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LCFI Status Report: Sensors for the ILC Konstantin Stefanov CCLRC Rutherford Appleton Laboratory ILC Vertex Detector Workshop, Ringberg 2006 Introduction Sensor Development for the ILC Column-Parallel CCDs In-situ Storage Image Sensors Summary and Plans.
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LCFI Status Report: Sensors for the ILC • Konstantin Stefanov • CCLRC Rutherford Appleton Laboratory • ILC Vertex Detector Workshop, Ringberg 2006 • Introduction • Sensor Development for the ILC • Column-Parallel CCDs • In-situ Storage Image Sensors • Summary and Plans
Introduction and Conceptual Design Beam bunch structure at ILC 337 ns 0.2 s 2820x 0.95 ms Multiple collisions 120 large sensors (e.g. CCDs) in 5 layers, 800 Mpixels (20 μm20 μm) Main vertex detector parameters: • Excellent point resolution (3.5 μm), pixel size =20 μm, close to IP • Low material budget ( ~ 0.1% X0 per layer), low power dissipation • Readout: • Avoids excessive event overlap, occupancy << 1% • Inner layer effectively read out at 50 μs intervals during the 1 ms pulse train (20 readouts) – information may leave the sensor or be stored in pixel • Outer layers read out at 250 μs intervals • Moderate radiation hardness: bulk damage from 61011 electrons/cm2/year and 109 neutrons/cm2/year, surface damage not expected to cause problems • Tolerates Electro-Magnetic Interference (EMI)
The Column Parallel CCD M M N N “Classic CCD” Readout time NM/fout Column Parallel CCD Readout time = N/fout • Main detector work at LCFI • Every column has its own amplifier and ADC – requires readout chip • Readout time shortened by orders of magnitude • All of the image area clocked, complicated by the large gate capacitance • Optimised for low voltage clocks to reduce power dissipation
CPC1 Bump-bonded to CPR1 Hybrid assembly with Column-Parallel CCD (CPCCD) and CMOS ASIC • CPC1 : Two phase CCD, 400 (V) 750 (H) pixels, 20 μm square; • CMOS readout chip (CPR1) designed by the Microelectronics Group at RAL: • 0.25 μm process • Charge and voltage amplifiers matching the outputs of CPC1 • Correlated double sampling • 5-bit flash ADCs and 132-deep FIFO per column • Everything on 20 μm pitch • Size : 6 mm 6.5 mm • Manufactured by IBM • Bump-bonded by VTT (Finland) using solder bumps Bump-bonded CPC1/CPR1 in a test PCB
CPC1/CPR1 Performance 5.9 keV X-ray hits, 1 MHz column-parallel readout Voltage outputs, non-inverting (negative signals) Noise 60 e- Charge outputs, inverting (positive signals) Noise 100 e- • First time e2V CCDs have been bump-bonded • High quality bumps, but assembly yield only 30% : mechanical damage during compression suspected • Differential non-linearity in ADCs (100 mV full scale) : addressed in CPR2 Bump bonds on CPC1 under microscope
Next Generation CPCCD Readout Chip – CPR2 Voltage and charge amplifiers 125 channels each Analogue test I/O Digital test I/O 5-bit flash ADCs on 20 μm pitch Cluster finding logic (22 kernel) Sparse readout circuitry FIFO Bump bond pads CPR1 CPR2 • CPR2 designed for CPC2 • Results from CPR1 taken into account • Numerous test features • Size : 6 mm 9.5 mm • 0.25 μm CMOS process (IBM) • Manufactured and delivered February 2005 Wire/Bump bond pads Steve Thomas, RAL
CPR2 Test Results Sparsified output Test clusters in • Parallel cluster finder with 22 kernel • Global threshold • Upon exceeding the threshold, 49 pixels around the cluster are flagged for readout • Tests on the cluster finder: works! • Several minor problems, but chip is usable • Design occupancy is 1% • Cluster separation studies: • Errors as the distance between the clusters decreases • Reveal dead time • Many of the findings have already been input into the CPR2A design Tim Woolliscroft, Liverpool U Tim Woolliscroft, Liverpool U
Next Generation CPCCD : CPC2 No connections this side Clock bus Charge injection Extra pads for clock monitoring and drive every 6.5 mm Image area Four 2-stage SF in adjacent columns Standard Field-enhanced Standard Temperature diode on CCD Four 1-stage and 2-stage SF in adjacent columns Main clock wire bonds Main clock wire bonds CPR1 CPR2 • Three different chip sizes with common design: • CPC2-70 : 92 mm 15 mm image area • CPC2-40 : 53 mm long • CPC2-10 : 13 mm long • Compatible with CPR1 and CPR2 • Two charge transport sections • Choice of epitaxial layers for different depletion depth: 100 .cm (25 μm thick) and 1.5 k.cm (50 μm thick) • Baseline design allows few MHz operation for the largest size CPC2
