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Integrated Circuit Design. R. Kluit Electronics Department Nikhef, Amsterdam. 19/12/2008. IC design @Nikhef, R. Kluit. 2. ASIC application’s. 2004. 2 IC’s: 0.25 µ CMOS 3 prototypes 9/2000 => prod 3/2004 1400 PCB’s, 1000+4500 IC’s (prod. $43k)
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Integrated Circuit Design R. Kluit Electronics Department Nikhef, Amsterdam.
19/12/2008 IC design @Nikhef, R. Kluit 2
ASIC application’s 2004 • 2 IC’s: 0.25µ CMOS • 3 prototypes • 9/2000 => prod 3/2004 • 1400 PCB’s, 1000+4500 IC’s (prod. $43k) • Chip-on-board;cleaning & bonding @ Nikhef • ++ Radiation & Area V. Gromov, P. Timmer, J-D Schipper, R. Kluit 19/12/2008 IC design @Nikhef, R. Kluit 3
Most recent Designs • Design in Collaborations: • Si-strip detector front-end (0.25µm)Analog readout & Comparator • Contribution to new ATLAS Pixel FE chip • Design Internal: • IC’s for ALICE (0.25µm) • Bandgap reference (130nm) • GOSSIP frontend prototype’s (130nm) • Km3Net PMT front-end (0.35µm) 19/12/2008 IC design @Nikhef, R. Kluit 4
CMOS IC technology • Design issues: • RregVt, 0Vt, HighVt, LowVt transistors • Radiation tolerance (design) • Technology Design rules • Process variations & matching • ESD • Rules for Manufacturability Bulk CMOS 19/12/2008 IC design @Nikhef, R. Kluit 5
radiation tolerant ! ???? Bulk CMOS SOI Strained silicon Vdd 1.8-2.5V Vdd 1.2-1.5V Vdd 1-1.2V Vdd 1V Vdd 0.9-1V 6 Al 6 Cu 7 Cu 8 Cu 9 Cu Present Technologies feature size:Mass prod. start: Power & gate density scale relative to feature size scaling (x0.7). Vsupply Nr. metal layers 19/12/2008 IC design @Nikhef, R. Kluit 6
“Features” of new Techn. • Random Dopant Fluctuations (RDF):@45nm; ~100 atoms channel length, 1000 dopants in channel • Variations in strain & Gate oxide thickness (~ 5 atoms @45nm) • Line Edge effects: R of connectivity • Solutions in Foundry & Design techniques;Global process variations of 45nm improved w.r.t. 90nm & 65nm ! 19/12/2008 IC design @Nikhef, R. Kluit 7
Design Tools • Euro Practice Cadence platform: • Cadence:design entry & layout + analog & digital simulation. • Assura: Simulation & Verification • Mentor: Calibre for DRC & extraction (Ver.) • Synopsys: Logic Simulation, Digital Synthesis, Clock tree generation, Place & Route. • Software via Educational programs; affordable (€) BUT maintenance ¼ fte. 19/12/2008 IC design @Nikhef, R. Kluit 8
ET Design expertise • Technologies: • Commercial CMOS • AMS 0.35µ:Design-Kit + Lib. • IBM 0.25µPDK + Lib. • IBM 0.13µ:PDK + Arm/IBM Lib. • People & Expertise : • (Electronics department) • 2+2 Designers have the skills for IC design. • Analog front-ends; device level circuit design • Digital design; control blocks & architectureVerilog => synthesis => routing. 19/12/2008 IC design @Nikhef, R. Kluit 9
Present Technologies (2) ~0.7 ~0.7-2 ~0.72 ~0.7-2 • Transition to SOI, Vdd to ~1V • Radiation tolerance: increasing up to 90nm. Beyond ??? 19/12/2008 IC design @Nikhef, R. Kluit 10