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The nanoparticle-plasmon resonance for proteomics

The nanoparticle-plasmon resonance for proteomics. Bongsu, Jung Jaehun, Seol. Final Project, ME381R December 2 ,2004. Table of contents. Proteomics Motivation Particle surface plasmon resonance Fabrication method for nanostructure Nanosphere lithography

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The nanoparticle-plasmon resonance for proteomics

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  1. The nanoparticle-plasmon resonance for proteomics Bongsu, Jung Jaehun, Seol Final Project, ME381R December 2 ,2004

  2. Table of contents • Proteomics • Motivation • Particle surface plasmon resonance • Fabrication method for nanostructure • Nanosphere lithography • Ultraflat nanosphere lithography

  3. Proteomics • Completing DNA map is not sufficient to elucidate biological function • DNA or mRNA can’t encode the arrangement for cell signal pathway or a metabolic cascade • Poor correlation between protein and mRNA • Post-transcriptional regulation of gene expression problem

  4. Motivation :Why Surface Plasmon Resonance ?(as non-labeling method) • Current fluorescent labeling technique for proteomics is complicate and labor intensive job • Fluorescent labeling method gives interference and photobleaching to data • SPR is real-time, very sensitive, easy to use non-labeling technique for proteomics

  5. Metal Nanoparticles as Sensors Localized SPR: • localized: Localized oscillation of an electron density wave - Probing only a very thin layer around each particle - Each particle acts as its own sensor - High field enhancements at edges - Very easy detection (UV-Vis) • Problems with localized SPR: • • Size and shape have strong influence on the resonance • • Shape difficult to control above • 40 nm diameter • • Non-spherical particles difficult to preserve Dynamic depolarization from phase difference on larger particle Radiation damping correction Stationary depolarization

  6. Dipole vs quadrupole resonance J. Phys. Chem. B 2003, 107, 668-677 Dipole and quadrupole resonance is controlled by size of spheres J. Phys. Chem. B 2003, 107, 668-677

  7. Particle shape dependent LSPR JOURNAL OF CHEMICAL PHYSICS VOLUME 116, NUMBER 15, 2002, 6755-6759

  8. Strong field enhancement in non-spherical shape (a) (b) (c) DDA simulated electric field contours with for various shapes. (a) The innermost contour represents the grid boundaries of a 30nm sphere. The drop in intensity is from 50 to 1. (b) 2:1 spheroid has high field intensity to the high curvature periphery of the particle. The drop in intensity is from 125 to 1. (c) The truncated tetrahedron has high field intensity near the tip. The drop in intensity is from 500 to 1. Huge field enhancement at tip of triangle shape when compared to spherical shape Journal of cluster science Vol. 10, No2. 1999, 295-317

  9. Linear response to environmental changes J. Am. Chem. Soc. 2001, 123, 1471-1482

  10. Fabrication technique : Nanosphere Lithography Depositing method : • Spin-coating technique • Slow vertical withdrawal of a substrate technique • Tilting a substrate technique • Horizontal movement of a substrate

  11. Fabrication technique : Nanosphere Lithography Slow vertical withdrawal method Appl. Phys. Lett., Vol. 77, No. 17, 23 October 2000

  12. Fabrication technique : Nanosphere Lithography Horizontal movement method R, Humidity ratio T, temperature W, Width of cuvette S, Shape of meniscus C, Concentration ratio of liquid H, height of meniscus Substrate, glass Speed of horizontal movement

  13. Fabrication technique : Nanosphere Lithography Main principles for producing monolayer • Capillary force (Surface tension )due to meniscus formation • Convective flow due to water evaporation Water convective flow Particle convective flow Surface tension Water evaporation

  14. Fabrication technique : Nanosphere Lithography Monolayer masking principle for periodic pattern of nanostructure J. Vac. Sci. Technol. A, Vol. 13, No. 3, May/Jun 1995 J. Phys. Chem. B, Vol. 103, No. 19, 1999

  15. Fabrication technique : Ultraflat Nanosphere Lithography 1 2 3 4 5 6 7 Sphere deposition Metal M1 evaporation Sphere removal Metal M2 evaporation Low viscosity epoxy Mechanical support Dry lift-off Frey, W., Woods, C. K., Chilkoti, A.: Adv. Mat. 12 (20), 1515 (2000)

  16. Fabrication technique : Ultraflat Nanosphere Lithography Advantages of UNSL • Sharp corner and edges are well preserved • Only one side is exposed to surface • Various choices of substrate Conventional NSL UNSL J. Phys. Chem. B 2000, 104, 10549-10556 Adv. Mater. 2000, 12, No. 20, October 16

  17. Future applications Surface functionalization for proteomics or cancer detection Measuring & monitoring binding affinity, enzyme reaction or antibody Protein spotting SiO2 Target protein Gold glass light

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