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Current Issues & Understandings for Magnetic Semiconductors. Kwang Joo Kim Department of Physics, Konkuk University, Seoul, Korea. History of Ferromagnetism in Semiconductors. 1960’s : recognition of spin-related phenomena due to existence of
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Current Issues & Understandings for Magnetic Semiconductors Kwang Joo Kim Department of Physics, Konkuk University, Seoul, Korea
History of Ferromagnetism in Semiconductors • 1960’s : recognition of spin-related phenomena due to existence of • ferromagnetism (강자성) in semiconductors (at low temp.) • (2) 1980’s : research on magneto-resistance, magneto-optics etc. on • ferromagnetic semiconductors (FM) with low Curie temperature (TC) • (3) 2000’s : discovery of FMs with high TC > 100 K (e.g., Ga1-xMnxAs) stimulated • research on materials & devices that can manipulate both charge & • spin – spintronics • * Device requirement to overcome existing MOSFET technology • - 4 Gbit DRAM (54 nm gate length & access time < 0.1 ns) using Si technology • - Spintronics device may operate by supplying smaller amount of • current (which should be spin-polarized) than existing ones • - Possible to achieve higher speed, lower power consumption, • higher integration density by using concept of spintronics (?)
Field-Effect Transistor • * Possible candidates of electrodes (source & drain) for spintronics • - Ferromagnetic metals (e.g., NiFe) • good: abundant carriersweak: shottky-barrier formation, spin relaxation • - Conventional semiconductors (e.g., Si, GaAs with ferromagnetism) • good: developed technology weak: low Curie temperature (TC 200 K) • - Oxide compounds (e.g., Fe3O4 (ferrimagnetic), ZnO ) • good: chemical stability weak: underdeveloped technology
* Magnetic semiconductors (ordered compounds) – EuSe, EuO (NaCl); CdCr2S4, CdCr2Se4 (spinel) with TC 100 K – (La,Sr)MnO3 (perovskite) with TC 350 K – Fe3O4with TC 800 K (called half-metal, but behave like semiconductor) : difficult to be compatible with conventional semiconductors (IV, III- V, II-VI) for electronic device applications
* Diluted magnetic semiconductors – IV, III-V, II-VI semiconductors doped by magnetic elements, e.g., 3d transition metal (TM) : Ga1-xMnxAs, Cd1-xMnxTe, Si1-xMnx with rather low TC 200 K for device applications (narrow band gap) – Oxide semiconductors doped by magnetic elements, e.g., TM-doped ZnO, SnO2, TiO2, In2O3 with TC above room temperature (wide band gap) – Ga1-xMnxN, Si1-xFexC, : TC above room temp. (wide band gap)
Nonmagnetic Compound Semiconductor Ferromagnetic Semiconductor Diluted Magnetic Semiconductor Magnetic Hysteresis
Methods for checking ferromagnetism M-H (at 300K by VSM) M-T (by SQUID) SiC:Fe (3C, Eg = 2.4 eV) TC ~ 300K
In DMS, TM ions substitute cationic sites and so created charge carriers mediate ferromagnetic alignment of magnetic TM ions. * Can the ferromagnetism be properly explained theoretically (based on electronic structure)? * Any distinct properties of carriers in ferromagnetic regime (e.g., mobile or localized (magnetic polaron))? * Can DMSs properly supply spin-polarized current in wide temperature range?
Energy Energy Down spin Up spin Down spin Up spin EF EF H Solid-soluted magnetic ion E Cationic site Electron path Electron Conceptual electronic structure Extrinsic origin Intrinsic origin Spin-polarized Conduction band Magnetic cluster
Theoretical background for diluted ferromagnetism * RKKY (Ruderman-Kittel-Kasuya-Yosida) interaction (a) indirect exchange coupling of local magnetic moments via carriers (conduction electron or hole) (b) hybridization (such as s-d & p-d) bet. carrier and local ion is important * Effective Hamiltonian kF, J0: Fermi wavevector & overlap integral (related to electronic structure)
Theoretical predictions by Dietl et al., Science 287, 1019 (2000) (1) Strong dependence of Curie temperature on magnetic impurity density & hole density (2) For same hole density, smaller spin-orbit splitting (of valence bands) leads to higher TC – leads to preference of light elements (also with stronger p-d hybridization) (3) Formation of magnetic polaron helps maintain ferromagnetism * Calculated for 5% Mn and hole density p = 3.5 X 1020 cm-3 * Predicted TC > 300 K for GaAs with Mn density of 10% : never achieved (TC ~ 170 K) * Predictions for GaN & ZnO are good (but no p-type ZnO tested) * For Si, TC ~ 130 K predicted but for some exp. TC > 300 K defect control is important
