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Modeling The Deposit Thickness Distribution in Copper Electroplating of Semiconductor Wafer Interconnects

Modeling The Deposit Thickness Distribution in Copper Electroplating of Semiconductor Wafer Interconnects. Eugene Malyshev 1 , Uziel Landau 2 , and Sergey Chivilikhin 1 1 L-Chem, Inc Beachwood, OH 44122 and 2 Department of Chemical Engineering, Case Western Reserve University,

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Modeling The Deposit Thickness Distribution in Copper Electroplating of Semiconductor Wafer Interconnects