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Beam Instrumentation for Linear Colliders

Beam Instrumentation for Linear Colliders. With a big “Thank You” to T. Lefevre for most of the splendid slides. What is special about the beam instrumentation of a Linear Collider ? What are the main Instruments ?. LC school 2011 H.Schmickler , CERN.

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Beam Instrumentation for Linear Colliders

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  1. Beam Instrumentation for Linear Colliders With a big “Thank You” to T. Lefevre for most of the splendid slides.... • What is special about the beam instrumentation • of a Linear Collider ? • What are the main Instruments ? LC school 2011 H.Schmickler, CERN

  2. What would a future Linear collider look like ? Final Focus Demagnify and collide beams Main Linac Accelerate beam to IP energy without spoiling DR emittance Bunch Compressor Reduce σz to eliminate hourglass effect at IP Damping Ring Reduce transverse phase space (emittance) so smaller transverse IP size achievable Positron Target Use electrons to pair-produce positrons Electron Gun Deliver stable beam current

  3. Main Instrumentation challenge for Linear Collider • Measuringsmallemittance and smallbeam size • ~ 1um spatial resolution Transverse Profile Monitors • Measuring Short bunchlength • ~ 20fs time resolution Longitudinal Profile Monitors • Conservation of emittance over long distances relies on precisealignment • highaccuracy (5um) highresolution (50nm) Beam Position Monitor • Not talking about Damping rings Beam size monitor using Synchrotron radiation (Interferometer, P-Polarisation, X-ray imagingsystems)

  4. Measuring small beam size in a Linear Collider • Requiredhighprecisionfrom the Damping ring to the Interaction Point (IP) • Beamenergy ranges from 2.4GeV  1.5TeV • Tens of km of beamlines – Bignumber of instruments • Flat Beams (ex >> ey) : Think of a flat noodle ! • Small beam size • High beam charge High Charge Densities > 1010 nC/cm2 The thermal limit for ‘best’ material (C, Be, SiC) is 106nC/cm2

  5. ‘Beam Profile Horror Picture Show’ Wire Scanner Optical Transition Radiation 200mm thick mirror polished Si and CVD SiC wafer Interceptingdeviceslimited to single (or few) bunch mode

  6. High Resolution Imaging System using OTR • Diffraction effectwoulddetermine the resolutionlimit of the measurements OTR screen Charged Particle • OTR angular distribution: Peakat 1/g but large tails • Problem for veryhighenergyparticles • Aperture of the focussinglens : q >> 1/g Lens Large tails Camera X. Artru et al, NIM AB 145 (1998) 160-168 C. Castellano and V.A. Verzilov, Physical Review STAB 1, (1998) 062801

  7. High Resolution Imaging System using OTR • Depth of field limits the resolution because the image source is not normal to the optical axis OTR screen Charged Particle Df sy Classical OTR configuration : 90o observation angle Camera Make Df > sy

  8. High Resolution Imaging System using OTR • Imaging smallbeam size  large magnification  short Depth of field (Df) OTR screen sy Df Camera SmallerDf Tilt the screen

  9. Beam size monitoring with Diffraction Radiation • Non destructive alternative for beam size measurement (not imaginganymore) Twoslits DR target Radiation wavelength Charged Particle Beam energy Measuring the angular distribution of the interference pattern between the DR emitted by the two slits h impact parameter Camera After the Damping ring the beam has few GeV and ODR isgenerated for reasonable values of h

  10. Beam size monitoring with Diffraction Radiation • Sensitivity to beam size is given by the visibility of the interference pattern • Vertical (hor) polarization component depends on the vertical (hor) beam size y=0 y=30m Intensity (arb. units) • The visibility strongly depends on the wavelength with an beam size sensitivity limit as follows GO for short wavelength

  11. Beam size monitoring with Diffraction Radiation Investigation on the lowemittancebeamat ATF, KEK, Japan E=1.28GeV ; l=445nm ; h=70mm Beam size measured by ODR (mm) Beam size measuredwithWire Scanner (mm) P. Karataev et al., Physical Review Letters 93(2004) 244802 P. Karataev et al, Physical Letters A345 (2005) 428

  12. Beam size monitoring with Diffraction Radiation • Push the technology in the EUV regime (~100nm) to bring the resolution in the 1-10mm range • Not usable for ultra-high beam energy : >10GeV • Mechanical challenge for the slit technology l = 0 l = /10 ~ 10nm l = /4 Dl Used in Linear collider from the Damping to the Main Linac (40kms of beam line - ~70 Devices in CLIC)

  13. Beam size monitoring with Laser Wire Scanner Baseline solution for linear collider: high spatial resolution would rely on Laser Wire Scanner High power laser Scanning system e- beam Thomson/Compton scattering hn0 hnsc=2 g02 hn0 Y=/2 q  1/g0 (b0 ,g0) e- (bsc, gsc)

  14. Beam size monitoring with Laser Wire Scanner Laser Beam l0 : Laser wavelength w0 : Laser waist size ZR: Rayleigh range Electrons Beam sy: ver. beam size sx : hor. beam size y w0 w0 x 2w0 ZR • The number of X-rays produced is given by with A the interaction area, Ne and Nlaser are the number of electrons and photons in A

