Progress in Dielectric Science & Technology: A Retrospective/Prospective

1. Progress in Dielectric Science & Technology:A Retrospective/Prospective Dennis W. Hess School of Chemical Engineering Georgia Institute of Technology Atlanta, GA 30332-0100

2. Michael Faraday(1791 – 1867) • Coined the term “dielectric” in the mid 1800’s to indicate that something analogous to current flow occurs through a capacitor during the charging process • Was described, in the 1879 edition of Encyclopaedia Britannica, by the remark that Faraday is a “chemist, electrician, and philosopher” • Was offered BUT REFUSED • * Presidency of the Royal Society • * Presidency of the Royal Institution • * Knighthood • He explained: “I must remain plain Michael Faraday to the last; . . . if I accepted the honour which the Royal Society desires to confer upon me, I would not answer for the integrity of my intellect for a single year”

3. Dielectric Science & Technology DivisionBackground and History • Founded in 1945 as the ‘Electric Insulation Division’, primarily due to efforts of F. M. Clark at General Electric • * Offered interdisciplinary forum for discussions on electrical insulation as applied to power transmission, e.g., cables, transformers, and capacitors • * Until ~1960, symposia sponsored by EID involved • - electrophysics - electrical properties of plastics • - wet electrolytic capacitors - wires and cables • - inorganic & organic dielectrics - liquid dielectrics • - high temperature insulation - pre-fabricated circuitry • - chemical aspects of printed wiring

4. DS&T – Background and History • In the July, 1952 issue of Journal of The Electrochemical Society, Thomas D. Callinan, then Chair of the Electric Insulation Division, wrote that the Division was formed to: • “. . . promote the attainment and dissemination of knowledge of dielectrics, including the electrical, mechanical, and chemical properties of non-conductors of electricity. • He further remarked that the interest in this field was shifting from: • “. . . power transmission to intelligence transmission” • He further implied that the recent discovery of the transistor would have a major impact on the field of dielectrics!! • This comment has been a cornerstone of the Division’s development

5. DS&T – Background and History • Due to the changed emphasis of the Electric Insulation Division, a name change occurred in 1965, when the Division became the • Dielectrics and Insulation Division • * Symposia held between 1965 and 1988 include • - Anodic Oxide Dielectrics for Electrolytic Capacitors • - Silicon Nitride and Silicon Oxide Thin Insulating Films • - Thin Films for Electronic Applications • - Plasma Processing • - Chemical Vapor Deposition • - Multilevel Metallization • NOTE: Some of the above symposia were and continue to be sponsored jointly with the Electronics Division and/or the High Temperature Materials Division

6. DS&T – Background and History • Again, due to changes in the interests of our members, the D&I Division, underwent a name change in 1990, becoming the • Dielectric Science and Technology Division • * Symposia held since 1989 include • Diamond and Diamond-like Carbon Films • Corrosion and Reliability of Electronic Materials and Devices • Environmental Issues with Materials and Processes for IC Manufacture • Process Control, Diagnostics, and Modeling in Semiconductor Manufacture • III-V Nitride Materials and Devices - Rapid Thermal Processing • ULSI Science and Technology - Polymeric Materials for ICs • NOTE: Some of the above symposia have been co-sponsored with several other Divisions and with other professional societies

7. Application of an Electric Field to a Dielectric Produces a Displacement of Charge • Charge displacement occurs through a progressive orientation of both permanent and induced dipoles, termed polarization • Since all materials contain charges of one type or another, essentially every material can be broadly classified as a dielectric

8. Interactions Among Core Areas of DS&T

9. Electric Insulation Division Chairs 1945-1948 F. M. Clark, General Electric 1948-1951 J. F. Gall, Pennsylvania Salt Mfg. Co. 1951-1954 T. D. Callinan, General Electric 1954-1955 R. A. Ruscetta, General Electric 1955-1956 L. L. Deer, U.S. Naval Ordinance 1956-1957 D. A. Lupfer, General Electric 1957-1959 L. J. Frisco, Johns Hopkins University 1959-1961 A. T. Sherburne, General Electric 1961-1963 T. D. Callinan, General Electric 1963-1965 C. C. Houtz, AT&T Bell Laboratories

