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Please create a cover sheet that contains the following info: Project/Investigation Title

Please create a cover sheet that contains the following info: Project/Investigation Title Presenter Name – Cohort ? Prior Degrees/Schools where conferred Current Degree Program (MS microEP or PhD microEP) Targeted Graduation Date Presenter’s Major Professor Committee Members

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Please create a cover sheet that contains the following info: Project/Investigation Title

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  1. Please create a cover sheet that contains the following info: • Project/Investigation Title • Presenter Name – Cohort ? • Prior Degrees/Schools where conferred • Current Degree Program (MS microEP or PhD microEP) • Targeted Graduation Date • Presenter’s Major Professor • Committee Members • Other support staff in research group • Post Docs • Other grad students • Undergraduates • Etc. Your Name (view header and footer)

  2. Spend one slide on a graphic showing the relationship between your work and other work in your research group. Think of this slide as the equivalent of a site map on a complex web site. • Be sure to indicate who the players are that are doing the other work. • Then spend the next slide or two using the TI format to describe your current biggest issues/challenges you are facing, current interesting/startling results, and a major task time line. Your Name (view header and footer)

  3. Enter Project/Investigation Title Here Facts: 1. Device Version A - Some broken poly occurred for pattern CDs in the x.xx – y.yy range. - Implant pattern process (broken poly affected by implant process variation). 2. Device Version B - Implant pattern process. - Nominal pattern increased by 10%. - No broken poly - Broken poly process margin down to 10% with current process. 3. Device Version C - Implant pattern process. - Nominal gate CD = z.zz - No broken poly observed at in-line inspection (n lots). Hypothesis: Poly is weakened by interaction of pattern with implant when CD < v.vv. Interaction does not occur with other patterning process. Methods: Eliminate interaction; determine root cause for this patterning process-induced weakening of poly. No Pattern Defect Design Version B Post Implant Pattern (Margin Confirmed) Pattern Defect Design Version A Poly Structure Post Implant Pattern Actions: Exposure Process Margin Study Team Complete Pattern Partition Tests Person A/Person B 02/04 - Pre/Post Implant Processing using old resist - Impact of Rinse Time (Normal +/- 75%) - Alternate Resist Chemistry Your Name (view header and footer)

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