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Lithography and Electrodeposition

Lithography and Electrodeposition. bnl. ibm. UMass. manchester. 2012 Nano Education Institute at UMass Amherst (Mark Tuominen). Self Assembly (inspired by nature). Lithography (designed by humans). How do we control the shape and size of nanostructures?. Nanostructure.

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Lithography and Electrodeposition

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  1. Lithography and Electrodeposition bnl ibm UMass manchester 2012 Nano Education Institute at UMass Amherst (Mark Tuominen)

  2. Self Assembly (inspired by nature) Lithography (designed by humans) How do we control the shape and size of nanostructures?

  3. Nanostructure height (thickness) depth width Using conventional methods, controlling the thickness (deposition) at the nanoscale is much easier than controlling the width or depth (lithography)

  4. Computer Microprocessor "Heart of the computer" Does the "thinking" Uses transistors to create "logic" (computational units)

  5. Moore's Law

  6. Making Small SmallerComputer Microprocessors macroscale microscale nanoscale ibm.com The very small features on a computer's microprocessor and memory (RAM) are patterned with photolithography

  7. Lithography(controlling lateral dimensions,by using stencils, masks, & templates)

  8. Lithography Nanoscience Rocks! Nanoscience Rocks (Using a stencil or mask)

  9. narrow trench • Photolithography • Electron-Beam Lithography • X-ray Lithography • Focused Ion-Beam Lithography • Block Copolymer Lithography • Nano Imprint Lithography • Dip Pen Lithography • Interference Lithography • Contact Lithography • EUV Lithography Some possible desired features narrow line Lithography: Basic concepts modified substrate

  10. deposit & liftoff deposit & liftoff exposed region results in presence of structure exposed region results in absence of structure (generally poorer resolution) Positive Resist Negative Resist resist resist expose expose cross-linking scission Positive and Negative Resists develop develop

  11. There are actually many contributing factors that limit the minimum linewidth: • optical diffraction () • purity of light source • resist sensitivity • depth of focus • numerical aperture of lens How low can you go? minimum linewidth minimum pitch Resolution Limit of Photolithography Using smaller wavelength enables smaller features Visible light > UV > DUV > EUV > X-rays

  12. Electron Beam Polymer film Silicon crystal Electron-Beam Lithography Nanoscopic Mask ! Down to 10 nm

  13. Nanosphere Lithography itrc.org.tw opticalproteomics.org

  14. Deposition Template Etching Mask Nanoporous Membrane Diblock Copolymer Lithography (Uses self assembly) (physical or electrochemical) Remove polymer block within cylinders (expose and develop) Down to 3 nm

  15. UMass-Seagate Diblock Copolymer Lithography U. Wisconsin

  16. Density Multiplication using Diblock Copolymers (MIT) I. Bita, J.K.W. Yang, Y.S. Jung, C.A. Ross, E.L. Thomas, and K.K. Berggren Science 321, 939 (2008). Also Hitachi/UW work: R. Ruiz, H. Kang, F.A. Detcheverry, E. Dobisz, D.S. Kercher, T.R. Albrecht, J.J. de Pablo, and P.F. Nealey Science 321, 936 (2008)

  17. Next.... ....Electrodeposition... ....another convenient way to make nanofilms

  18. Working Electrode (WE) Counter Electrode (CE) "oxidation" Cu(0) –> Cu2+ + 2e- ("electroplating") I V cathode anode Nanofilm by Electrodeposition CuSO4 dissolved in water If using an inert Pt electrode: 2 H2O –> O2 + 4H+ + 4e- "reduction" Cu2+ + 2e- –> Cu(0)

  19. Electrodeposition into a Nanoscale Lithographic Template nanoporous template nanowires in a diblock copolymer template nanowires in a polycarbonate filter

  20. CHM video module at: http://www.umassk12.net/nanodev/NanoEd/Electrochemical_Deposition/index.html Electrochemical Deposition

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