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Developing DNA nanotechnology for use in nanoelectronics

Developing DNA nanotechnology for use in nanoelectronics. Paul W.K. Rothemund and Erik Winfree California Institute of Technology. 30. The astonishing effectiveness of DNA self-assembly. nonperiodic crystals with complex patterns at 12 nm.

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Developing DNA nanotechnology for use in nanoelectronics

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  1. Developing DNA nanotechnology for usein nanoelectronics Paul W.K. Rothemund and Erik Winfree California Institute of Technology

  2. 30

  3. The astonishing effectiveness of DNA self-assembly... nonperiodic crystals with complex patterns at 12 nm “algorithmic self-assembly”, Rothemund, Papadakis, Winfree, 2004 Shih, 2004 arbitrary patterns 100 nm x 100 nm at 6 nm resolution 200 pixels shaped holes folding “DNA origami” Rothemund, 2006 Mao, 2008 ...has allowed us to create arbitrary shapes and patterns, both 2D and 3D at the nanoscale. But...

  4. The astonishing effectiveness of DNA self-assembly... nonperiodic crystals with complex patterns at 12 nm “algorithmic self-assembly”, Rothemund, Papadakis, Winfree, 2004 Shih, 2004 arbitrary patterns 100 nm x 100 nm at 6 nm resolution 200 pixels shaped holes folding “DNA origami” Rothemund, 2006 Mao, 2008 ...has allowed us to create arbitrary shapes and patterns, both 2D and 3D at the nanoscale. But...

  5. The astonishing effectiveness of DNA self-assembly... nonperiodic crystals with complex patterns at 12 nm “algorithmic self-assembly”, Rothemund, Papadakis, Winfree, 2004 Shih, 2004 arbitrary patterns 100 nm x 100 nm at 6 nm resolution 200 pixels shaped holes folding “DNA origami” Rothemund, 2006 Mao, 2008 ...has allowed us to create arbitrary shapes and patterns, both 2D and 3D at the nanoscale. But...

  6. The astonishing effectiveness of DNA self-assembly... nonperiodic crystals with complex patterns at 12 nm “algorithmic self-assembly”, Rothemund, Papadakis, Winfree, 2004 Shih, 2004 arbitrary patterns 100 nm x 100 nm at 6 nm resolution 200 pixels shaped holes folding “DNA origami” Rothemund, 2006 Mao, 2008 ...has allowed us to create arbitrary shapes and patterns, both 2D and 3D at the nanoscale. But...

  7. The astonishing effectiveness of DNA self-assembly... nonperiodic crystals with complex patterns at 12 nm “algorithmic self-assembly”, Rothemund, Papadakis, Winfree, 2004 Shih, 2004 arbitrary patterns 100 nm x 100 nm at 6 nm resolution 200 pixels shaped holes folding “DNA origami” Rothemund, 2006 Mao, 2008 ...has allowed us to create arbitrary shapes and patterns, both 2D and 3D at the nanoscale. But...

  8. supported Kos Galatsis, Mihri Ozkan, Scott Sills

  9. supported Kos Galatsis, Mihri Ozkan, Scott Sills

  10. supported Kos Galatsis, Mihri Ozkan, Scott Sills

  11. device compatibility assembly yield aggregation defect rates scaling up to larger structures supported Kos Galatsis, Mihri Ozkan, Scott Sills

  12. device compatibility assembly yield registration aggregation defect rates scaling up to larger structures supported Kos Galatsis, Mihri Ozkan, Scott Sills

  13. DNA nanostructures are made in solution....

  14. DNA nanostructures are made in solution....and deposited randomly on surfaces

  15. DNA nanostructures are made in solution....and deposited randomly on surfaces How can we register them so that they may be “wired up”?

  16. Our FENA supported projects Origami nucleation of ribbons: Robert Barish, Rebecca Schulman and Erik Winfree Thanks to FENA, NSF Origami/ribbons/CNT cross-junctions: Hareem Maune, Siping Han, Marc Bockrath, Bill Goddard, Erik Winfree Thanks to FENA, NSF Origami placement on technological surfaces with IBM Research Almaden: Ryan Kershner, Luisa Bozano, Christine Micheel, Albert Hung, Anne Fornoff, Charles Rettner, Marco Bersani, Jennifer Cha, Jane Frommer, Greg Wallraff thanks to:FENA, NSF Stacking bonds for larger, more complex structures: Sungwook Woo thanks to: Microsoft Research, FENA, NSF

