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NSLS-II Hard X-ray Nanoprobe Beamline. Yong Chu Experimental Facilities Division, NSLS-II Experimental Facilities Advisory Committee Meeting April 23-24, 2009. HXN Team. HXN beamline Group Leader: Yong Chu (Joined Jan, 2009). Beamline Scientist: finalizing the interview process
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NSLS-II Hard X-ray NanoprobeBeamline Yong Chu Experimental Facilities Division, NSLS-II Experimental Facilities Advisory Committee Meeting April 23-24, 2009
HXN Team HXN beamline Group Leader: Yong Chu (Joined Jan, 2009). Beamline Scientist: finalizing the interview process Ken Evans-Lutterodt (MOU Staff, Kinoform, lead initial HXN effort) Nanopositioning R&D Engineer & Postdoc Interviewing 1 nm R&D Hanfei Yan (MLL theory, optics testing) Enju Lima (coherent phase retrieval, optics testing) Ray Conley (MLL fabrication, metrology) Nathalie Bouet (postdoc, MLL processing) James Biancarosa (technician, MLL fabrication)
Scientific Mission for HXN Beamline To enable hard x–ray microscopy experiments with spatial resolution down to 1nm. • expected scientific impact areas: • Materials science • Environmental science • Biology • Nano-catalysis energy range being considered: 5~30 keV
Techniques Considered for the HXN • X-ray Fluorescence • Nanodiffraction/Scattering • Coherent Diffraction Imaging (small angle & Bragg) • Transmission Imaging (absorption/phase contrast) • Spectroscopy (XAS) • Import Considerations: • Mutual compatibility among the supported techniques • Radiation damage • Retaining substantial scientific advantage over other techniques • (i.e EM, SPM, atom probe)
X-ray Microscopy at 1-10nm d NA D R f R =1 nm R =5 nm R =10 nm • NA=62 mrad • = 32 nm f = 1 mm NA=12.4 mrad d = 0.806 um f = 5 mm NA=6.2 mrad d = 3.2 um f = 10 mm 10 keV w/ D=124 um NA=31 mrad d = 64 nm f = 2 mm NA=6.2 mrad d = 1.6 um f = 10 mm NA=3.1 mrad d = 6.4 um f = 20 mm 20 keV w/ D=124 um
Technical Challenges • Focusing optics - fabrication of large (>100 mm), wedged MLLs - thin MLLs for x-ray energies at 10 keV or lower - bonding two MLLs into a monolitic optic - MLLs are extremely chromatic • X-ray Microscope - sub-nanometer positioning and scanning - sub-nanometer stability - small working distance ( < 1 mm) - integrated XRF detector with maximum solid angle - implementation of in situ controls or sample environments • End-Station - vibration, temperature, air-flow, acoustic management • Beamline optics - large coherence length at focusing optics - angular stability of 1 mrad or better - preservation of uniform wave front
Key Considerations for the HXN Beamline Effective Vibration Control
Vibration Properties NSLS-II Site and Satellite Building Brookhaven Ave. Local vibration sources in yellow Curtsey Nick Simos Railroad St. Considerable efforts have been made to measure and simulate the vibration properties of the NSLS-II site and the various building structures
Plans for the HXN Satellite Building and Hutch“Guided by EM Practices” • Thick (~1 M) concrete slab under instrument floor • “House-in-house” concept • Vibration, temperature, air flow and acoustic management • Air interlock for hutch entry • Concrete hutch • Concrete beam transport enclosure • Water-cooled instrument cabinets SÅMM at ANL
Key Considerations for the HXN Beamline Phase-Space Management and Beam Stability
Available Phase Space Diffraction Limit: S · 2q = 0.441l, for FWHM of Gaussian distribution Vertical Direction: Horizontal Direction: x’ x ~ 2 Coherent Modes ~ 53 Coherent Modes SV=8.5 um 2qV = 6.4 urad at z=100 M, lcoh = 640 um SH=75 um 2qH = 0.73 urad At z=100 M, lcoh = 73 um • Need a smaller horizontal source size. • Need to “save” flux in the vertical direction.
Conceptual Beamline Design (Initial Phase) HMONO HFM HHRM Horizontal Horiz. Coh. Len. at 10 keV 80 um (SHSA open) 300 um (SHSA=10mm) FWHM, 10 keV SV = 75 um 2qV = 38.5 urad SHSA storage shield wall 2:1 focusing 100 M 80 M 60 M 40 M 20 M 0 M Vertical Slits Kinoform or CRL FWHM, 10 keV SV = 8.5 um 2qV = 12.6 urad SHSA: Secondary horizontal source aperture HFM: Horizontal focusing mirror HMONO: Horizontal Mono HHRM: Horizontal harmonic-rejection mirror lcoh
Conceptual Beamline Design (Mature Phase) HMONO HFM HHRM Horizontal FWHM, 10 keV SV = 75 um 2qV = 38.5 urad SHSA storage shield wall 100 M 80 M 60 M 40 M 20 M 0 M Vertical VHRM Slits Kinoform or CRL FWHM, 10 keV SV = 8.5 um 2qV = 12.6 urad SHSA: Secondary horizontal source aperture HFM: Horizontal focusing mirror HMONO: Horizontal Mono HHRM: Horizontal harmonic-rejection mirror HRVM: Vertical High-resolution Mono lcoh
Major Beamline Components Z=25.5 M IVU20 Undulator Z=27.4 M Defining Aperture & Absorber Z=28.7 M Shutter Z=30.0 M White Beam Slits Storage Ring Shield Wall Z=45.0 M Horizontal Harmonic-rejection Mirror Z=97 M Z=100 M Horizontal Si(111) DCM, Cryo-cooled Horizontal Focusing Mirror Secondary Horizontal Source Aperture Vertical High-resolution Mono (For Mature Phase)
HXN Beamline Layout Z=100 M Monochromatic Hutch First Optics Enclosure Satellite Building & End-Station Beam Transport Tunnel
Sensitivity to Single Atom XRF Undulator: IVU20 Brightness: 8x1020 at 10 keV 9x1019 at 20 keV Coh. Flux: 2x1011 at 10 keV 6x109 at 20 keV 10 keV incident energy Zn Ni Fe Cr Ti • Assuming • 50% efficiency for beamline optics • 25% utilization of available • coherent phase space • 20% efficiency for 1nm MLL • 0.8p detector solid angle • matched monochromaticity of Si(111) • expected flux density over 1nm2: • 1.2x109 at 10 keV • 3.4x107 at 20 keV Ca Zr Sr Kr Se Ge 20 keV incident energy
Outlook for Next 6 months… • Completion of the conceptual design. • Completion of the heat load calculation on beamline optics. • Completion of comprehensive cost estimates. • Begin nanopositioning R&D as a first step toward building a HXN prototype