Expected spin-polarized electronic structure of Zn1-xTMxO * Formation of spin-split donor band * Under molecular-field approx. TC [S(S+1)x]1/2Jsd for x < 0.17 S: ionic spin Jsd: exchange int. bet. IB & 3d stronger for more hybridization Room-temp. measurements by Venkatesan et al, PRL 93, 177206 (2004) Ti3+(d1) Mn2+(d5) Co2+(d7) * No clear explanation on relation between magnetism & conductivity (carrier transport) * DMS properties have been observed for some later reports on ZnMnO important to understand defect-related properties
Isolated polaron Trapped electron vacancy Antiferromagnetic pair Magnetic impurity ion Magnetic impurity ion Isolated ion F-center Overlapping polarons Magnetic polaron model [Coey et al., Nat. Mater. 4, 173 (2005)] * Polaron formation is known to be efficient in TiO2. -Rutile: small polaron (larger ) s ~ 100, m* ~ 20me, aH = 0.26 nm -Anatase: large polaron (smaller ) s ~ 31, m* ~ me, aH = 1.6 nm
Hole Magnetic impurity ion Magnetic impurity ion O2- • Saturation magnetization (m) decreases as • O2 partial pressure during film deposition • process increases. • IB (or carrier) density decreases with • increasing O2 partial pressure • O vacancies significantly contribute to • IB (or CB) High IB density Low IB density As x increases, superexchange coupling of magnetic ions via O2- ion leads to antiferromagnetic alignment Decrease of m at high TM doping
Ferromagnetism in wide-band-gap TiO2 • (1) Three distinct crystalline phases rutile: tetragonal, a=4.593Å, c=2.959Å anatase: tetragonal, a=3.785Å, c=9.514Å brookite: orthorhombic, a=5.436Å, b=9.166Å, c=5.135Å (2) Thermodynamic stability • rutile – stable • anatase, brookite – metastable (easily converted into rutile at high temp.) • (3) Band structure • rutile – direct band gap (~3.3 eV) • anatase – indirect band gap (~3.8 eV) • * wide band gap rutile type TiO2 anatase type TiO2
XRD TiO2-:Ni Ionic radius (Å) (octahedral site) Ti4+(3d0) : 0.745 Ni2+(3d8): 0.830 Ni3+(3d7, low): 0.700 Ni3+(3d7, high): 0.740 Ni4+(3d6): 0.620 • For Ni-doped rutile TiO2-δ films, • →lattice constants increase linearly • →Unit-cell volume increase for x = 5 at.% • from that of undopedTiO2-δ is about 0.6% Above 6 at.%, Ni clusters are observed as marked by *
X-rayPhotoelectronspectroscopy(TiO2-:Ni) • Both 2p3/2 and 2p1/2 lines are split into two peaks • Binding energy difference between the two peaks of ~ 3.5 eV lead to an interpretation that they are due to Ni2+and Ni3+ions Mater. Chem.. Phys. 77, 384 (2002). • Finite density of Ni2+ions in TiO2-δ:Ni is likely • to induce an increase of lattice constants. • Through Doniach-Sunjic line-shape fitting Ni 4 at.% Ni 9 at.% (with Ni clusters) Ni2+:Ni 3+ = 3.5:6.5 Ni2+:Ni 3+ = 5.3:4.7 • For Ni (9 at.%) → Ni clusters was detected by XRD → Inversion of XPS intensity ratio is attributable to Ni clusters (Ni0) → The 2p binding energies of electrons in Ni0are known to be close to those in Ni2+ within 1 eV Handbook of X-ray Photoelectron Spectroscopy, Perkin-Elmer Co., 1992. →Ni clusters tend to exist at the surface region and are likely to interact with oxygen ions, thus, having effective ionic valences 4 at.% 9 at.% Ni cluster
Hall Effect Measurements (TiO2-:Ni) • Up to 5 at.%:p-type conductivity • (p ~ 1019 cm-3) attributable to • Ni2+ & Ni3+ substitution of Ti4+ sites • At higher Ni doping: n-type conductivity • attributable to creation of Ni clusters
Ni (4 at.%) doped TiO2-δ • XPS Ni2+:Ni 3+ = 3.5:6.5 • spin moment Ni2+(t2g6eg2) Mspin = 2 μB • Ni3+(t2g5eg2) Mspin = 3 μB • Cal. MS≈ 2.7 μB/Ni • Exp. MS≈ 3 μB/Ni • The observed magnetic moment is • attributable to the alignment of Ni • impurity spins. Vibrating Sample Magnetometry (TiO2-:Ni) • Ferromagnetic strength is likely to be • related to mobile carrier (hole) density • Decrease in net magnetization with • increase of Ni content : increase in antiferromagnetic superexchange coupling strength between neighboring Ni ions via a nearby O2- ion (as in NiO) is possible
TiO2-:Co • * Intrinsic ferromagnetism persists at high • Co doping (for Ni, Fe, Mn, 6 at.%). • * Large saturation magnetization (Ms) as in • Ni doping. • * Co ions have valences +2 & +3 (by XPS). • * Ferromagnetic strength decreases with • increasing Co content (probably due to • antiferromagnetic Co2+-O2--Co2+).
TiO2-:Fe * No thickness dependence: rare possibility for surface segregation of Fe * Neither Fe cluster nor Fe3O4 was detected * Ferromagnetism is due to magnetic polaron rather than moble carrier x = 1.3 at.%: p-type 1018 cm-3 x = 2.4 at.%: p-type 1017 cm-3 x = 5.8 at.%: insulating
TiO2-:Mn * p-type samples exhibited ferromagnetism. * Ferromagnetic strength is not related to hole density. * Mn3+(d4) & Mn4+(d3) ions are dominant.
