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Lecture 11 Hybrid POSS. Class 2A Covalent links at molecular level. Basic Polysilsesquioxane precursors. Class 2: POSS attached covalently to linear polymers. Dental resins, adhesives, oxidation resistant polymers. POSS: The T 7 (OH) 3 can be used to make a new monomer.
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Lecture 11 Hybrid POSS Class 2A Covalent links at molecular level
Class 2: POSS attached covalently to linear polymers Dental resins, adhesives, oxidation resistant polymers
POSS: The T7(OH)3 can be used to make a new monomer. The polymer will form due to chemistry in the organic component only
POSS as a Nanoscale Filler & Modifier for Polymers Higher Tg Improvements in Strength Oxidation Resistance Wear from abrasion Hybrid Plastics
Example of POSS modified polystyrene Tg 116 °C, Td 383 °C R = cyclohexyl = soluble in THF R = cyclopentyl = insoluble R = cyclohexyl: Tg 396 °C, Td 445 °C
P-methyl styrene-POSS Styrene Random copolymer TEM images of PS–POSS copolymers: (a) 6 and (b) 30 wt% i-Bu POSS. The samples were stained by RuO4 vapor at ambient condition.
Phase segregated block copolymer • Phase segregates with > 10% POSS monomer •Dark phase in TEM is due to silicon in POSS MRS Symp. Proceedings 2000, 628, CC2.6.1–CC2.6.7
Phase segregated triblock copolymer Polymer 2003, 44, 2739–2750
Fullerenes covalently incorporated into polymers (Class 2A) Prog. Polym. Sci. 29 (2004) 1079–1141
First polymer known was Friedel Craft polymerization of C60 in 1991 JACS 1991, G. Olah
Second polymerization was copolymerization with paraxylene Loy, JACS, 1992
Fullerenes will polymerize photochemically Highly crosslinked. Insoluble powders
Fullerenes will polymerize thermally by step addition, free radical polymerization
Tg went from 97 °C to 163 °C Macromolecules 1994,27, 4836-4837