned Probe Oxidation.
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Scanning Probe Lithography Yongshik Park February 13th, 2008 EE C235/NSE C203
Outline • Scanned Probe Oxidation • Generating an Polymer “Resist” Layer using Scanning Probe Lithography • High-Field Scanning Probe Lithography in Hexadecane • Cons and Pros • Conclusions
Scanned Probe Oxidation • Began at NIST in 1989 • Electrical bias between a conducting tip and a substrate induces a highly localized enhanced oxidation. • Typical line width: 10~20nm J. A. Dagata, Science, Vol. 270, 1995, pp1625-1626
Scanned Probe Oxidation- Applications Fabrication of single tunneling transistor(SET) Fabrication of Si nanowire J. A. Dagata, Science, Vol. 270, 1995, pp1625-1626
Generating an Etch Resistant “Resist” Layer from Common Solvents • An organic electrolyte replaces water to generate an organic resist. • Scan rate: 10um~20um Fluid Cell DC Bias Solvent vapor I. Suez, S. Backer, J. Frechet, Nano Letter, Vol. 5, No. 2, 2005, pp321-324
Generating an Etch Resistant “Resist” Layer from Common Solvents • The height of n-octane: 2.5nm (40% higher than the case of water) • After etching, the height of step: 8.5nm After etching After generating n-octane patterns I. Suez, S. Backer, J. Frechet, Nano Letter, Vol. 5, No. 2, 2005, pp321-324
High-Field Scanning Probe Lithography in Hexadecane - Hydrophobocity • Surface hydrophobocity determines the deposited material. • Hydrophilic SiO2 • Hydrophobic n-octane • Oxidation of the silicon surface occurs in the meniscus formed by the water dissolved in the fluid, with minimal effects on the reaction from the surrounding solvents I. Suez, M. Rolandi, S. Backer, A. Scholl, J. Frechet, Advanced Materials, Vol. 19, 2007, pp3570-3573
High-Field Scanning Probe Lithography in Hexadecane - Hydrophobocity • Etching makes trenches on hydrophilic surface and tall posts on hydrophobic surface. After deposition(black) After etching(red) On Hydrophilic surface On Hydrophobic surface I. Suez, M. Rolandi, S. Backer, A. Scholl, J. Frechet, Advanced Materials, Vol. 19, 2007, pp3570-3573
High-Field Scanning Probe Lithography in Hexadecane – PEEM analysis • Although there are only small differences in features of the local spectra, carbon content information was obtained • 1st and 2nd peak: C=C double bond • 3rd peak: hybridized carbon atoms Carbon signal PEEM AFM image PEEM analysis I. Suez, M. Rolandi, S. Backer, A. Scholl, J. Frechet, Advanced Materials, Vol. 19, 2007, pp3570-3573
Cons and Pros • Cons • Can make nano patterns without optical apparatus • Can control deposited material by hydrophobocity of the surface • Can make arbitrary patterns by controlling the trajectory of AFM tip • Pros • Low throughput: serial scan and low speed • Multiple tips • Small scan area
Conclusions • Scanning probe oxidation can make nanowire, SET, etc. • By using an organic solvent, the organic material can be deposited on the surface. • The hydrophobocity determines the deposited material • Hydrophilic surface SiO2 • Hydrophobic surface hydrocarbon • By PEEM analysis, the deposited material on the hydrophobic surface has carbon components.