SQUID polaronic model A. Kaminski et al., PRL 88, 247202 (2002). TC > 400 K for all samples
TiO2:TM (Ni, Co, Fe, Mn) * Saturation magnetization per dopant ion differs significantly (large for Co & small for Mn) in agreement with ZnO case (IB picture) *Ferromagnetic strength persists at high Co doping (12 at.%) compared to others ( 6 at.%) * Conduction type change from n to p by TM doping (no p-type in ZnO)
Pure TiO2- & TiO2-:Sb * Ferromagnetism is observed for pure TiO2- films (stronger for rutile than anatase) * Sb doping leads to an increase of saturation magnetization
Spin-polarized energy band structure FLAPW calculation for rutile TiO2- (with O vacancy)(Hong & Kim, J. Phys:C 21,195405 (2009) * DOS indicates net spin-polarization of Ti d-bands (due to lattice distortion) and resultant net magnetic moment of 0.22 B/Ti for rutile TiO2- (no such result obtained for anataseTiO2-).
Transport properties of spin-polarized carriers (1) Magnetoresistance ZnMnO MR = [(H) - (0)]/(0) * Increase in resistivity at low temp. (positive MR) is attributable to s-d exchange coupling. * Decrease in resistivity at high temp. (negative MR) is attributable to magnetic polaron (formed near O vacancy), which is unstable at low temp. Z. Yang et al., JAP 105, 053708 (2009)
VxFe3-xO4 Negative MR due to carrier hopping
(2) Anomalous Hall effect RHall = (HR0 + 4MRs)/d = ROHE + RAHE = VH/Ix d: sample thickness R0: ordinary Hall coeff. (= -1/ne) due to classical Lorenz force Rs: anomalous Hall coeff. due to asymmetric scattering from spin-orbit interaction under magnetization indicating carrier-mediated ferromagnetism (s-d exchange)
Electrical Resistivity Linear behavior can be understood in terms of polaronic hopping of spin-polarized carriers.
Stand on a new world and look beyond it for another one • Room-temperature ferromagnetism is observable for 3d TM-doped wide-band-gap III-V (e.g., GaN), II-VI (e.g., ZnO), VI-VI (e.g., SiC), & other oxide (e.g., TiO2) DMSs. * Some results are still controversial. • Both carriers in valence or conduction bands (via p-d or s-d exchange coupling) and impurity bands (via magnetic polaron) contribute to ferromagnetism. * need to independently control density of carriers and density of TM ions to better understand ferromagnetism. * high carrier density, low TM density (low defects) exchange coupling (high carrier mobility, low M) often appears for non-oxide DMSs * low carrier density, high TM density (high defects) magnetic polaron (low carrier mobility, high M) frequently appears for oxide DMSs
ћω ћω Ti 3d Ti 3d eg k t2g eg k Spin down Spin up t2g Spin up Spin down O 2p O 2p Optical properties * Spin-exchange interaction is likely for low Mn and Fe doping. p-d exchange (bandgap shrink) p-d hybridization (bandgap expansion)
a Mn Te c MnTe films (MBE grown) NiAs (hexagonal) “Semiconducting” & p-type (p ~ 1019 cm-3)
MnSb films (MBE grown) “High Curie Temp.” ~ 600 K “Metallic behavior” & p-type (p ~ 1021 cm-3)
TiO2-:Fe Ionic radius (Å) (octahedral site) Ti4+(3d0) : 0.745 Fe2+(3d6, low): 0.750 Fe2+(3d6, high): 0.920 Fe3+(3d5, low): 0.690 Fe3+(3d5, high): 0.785 Fe4+(3d4): 0.725 * Anatase samples show larger variation of lattice constants than rutile ones.
TiO2-:Fe Mossbauer Spectroscopy For x = 5.8 at.%, only Fe3+ ions are detected, excluding possibility of Fe3O4 contribution to ferromagnetism. Spinel Fe3O4: (Fe3+)[Fe2+,Fe3+]O2-4
Rop Eop Eos Ros N0 N1 Spectroscopic Ellipsometry (SE) Ellipsometry can measure Snell’s law Fresnel’s equations dielectric function D = E optical conductivity = (-i/4)( - 1) J = E :Contains information on optical transition in solids knowledge of electronic structure
Lineary polarized light Modulated phase by analyzer Elliptically polarized light Light Detector Polarizer Analyzer SE Measurement process Jones matrix Intensity of photon I = k0 + k1 cos2(A-As) + k2 sin2(A-As) Fourier transformation ki = ki (Im) cos = cos (k0, k1, k2) tan = tan (k0, k1, k2) (0 = tan ) Get &
1 2 ħ Dipole selection rule EG k Interband transition (absorption) Electric–dipole approximation e.g., s p, p d Transition rate
Band-gap Distribution of Semiconductors ZnTe CdTe ZnSe TiO2 SnO2 InAs GaAs AlAs ZnO ZnS Ge CuAlO2 InP InN GaP Si GaN 1 2 3 4 eV