CPC2 + ISIS1 Wafer ISIS1 • 5” wafers • One CPC2-70 : 105 mm 17 mm total chip size • Two CPC2-40 per wafer • 6 CPC2-10 per wafer • 14 In-situ Storage Image Sensors (ISIS1) • 3 wafers delivered CPC2-70 CPC2-40 CPC2-10
CPC2-40 in MB4.0 Transformer CPR1/CPR2 pads Clock monitor pads Johan Fopma, Oxford U • Transformer drive for CPC2 • “Busline-free” CCD: the whole image area serves as a distributed busline • 50 MHz achievable with suitable driver in CPC2-10 and CPC2-40 (L1 device) • First clocking tests have been done
Transformer Drive for CPC2 • Requirements: 2 Vpk-pk at 50 MHz over 40 nF (half CPC2-40); • Planar air core transformers on 10-layer PCB, 1 cm square • Operation from 1 MHz to > 70 MHz unloaded; • Parasitic inductance of bond wires is a major effect – fully simulated; • Work on the reduction of the CCD capacitance and clock voltage is continuing – range of test devices under development. Brian Hawes, Oxford U • Transformer is bulky; • IC driver could be a better solution; • Design of the first CPCCD driver chip (CPD1) has started, goes for manufacture end of June • CPD1: 2-phase CMOS driver chip for 20 Amp current load at 25 MHz (L2-L5 CCDs) • 0.35 μm process, size 38 mm2
First Data from CPC2 • CPC2-10 (low speed version) works fine, here at 1 MHz clock • 55Fe spectrum at -40 C and 500 ms integration time • Noise is a bit too high, external electronics is suspected • Devices with double level metal (busline-free for high speed) are being manufactured now
Radiation Damage Effects in CCDs: Simulations Simulation at 50 MHz Operating window Signal density of trapped electrons in 2D • Full 2D simulation based on ISE-TCAD developed • Trapped signal electrons can be counted • CPU-intensive and time consuming • Simpler analytical model also used, compares well with the full simulation • Window of low Charge Transfer Inefficiency (CTI) between -40 C and 0 C • This is very important for the viability of the CCD optionand should be verified experimentally L. Dehimi, K. Bekhouche (Biskra U); G. Davies, C. Bowdery, A.Sopczak (Lancaster U)
In-situ Storage Image Sensor (ISIS) • Beam-related RF pickup is a concern for all sensors converting charge into voltage during the bunch train; • The In-situ Storage Image Sensor (ISIS) eliminates this source of EMI: • Charge collected under a photogate; • Charge is transferred to 20-pixel storage CCD in situ, 20 times during the 1 ms-long train; • Conversion to voltage and readout in the 200 ms-long quiet period after the train, RF pickup is avoided; • 1 MHz column-parallel readout is sufficient;
In-situ Storage Image Sensor (ISIS) 5 μm Global Photogate and Transfer gate ROW 1: CCD clocks • Additional ISIS advantages: • ~100 times more radiation hard than CCDs – less charge transfers • Easier to drive because of the low clock frequency: 20 kHz during capture, 1 MHz during readout • ISIS combines CCDs, active pixel transistors and edge electronics in one device: specialised process • Development and design of ISIS is more ambitious goal than CPCCD • “Proof of principle” device (ISIS1) designed and manufactured by e2V Technologies ROW 2: CCD clocks On-chip switches On-chip logic ROW 3: CCD clocks ROW 1: RSEL Global RG, RD, OD RG RD OD RSEL Column transistor
The ISIS1 Cell • 1616 array of ISIS cells with 5-pixel buried channel CCD storage register each; • Cell pitch 40 μm 160 μm, no edge logic (pure CCD process) • Chip size 6.5 mm 6.5 mm Output and reset transistors OG RG OD RSEL Column transistor OUT Photogate aperture (8 μm square) CCD (56.75 μm pixels)
Tests of ISIS1 Tests with 55Fe source • The top row and 2 side columns are not protected and collect diffusing charge • The bottom row is protected by the output circuitry • ISIS1 without p-well tested first and works OK • ISIS1 with p-well has very large transistor thresholds, permanently off
Conclusion and Plans • CPCCD program well advanced: • Main work at LCFI • Hybrid assembly with CPCCD and CMOS chips works OK • Detector-sized chips CPC2 have arrived, first tests have been done • Started to develop the challenging CPCCD drive system • ISIS work will continue: • First ISIS prototype on CCD technology manufactured, first tests promising • Next-generation small pixel ISIS (CCD- or CMOS-based) will be actively pursued Immediate plans: • Evaluate CPC2 and CPC2/CPR2 bump-bonded • High speed external drive to CPC2-40 as demonstrator for the L1 vertex detector Visit us at http://hepwww.rl.ac.uk/lcfi/