Technology Roadmap of INTEL’s Processors

1. Technology Roadmap of INTEL’s Processors July 2014

2. Table of Contents Intel’s product line from Pentium to Ivy Bridge Above 100 nm node (Gate-First) Sub-100 nm nodes: 90 nm and 65 nm (Gate-First) 45 nm, 32nm and 22nm (Gate-Last, high-k & metal gates) Parameters related to “Technology Node” Contacted Gate Pitch 6T SRAM Cell Size Metal 1 Pitch Future What to expect NEXT?

3. Above 100 nm, Gate-First: Package (top & bottom) 0.35 µm Intel Pentium Microprocessor (200 MHz) 0.18 µm Intel III Microprocessor “Coppermine” (450 MHz) 0.13 µm Intel III Microprocessor “Tualatin” (1.26 GHz)

4. Above 100 nm, Gate-First: Die and Die markings 0.35 µm Intel Pentium Microprocessor (200 MHz) 0.18 µm Intel III Microprocessor “Coppermine” (450 MHz) 0.13 µm Intel III Microprocessor “Tualatin” (1.26 GHz) 7.1 mm x 11.1 mm = 79 mm2 10.3 mm x 12.3 mm = 126.7 mm2 10.8 mm x 12.6 mm = 136.1 mm2

5. Above 100 nm, Gate-First: SRAM at gate level 0.35 µm Intel Pentium Microprocessor (200 MHz) 0.18 µm Intel III Microprocessor “Coppermine” (450 MHz) 0.13 µm Intel III Microprocessor “Tualatin” (1.26 GHz) All the SRAMS: P+ diffusions of the pull-down transistors have an “H” shape and each one is shared by two SRAM cells Wordline and pull-down are 90˚ at each other and this consumes lot of space

6. Above 100 nm: Critical Parameters The devices before 0.35 µm are not taken because previous two generations (0.6 µm and 0.8 µm) used BiCMOS process The 0.25 µm node has been omitted to avoid clutter

7. Above 100 nm: Summary In four generations (0.35 µm, 0.25 µm, 0.18 µm, 0.13 µm): • The die area shrunk from 136 to 79 mm2 • The gate length reduced from 335 nm to 70 nm • The metal 1 pitch scaled down from 950 nm to 360 nm • The SRAM cell size decreased from 18.1 µm2 to 3.25 µm2 Not all parameters scaled in the same proportion Intel moved towards sub 100 nm nodes with process-integration experience in Cu-interconnects and low-k materials By 130 nm node all the processors had a clock frequency in the range of 3 GHz

8. Sub 100 nm, Gate-First: Package (Top & Bottom) 90 nm Intel Pentium IV, “Prescott” (3 GHz) 65 nm Intel Dual Core, “Xeon” (3 GHz) 90 nm and 65 nm are two generations below 100 nm nodes, which used conventional gate structure with poly for gate electrode and oxide for gate dielectric 65 nm node was essentially a shrink of 90 nm The most innovative part in 65 nm node was the introduction of dual core architecture

9. Sub 100 nm, Gate-First: Die and Die markings 90 nm Intel Pentium IV, “Prescott” (3 GHz) 65 nm Intel Dual Core, “Xeon” (3 GHz) 13.4 mm x 10.4 mm = 142 mm2 10.8 mm x 10.34 mm = 112 mm2

10. Sub 100 nm, Gate-First: SRAM at gate level 65 nm Intel Dual Core, “Xeon” (3 GHz) 90 nm Intel Pentium IV, “Prescott” (3 GHz) The SRAM cell at diffusion changed from H_O structure to continuous regions of P-well for NMOS transistors and I shaped regions of N-well for PMOS transistors Intel 65 nm node is 2nd generation of strain silicon technology 65 nm node adopted the same uniaxial strained approach as 90 nm node Epitaxial SiGe film was employed for PMOS source-drains in 65 nm and 90 nm node Up to 65 nm node, single patterning was only used

11. Sub 100 nm, Gate-Last: Package (Top & Bottom) 45 nm Intel Core 2TM Extreme, “Penryn” (3 GHz) 22 nm Intel Quadcore, “Ivy Bridge” (3.3 GHz) 32 nm Intel Dual Core, “Clarkdale/Westmere” (3 GHz)

12. Sub 100 nm, Gate-Last: Die and Die Markings 32 nm Intel Dual Core, “Clarkdale/Westmere” (3 GHz) 22 nm Intel Quadcore, “Ivy Bridge” (3.3 GHz) 45 nm Intel Core 2TM Extreme, “Penryn” (3 GHz) 12.2 mm x 8.5 mm = 104 mm2 19.6 mm x 8.0 mm = 112 mm2 9.2 mm x 8.2 mm = 75.4 mm2

