350 likes | 2.35k Views
Arc Higher Temperature Lower interelement interference Single set of excitation conditions can excite multiple elements Permit low detection limits for refractory complexes Larger linear range Can directly measure hard to measure samples. Flame Simpler, less expensive instrumentation
E N D
Arc Higher Temperature Lower interelement interference Single set of excitation conditions can excite multiple elements Permit low detection limits for refractory complexes Larger linear range Can directly measure hard to measure samples Flame Simpler, less expensive instrumentation Lower operating costs Greater reproducibility Emission Spectroscopy Based upon Plasma, Arc, and Spark Atomization
Emission Spectroscopies Cont. • Plasma (def.) Electrically conducting gaseous mixture containing significant concentrations of cations and electrons • ICP and DCP
Inductively Coupled Plasma • Inductively coupled means that the plasma is generated due to differences in the magnetic field and currents • Temp. very hot (4000-8000K) • Good & bad
Direct Current Plasma (DCP) • Plasma forms by bringing graphite and W electrodes in contact with one another • Temp @ core 10,000K in viewing region 5000K
DCP is an order of magnitude less sensitive than ICP Similar reproducibilities DCP requires less Ar Auxillary power less expensive in DCP Graphite electrode must be replaced every couple of hours ICP DCP Comparison
Comparison of Plasma to Flame Emission Sources • Plasma sources offer significantly better quantitative data than do other flame emission sources - High stability - Low noise - Low background - Freedom from interferences