10. Dielectrics and Insulation Division Chairs 1965-1967 B. R. Eichbaum, AMP, Inc. 1967-1969 N. Schwartz, AT&T Bell Laboratories 1969-1970 E. M. DaSilva, IBM 1970-1971 D. M. Smyth, Sprague Electric 1971-1972 D. Gerstenberg, AT&T Bell Laboratories 1972-1973 L. V. Gregor, IBM 1973-1974 L. Mandelcorn, Westinghouse 1974-1976 B. H. Vromen, IBM 1976-1978 L. D. Locker, Solid State Sensors 1978-1980 R. G. Frieser, IBM 1980-1982 J. A. Amick, RCA 1982-1984 W. Kern, RCA 1984-1986 L. Rothman, IBM 1986-1988 R. Comizzoli, AT&T Bell Laboratories 1988-1990 J. P. Dismukes, Exxon

11. Dielectric Science & Technology Division Chairs 1990-1992 G. C. Schwartz, IBM 1992-1994 R. A. Susko, IBM 1994-1996 J. R. Susko, IBM 1996-1998 W. D. Brown, Univ. Arkansas 1998-2000 R. L. Opila, Lucent Technologies 2000-2002 R. A. Ulrich, Univ. Arkansas 2002-2004 C. R. Simpson, Motorola 2004-2006 J. Deen, McMaster University, Canada 2006-2008 K. Voros, UC Berkeley 2008-2010 D. Misra, NJ Institute of Technology

12. Thomas D. Callinan Award • Established in 1967 to honor Thomas D. Callinan who • * broadened the scope of dielectric science and technology in ECS • * twice served as Chair of the Division (1951-1954; 1961-1963) • The Purpose of the Award is to • “Encourage excellence in dielectrics and insulation investigations” • Recipients of the award have made contributions to dielectric science and technology in numerous applications and areas of interest to The Division and The Society

13. T. D. Callinan Award Recipients • - J. A. Davies; J. P. S. Pringle • 1970 - G. M. Sessler; J. E. West • 1971 – C. A. Mead • 1972 – W. Kern • 1973 – J. R. Szedon • 1975 – C. M. Osburn • 1976 – T. W. Hickmott • 1977 – J. R. Ligenza • 1978 – R. Williams • 1979 – R. J. Kriegler • 1982 – B. E. Deal • 1983 – L. Young 1985 – A. K. Sinha 1986 – A. C. Adams 1987 – S. P. Murarka 1988 – R. B. Commizzoli; E. A. Irene 1989 – R. A. Levy 1990 – M. H. Woods 1991 – V. J. Kapoor 1992 – S. I. Raider 1993 – D. W. Hess 1994 – Y.-H. Wong 2008 – P. Kohl

14. T. D. Callinan Award Recipients • 1995 – K. L. Mittal • 1996 – W. D. Brown • 1997 – J. P. Dismukes • 1998 – R. Singh • 1999 – A Rohatghi • - K. Saraswat • - P. Ho • - J. Deen • - S.K. Banerjee, A.G. Revesz • - S. Fonash

15. DS&T Lead Division Proceedings Volumes First Proceedings Volume in 1967: “Electrolytic Rectification and Conduction Mechanisms in Anodic Oxide Films” 1967 – 1975: 6 1976 - 1985: 15 1986 – 1995: 28 1996 – 2001: 40 Numerous other volumes have been published where DS&T is a co-organizer and co-sponsor.

16. Technical Presentations for DS&T Retrospective at the ECS Centennial Meeting – May 2002 Philadelphia, PA “MOSFET Device Scaling: A (Biased) History of Gate Stacks”, C. M. Osburn (N.C. State) and H. R. Huff (SEMATECH) “Thermal Silicon Dioxide – A Unique Dielectric in Semiconductor Technology”, B. E. Deal (Stanford)

17. Technical Presentations for DS&T Retrospective “Solid Electrolyte Capacitors”, D. M. Smyth (Lehigh) “Deposited Dielectrics and Associated Process Technologies for Device Metallization and Interconnection”, G. C. Schwartz (Retired) T. D. Callinan Award Address: “Electrical Characterization Techniques for Semiconductors and Semiconductor-Dielectric Interfaces – A Review”, M. J. Deen (McMaster)