13. Sub 100 nm, Gate-Last: SRAM at gate level 22 nm Intel Quadcore, “Ivy Bridge” (3.3 GHz) 45 nm Intel Core 2TM Extreme, “Penryn” (3 GHz) 32 nm Intel Dual Core, “Clarkdale/Westmere” (3 GHz) The 6T SRAM cell has been the vehicle to define technology nodes Cross couple PMOS and NMOS metal gates are connected at the side of the metal gate. 45 nm node uses double patterning with 193 nm dry lithography 32 nm node uses double patterning with 193 nm immersion lithography 22 nm node introduces fins and uses double patterning with 193 nm immersion lithography

14. Sub 100 nm, Gate-Last: Summary Intel’s 45 nm process is the first to incorporate high-k metal gate (HKMG) technology. Their innovative process protects the high-k gate dielectric from polysilicon etch by depositing a TiN top interface layer (TIL) before polysilicon deposition and patterning. PMOS channel stress is enhanced by removing the polysilicon dummy gates which is an enabling factor of the replacement metal gate process Intel used for the first time double patterning based on 193 nm dry lithography for critical layers and at the transistor gate level. Intel’s 32 nm was essentially a shrink of 45 nm node with the exception that immersion lithography was used. As of today, 2014, Intel is the only manufacturer to use a FinFET for its transistors. Intel 22 nm replaced the traditional 2-D planar MOS transistor with a gate that is wrapped around a thin three-dimensional silicon fin that rises up vertically from the silicon substrate . A thin high-k dielectric separates the silicon fin from the metal gate on each of the three sides of the fin

15. Sub 100 nm, Gate-Last: Graphical Summary

16. Sub 100 nm: Critical Dimensions (Logic) 90 nm and 45 nm have the same gate-length 65 nm and 32 nm have the same gate-length Gate length is not an accurate parameter for defining technology node for devices below 100 nm node

17. Sub 100 nm: Critical Dimensions (SRAM) The 32 nm node introduced the metal 0 level and changed the wiring position of bitlines (BL), Wordlines (WL), Vss and Vdd lines and improved slightly the width/length (W/L) ratio of transistors The SRAM in 22 nm node kept the same wiring configuration for BL, WL, Vdd and Vss, as in 32 nm node but by introducing Tri-Gate (FinFET) structure improved W/L ratio Generally, the widths of pull down transistors are greater than the widths of access transistors. The current ratio of I PD /I AC reflecting geometric device dimension is known as beta ratio. A higher beta ratio reflects higher cell stability

18. Table of Contents • Intel’s product line from Pentium to Ivy Bridge • Above 100 nm node (Gate-First) • Sub-100 nm nodes: • 90 nm and 65 nm (Gate-First) • 45 nm, 32nm and 22nm (Gate-Last, high-k & metal gates) • Parameters related to “Technology Node” • Contacted Gate Pitch • 6T SRAM Cell Size • Metal 1 Pitch • Future • What to expect NEXT?

19. Parameters related to “Technology Node” For advanced nodes “Gate-Length” is not a reliable parameter for defining technology node

20. Parameters related to “Technology Node” The “Contacted Gate Pitch” takes in account the gate length and the minimum litho-features, thus reflects the actual technology node “Contacted Gate Pitch” decreases by 0.7 every two years, following Intel’s “Tick Tock” scheme Every alternate year Intel develops a new process technology and the following year a new micro-architecture, (Tick / Tock scheme)

21. Parameters related to “Technology Node” The “square root of 6T-SRAM cell area” is linear with technology node and is an accurate method to determine the technology node Intel 22 nm has 0.092 µm2 SRAM cell for high density applications but our analysis did not locate these cells, only 0.108 µm2 SRAM cell for low voltage applications was found in reverse engineering.

22. Parameters related to “Technology Node” The “Metal 1 Pitch” is also indicative of the technology node but not very accurate

23. Table of Contents • Intel’s product line from Pentium to Ivy Bridge • Above 100 nm node (Gate-First) • Sub-100 nm nodes: • 90 nm and 65 nm (Gate-First) • 45 nm, 32nm and 22nm (Gate-Last, high-k & metal gates) • Parameters related to “Technology Node” • Contacted Gate Pitch • 6T SRAM Cell Size • Metal 1 Pitch • Future • What to expect NEXT?

24. What is coming NEXT? • Intel has developed both CPU and SoC processes for its 45 nm, 32 nm and 22 nm technology nodes • SoC products usually incorporate a variety of devices that are often not seen in regular CPU products • Intel will use the 22 nm technology node platform and diversify for different products • Intel is not pursuing only high performance, but developing process and architectures for wider range of products varying from server-market to mobile market • This wide variety of products requires different design at one particular technology node

25. What is coming NEXT? • Different chips with different designs are available at 22 nm technology, for example: • Ivy Bridge ( CPU); • Haswell (SoC); • Bay Trail (for tablets, Atom Z300 series) Bay Trail 22 nm ATOM Z300 Intel 22 nm Haswell Intel 22 nm Ivy Bridge

26. What is coming NEXT? Generation of High-K and Metal Gates with “Gate-Last” process Most likely bulk FinFET will be used for 14 nm node EUV will probably be used for sub 10 nm nodes

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