  17. Our FENA supported projects Origami nucleation of ribbons: Robert Barish, Rebecca Schulman and Erik Winfree Thanks to FENA, NSF Origami/ribbons/CNT cross-junctions: Hareem Maune, Siping Han, Marc Bockrath, Bill Goddard, Erik Winfree Thanks to FENA, NSF Origami placement on technological surfaces with IBM Research Almaden: Ryan Kershner, Luisa Bozano, Christine Micheel, Albert Hung, Anne Fornoff, Charles Rettner, Marco Bersani, Jennifer Cha, Jane Frommer, Greg Wallraff thanks to:FENA, NSF Stacking bonds for larger, more complex structures: Sungwook Woo thanks to: Microsoft Research, FENA, NSF FENA participation has encouraged us to directly address roadblocks to the use of DNA nanotechnology for nanoelectronics

  18. Our FENA supported projects assembly yield Origami nucleation of ribbons: Robert Barish, Rebecca Schulman and Erik Winfree Thanks to FENA, NSF Origami/ribbons/CNT cross-junctions: Hareem Maune, Siping Han, Marc Bockrath, Bill Goddard, Erik Winfree Thanks to FENA, NSF Origami placement on technological surfaces with IBM Research Almaden: Ryan Kershner, Luisa Bozano, Christine Micheel, Albert Hung, Anne Fornoff, Charles Rettner, Marco Bersani, Jennifer Cha, Jane Frommer, Greg Wallraff thanks to:FENA, NSF Stacking bonds for larger, more complex structures: Sungwook Woo thanks to: Microsoft Research, FENA, NSF FENA participation has encouraged us to directly address roadblocks to the use of DNA nanotechnology for nanoelectronics defect rates device compatibility registration aggregation scaling up to larger structures

  19. device compatibility assembly yield registration aggregation defect rates scaling up to larger structures supported Kos Galatsis, Mihri Ozkan, Scott Sills

  20. device compatibility assembly yield registration aggregation defect rates scaling up to larger structures supported Kos Galatsis, Mihri Ozkan, Scott Sills

  21. device compatibility assembly yield registration aggregation defect rates scaling up to larger structures supported Kos Galatsis, Mihri Ozkan, Scott Sills

  22. 12 nanometers Algorithmic self-assembly usestiles to create large, complex patterns sticky ends on monomers encode a pattern in a DNA tile crystal

  23. 12 nanometers Algorithmic self-assembly usestiles to create large, complex patterns sticky ends on monomers encode a pattern in a DNA tile crystal

  24. 12 nanometers Algorithmic self-assembly usestiles to create large, complex patterns sticky ends on monomers encode a pattern in a DNA tile crystal But lack of appropriate nuclei has cause problems... • Yield of self-assembled DNA patterns. Previously only 1-2% of material had the desired pattern. • Defect rates (error rates). Previously, within a single pattern a ~2% error rate per “pixel”.

  25. 12 nanometers Algorithmic self-assembly usestiles to create large, complex patterns sticky ends on monomers encode a pattern in a DNA tile crystal But lack of appropriate nuclei has cause problems... • Yield of self-assembled DNA patterns. Previously only 1-2% of material had the desired pattern. • Defect rates (error rates). Previously, within a single pattern a ~2% error rate per “pixel”.

  26. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree

  27. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree

  28. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree 0 1 1 0 1 0

  29. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree 0 1 1 0 1 0

  30. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree

  31. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree

  32. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree

  33. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree

  34. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree

  35. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree

  36. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree

  37. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree

  38. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree

  39. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree

  40. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree

  41. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree

  42. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree

  43. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree DNA ribbon

  44. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree DNA ribbon Redundant encoding of each bit with two diagonals of tiles gives error correction.

  45. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree • Yield of self-assembled DNA patterns. Previously only 1-2% of material had the desired pattern. Now >90% appropriately nucleated. • Defect (error) rates. Previously, within a single pattern a ~2% error rate per “pixel”.Now .13%, or better. • Self-assembly of larger patterns. Copied ~1 micron. DNA origami are limited to about 100 nm in size.

  46. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree • Yield of self-assembled DNA patterns. Previously only 1-2% of material had the desired pattern. Now >90% appropriately nucleated. • Defect (error) rates. Previously, within a single pattern a ~2% error rate per “pixel”. Now .13%, or better. • Self-assembly of larger patterns. Copied ~1 micron. DNA origami are limited to about 100 nm in size.

  47. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree • Yield of self-assembled DNA patterns. Previously only 1-2% of material had the desired pattern. Now >90% appropriately nucleated. • Defect (error) rates. Previously, within a single pattern a ~2% error rate per “pixel”. Now .13%, or better. • Self-assembly of larger patterns. Copied ~1 um. (>5) DNA origami are limited to about 100 nm in size.

  48. Origami nucleation improves yield and error rate Rob Barish, Rebecca Schulman, Paul Rothemund, Erik Winfree Other more complex patterns can be made using origami nuclei...

  49. Two dimensional organization of carbon nanotubes using DNA origami Addressing the compatibility of carbon nanotubes and DNA origami

  50. Two dimensional organization of carbon nanotubes using DNA origami Addressing the compatibility of carbon nanotubes and DNA origami

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