1nm R+D: Update

1. 1nm R+D: Update K.Evans-Lutterodt

2. Outline for 1nm R&D Our current approaches: MLL’s and kinoform Kinoform issues and progress Recent results from kinoforms Calculations of ultimate kinoform performance Etching status. MLL progress. Personnel Proposed R+D Facilities: plans and schedule Test plans for 1nm optics including APS beamlines Progress towards 10nm testing station (design, components)

3. Paths to 1nm; Brief review

4. Multilayer Laue Lenses • Deposit varied line-spacing grating on flat substrate (thinnest structures first!) • Section to 5-20 m thickness (high aspect ratio structure) • Assemble two into a single device (MLL) Varied line-spacing grating substrate Depth-graded multilayers on flat Si substrate CNM, APS group: Maser et al. < 20nm performance!

5. Kinoform Optics Instead of solid refractive optic: Use a kinoform: K. E-L et al. (2003) NSLS results as of last EFAC meeting 600nm • One can view the kinoform equivalently as • A blazed zone plate • An array of coherently interfering micro-lenses.

6. 2) Kinoforms

7. 2) Kinoforms Kinoform Status as of last EFAC: • Measured kinoform resolution: 600nm • Theoretical basis not generally accepted • Etching issues

8. Demagnification Spot Size Diffraction limit Focal Length Kinoform results from 1st run at APS (BL 8IDI) s=82 nm 200 micron aperture used 300 micron aperture manufactured Near diffraction limit. Diffraction size 0.44/NA = 44nm Demag size = 15nm Net = 46nm

9. Theoretical basis for Kinoform optics Partial resolution: Numerical calculation of NA=0.4 kinoform for optical wavelengths, refractive index > 1. Applied Optics, Vol. 28, (1989) Issue 5, pp. 976- “Optical performance of holographic kinoforms” Dale A. Buralli, George Michael Morris, and John R. Rogers • Cases considered in paper • Paraxial ( to order x2) • Non-Paraxial (exact) • Finite thickness

10. What happens if you use the wrong lens profile? NA=0.1 • Using the exact integral • But using a parabolic approximation for the lens profile: NA=0.2 Do not get expected performance for large NA

11. Performance of Exact Lens Profile • Using the exact integral • Using exact lens profile. NA= 0.1 Get diffraction limited performance even at large NA NA= 0.4 (One caveat: Only thin lens calculation done to date)

12. Summary of kinoform theory paper For a short kinoform structure theoretical basis is now established for diffraction limited performance to NA ~ 0.4 We still need to: Provide a numerical basis for compound lenses Develop numerical density matrix thick lens calculator (MLL+) Include the effect of imperfections ( Roughness, verticality)

13. Kinoform Lens Fab We have acquired a new skill at BNL; etching. E-beam Design OLD BNL, APS Lucent Etching Testing Design BNL, APS NEW Lucent E-beam Testing Etching

14. Status of Si etching; (Abdel Isakovic, Post-doc) • Purchased machine was Cryo-process only. • Home grown cyclical cryo-etch process developed; • Better (deeper, but more vertical) than company-provided recipe. • Manuscript in process Etching performed at BNL 2.5microns/minute

15. Etching • The CFN had purchased the oxford plasma with cryo-etch, but not Bosch process license and hardware add-ons. • NSLS2 had planned to purchase the Bosch license and additional hardware, but the CFN has decided to make the purchase instead. PO has been signed. • Diamond etching started; industrial and electronic grade 0.65nm/minute, comparable surface finish.

16. Timelines for Kinoform(Lehman,12/06) • FY07 • Introduce etching RD program • Measure 60nm lenses • Improve theoretical underpinning • Improve measurement techniques to enable lens characterization • FY08 • Develop Deep Vertical Si etching • Optimized E-beam Si process to allow many lens writes • Develop etches for InSb, C, Si. • Test Compound Si lens sub 40nm • FY09 • Develop E-beam for alternate materials • Test Alternate materials lens in xray • Test sub 20nm lens in xray • FY10 • Test sub 10nm lens • FY 11 • Test sub 5nm lens • FY12 • Test 1nm lens

17. 3) Multi-layer Laue Lenses

18. Timelines for MLL(Lehman, 12/06) • FY07 • Explore materials for single crystal MLL approach. • Explore techniques to deposit multi-layers in wedged MLL geometry. • Carry out coupled wave (vector) calculations of MLL to determine sensitivity to errors. • Develop positioning techniques to mount and manipulate up to 4 MLL sections • FY08 • Develop techniques to deposit multi-layers for wedge MLL geometry • Develop metrology capable of determining zone width and placement to <1nm resolution. • FY09 • Growth effort continues for 1nm MLLs • Design a prototype MLL device (optics and mechanics) with 1nm limit • Develop techniques to slice an MLL section from graded multilayer • FY10 • Construct 1nm prototype device

19. Near term MLL issues Hire deposition scientist (Offer imminent) Hire Theoretician (Serious candidates,Discussions) Space identified for lab; planning for refurbishing

20. 1nm R+D Lab space needs Nano-positioning Lab: Space needed for testing of engineering concepts. Vibrationally quiet, may need small thermal enclosures. No special utility requirements. Optics Metrology Lab: Space needed for next generation LTP and ancillary equipment. Will need large thermally isolated space, with controlled air-flow. No special utility requirements. MBE/Depositioning Lab: Space needed for multilayer deposition effort. Large MBE system, UHV chambers. Associated characterization hardware e.g. STM. Utility requirements still to be determined.

21. 1nm R+D Lab space needs (cont.) X-ray reflectivity Lab: To include rotating anode or tube source for Laue work and simple reflectivity measurements. To be combined with crystal preparation facility for 0.1 meV effort. May have more significant power requirements. Wet Lab: For etching work, including that required for 0.1 meV effort. Will require fume hood. Effort currently underway to identify space at BNL for these efforts. One potential candidate is building 703, which while it will require rennovation (cost estimate is being developed now) will be able to co-locate all these needs, together with office space for researchers.

22. 4) Nanopositioning and Testing

23. Progress in Nano-positioning + 100 micron range XYZ 1nm step size Capacitance encoder for feedback 25mm travel range 80nm step-size Glass encoder on stage Integrated with 8IDI beamline programs Performs satisfactorily down to 10nm stepping +-3nm Borrowed hardware above; we are beginning procurement

24. Short term lens testing needs • Beamtime – 2 days a month APS • Can we improve NSLS X13B stability? Will a different mono do it.? • Test bench stages ( 5 -10nm resolution), enclosed, temperature stable • Design • Procure • Analysis • Begin developing other methods: Phase retrieval methods (Fienup)

25. 1nm R&D Summary • Rapid progress in kinoform. • Lab space needs for whole optics effort has been identified; potential building identified. • Offer imminent for deposition candidate. • Candidates for theorist position and 1nm group leader have been identified, discussions underway.