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Glass substrate

Illumination. WO3(10nm)/Ag(14nm)/WO3(40nm). P3HT:PCBM. Oxide buffer layer(20nm). Metal contact(50nm). Glass substrate. 1.8eV. 1.8eV. 3.3eV. 3.7eV. WO 3. WO 3. 4.2eV. 4.26eV. 4.28eV. Al. Ag. Zn. P3HT: PCBM. 4.3eV. 4.7eV. ITO. 4.8eV. 4.8eV. 5.2eV. ZnO 2. 6.1eV. 7.5eV.

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Glass substrate

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  1. Illumination WO3(10nm)/Ag(14nm)/WO3(40nm) P3HT:PCBM Oxide buffer layer(20nm) Metal contact(50nm) Glass substrate

  2. 1.8eV 1.8eV 3.3eV 3.7eV WO3 WO3 4.2eV 4.26eV 4.28eV Al Ag Zn P3HT: PCBM 4.3eV 4.7eV ITO 4.8eV 4.8eV 5.2eV ZnO2 6.1eV 7.5eV

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