  15. Beam size monitoring with Laser Wire Scanner • High spatial resolution need very focused laser beam: Need a optimum Focusing system Lens defined by a focal length f, and diameter D : Performance of Laser : M2=1 for pure Gaussian distribution • Diffraction Smaller F# is better For the single lens, small F# makes spherical aberration large. • Spherical aberration Minimize spherical aberration using several lenses

  16. Beam size monitoring with Laser Wire Scanner Design for ATF2 LWS by G. Blair et al

  17. Beam size monitoring with Laser Wire Scanner Design for ATF2 LWS by G. Blair et al GO to smaller wavelength to do better (green  UV)

  18. Beam size monitoring with Laser Wire Scanner • At high energy, the Compton cross section gets smaller 0 = 6.65 10-24 cm2 • The number of interaction produced is given by Increase the Laser Power (10MW and more)

  19. Beam size monitoring with Laser Wire Scanner • At high energy (>10GeV) the detection system can be easily done either using the scattered photons or the scattered electrons

  20. Measuring Short bunches with femtosecond time resolution • Want capability of compressing by a factor 50: Done in two steps to avoid emittance dilution • High resolution monitor for single shot measurement • - RF deflector : Excellent time resolution but destructive • - Coherent Diffraction radiation for online measurement and feedback system • - EO techniques for single shot longitudinal profile monitoring

  21. Compact Linear Collider IP e- Main Linac e+ Main Linac e- BC2 SR e+ BC2 12 GHz 12 GHz, 100 MV/m, 21 km 12 GHz, 100 MV/m, 21 km 9 GeV 48 km IP = Interaction Point SR= Spin Rotator BC = Bunch Compressor DR= Damping Ring PDR= Pre-Damping Ring AMD= Adiabatic Matching Device Booster Linac e+ BC1 e- BC1 e- DR e+ DR polarizede- unpolarizede+ e- PDR e+ PDR SR 2.86 GeV Injector Linac e-/g Target g/e+ Target Pre-injector e- Linac Pre-injector e+Linac Laser Primary e- Beam Linac 5 GeV Thermionic e- gun DC gun Polarized e- 200 MeV

  22. Bunch compressors DE/E DE/E DE/E Over-compression Under-compression 2sz0 z z z 2sz V = V0sin(wt) Dz = R56DE/E RF Accelerating Voltage Path Length-Energy Dependent Beamline

  23. EO Temporal decoding beam bunch Single shothigh-resolution • Encoding the bunch long. Profile in an intensity modulation of a laser pulse amplitude • Measured the laser pulse leaving EO crystal via single-shot cross correlation in BBO using a short laser pulse Phys Rev Lett99, 164801 (2007) Phys. Rev. ST, 12, 032802 (2009) W.A. Gillespie & S. Jamison

  24. Encoding Time resolution Spectral limitations of the Crystal GaP ZnTe Phonon resonances W.A. Gillespie & S. Jamison

  25. Encoding Time resolution Bandwidth limitation ringing artefacts • Thin crystal (>10mm) • Consider new materials GaSe, DAST, MBANP ..... or poled organic polymers? W.A. Gillespie & S. Jamison

  26. Temporal decoding Time-to-spacemapping The non-collinear nature of the cross correlation geometry provides a mapping of time to spatial position in the BBO crystal and the CCD • Very short laser pulse for time resolution • High laser energy (1mJ) for frequency doubling efficiency W.A. Gillespie & S. Jamison

  27. Conserving small Emittance along the Main Linac • Dispersive emittance dilutions : offset of quadrupoles • Beam based alignment to define a precise reference using high precision BPM (50nm resolution) • Dispersion free-steering - Align quadrupoles precisely • High resolution cavity BPM (50nm for CLIC) • Long linac large number of BPMs: 2000@ILC – 4000@CLIC

  28. Conserving small Emittance along the Main Linac D t b • Wakefields in accelerating structures (damping of high order mode) Bunches passing through an accelerating structure off-centre excite high order modeswhich perturbs later bunches • Tolerances for acc. Structures alignment • Cavity alignment at the 300 mm level @ ILC compared to 5 mm @ CLIC • Need wakefield monitor to measure the relative position of a cavity with respect to the beam

  29. Proposed correction scheme Electron bunch AS with WFM D. Schulte • Wakefield kicks from misaligned AS can be cancelled by another AS • One WFM per structure (142000 monitors) and mean offset of the 8 AS computed • WFM with 5um resolution • Need to get rid of the 100MW of RF power at 12GHz present in the structures Girder Girder Movers

  30. WakeField Monitor design Monopole mode Dipole mode E Field E Field Opposite ports signals are in phase Opposite ports signal have opposite phase When we substract the opposite port signals, the monopole mode is cancelled and the dipole mode amplitude is increased F. Peauger

  31. WakeField Monitor design 12GHz acceleratingcavity Long Waveguide Cut-offat 12GHz SIC Load Regularcellswith SIC load Recombined port signal amplitude Coaxial connector 18.19 GHz 14.81 GHz Middle cellwith WFM 11.95 GHz F. Peauger F (GHz)

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