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Integration of amorphous silicon photodiodes to microfluidic scintillation detectors

Integration of amorphous silicon photodiodes to microfluidic scintillation detectors. Master Project Intermediate presentation – 03/07/14 Cindy Wiese. Pyrex. Photodiode. Reflective coating. Goal of the project. Silicon. Microchannels : Vertical sidewalls Tilted tips

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Integration of amorphous silicon photodiodes to microfluidic scintillation detectors

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  1. Integration of amorphoussilicon photodiodes to microfluidic scintillation detectors Master Project Intermediatepresentation – 03/07/14 Cindy Wiese

  2. Pyrex Photodiode Reflectivecoating Goal of the project Silicon • Microchannels: • Vertical sidewalls • Tiltedtips • Contains the liquidscintillator • Aluminium coating for light reflection • Photodiodes: • p-i-n structure (in reverse voltage) to optimizeelectronscollection in the depletion zone • Amorphoussilicon to avoid radiation damages

  3. Channelsroughness

  4. Notchingeffect • Channelslength = 5 mm

  5. Conclusion on roughnessimprovementprocesses • KOH etching + Wetox + BHF etching: • Improvemicroscopicroughness • KOH + IPA etching: • Improvemacroscopicroughness (smoothed profil, lownotching)

  6. Notchingeffect • 40% KOH etching

  7. Wafers inventory • Microfluidic tests:

  8. Wafers inventory • Scintillation detectors:

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