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Grading exercises. 1.- Transmission Electron Microscopy with aberration correctors 2.- The multiple electron beam lithography (Itziar Goicoechea) 3.- Nanoimprinting lithography (Izaro Laresgoiti) 4.- Surfactants in semiconductor industry 5.- Pulsed laser deposition
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Grading exercises 1.- Transmission Electron Microscopy with aberration correctors 2.- The multiple electron beam lithography (Itziar Goicoechea) 3.- Nanoimprinting lithography (Izaro Laresgoiti) 4.- Surfactants in semiconductor industry 5.- Pulsed laser deposition 6.- One dimensional systems: step arrays (Zakaria Abdelfattah) 7.- Self-assembly by electron mediated long range interactions(Ali Akbari) 8.- Block copolimers as patterned templates (Lourdes del Valle) 9.-Charge injection in flash memory: electron tunneling 10.- Field programmable nanowire interconnect (Giuseppe Foti) 11.-Planar graphene CMOS (Elton Jose) 12.- Phase shift masks 13.- EUV lithography (Sandra Plaza) 14.- FeMOSFET, ferrimagnets 15.- Spin qbits in graphene quantum dots (Juan Pablo Echeverry) 16.- Nanophotonic switch (Eneko Malatseetxeberria) 17.- DNA nanodevice (LeonardoEspinosa) 18.- The IBM racetrack memory (FernandoMingo)
Presentations: 10 minutes talks, 5 viegraphs maximum, 5 minutes discussion May 29th, 9:00, DIPC, 1st building: From 1 to 10 May 30th, 9:00, DIPC, 1st building: From 11 to 18