100 likes | 119 Views
Investigating factors restricting current density in HBTs due to thermal conductivity, Kirk effect, and electron charge deformation. Analyzing collector current spreading and effective electron velocity. Findings impact device performance and collector isolation methods.
E N D
Current Density Limits in InP DHBTs: Collector Current Spreading and Effective Electron Velocity Mattias Dahlström1 and Mark J.W. Rodwell Department of ECE University of California, Santa Barbara USA • Special thanks to: • Zach and Paidi for processing and development work • Now with IBM Microelectronics, Essex Junction, VT • This work was supported by the Office of Naval Research under contracts N00014-01-1-0024 and N0001-40-4-10071, and by DARPA under the TFAST program N66001-02-C-8080. mattias@us.ibm.com 802-769-4228
Introduction What limits the current density in a HBT? • Heating • High thermal conductivity InP ☺ • Low thermal conductivity InGaAs • Low Vce☺ • Kirk effect • Injected electron charge in collector deforms the conduction band current blocking • thin the collector, increase collector doping
Collector in HBT under current (simulation)and measured effects on ft and Ccb High current Current blocking and base push-out effects ft and Ccb – the Kirk effect At some current density Jkirk device performance will degrade due to the Kirk effect
Observation: The Kirk current density Jkirk depends on the emitter width Jkirk extracted from ft and Ccb vs Je, extracted from S-parameter measurements at 5-40 GHz Collector current spreads laterally in the collector
Extraction of the current spreading distance D Poisson’s equation for the collector Poissons equation for the composite collector: Plot Ikirk/L vs. emitter junction width Web D=0.14 mm for Tc=150 nm D=0.19 mm for Tc=217 nm Current spreading important as emitter width We scales to D ! Jkirk will be much higher ! Sources of error: Coarse Ic Ohmic losses reduces Jkirk by max 4 % Device heating not important - low Vcb Averaged data points
Collector velocity extraction from Vcb ∂Jkirk/∂Vcb provides effective electron velocity! There is no evidence of velocity modulation Tc=150 nm: vsat= 3.2 105 - 3.9 105 m/s Tc=217 nm: vsat=2.3 105 - 3.2 105m/s Method requires D and veff to be constants with regards to Vcb over measured interval Linearity of fit indicates this is correct But how can veff be constant with regards to Vcb? G-L scattering should lead to velocity modulation!
Why is there no Vcb dependence on veff? G-L scattering occurs when electrons in the G band scatters to the slower L band veff reduced Larger Vcb G-L scattering closer to the bc interface veff reduced Simulated @Je<Jkirk Vcb changes Je fixed veff is extracted at the Kirk current condition near flat-band at bc interface G-L scattering removed from bc interface minimum Vcb influence on veff Simulated @Je= Jkirk Vcb changes Je= Jkirk(Vcb)
Mesa DHBT with 0.6 mm emitter width, 0.5 mm base contact width Typical layer composition Z. Griffith, M Dahlström DHBT-19 with 150 nm collector
Device results at high current density higher than original Kirk current threshold Low-current breakdown is > 6 Volts this has little bearing on circuit design Safe operating area is > 10 mW/um2 these HBTs can be biased ....at ECL voltages ...while carrying the high current densities needed for high speed Tc=150 nm
Conclusions • Current spreading 0.14 mm for Tc=150 nm 0.19 mm for Tc=217 nm (first experimental determination for InP) • veff=3.2∙105 m/s for both 150 and 217 nm Tc • Large effect on max collector current for sub-m InP HBTs. Jkirk increases drastically • Must be accounted for in collector isolation by implant or regrowth (provide room for current spreading)