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MOSFETs: Drain Voltage Effects on Channel Current. Prof. Paul Hasler. Origin of Drain Dependencies. Increasing Vd effects the drain-to-channel region:. increases barrier height. increases depletion width. Drain Characteristics. Current versus Drain Voltage.
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MOSFETs: Drain Voltage Effects on Channel Current Prof. Paul Hasler
Origin of Drain Dependencies Increasing Vd effects the drain-to-channel region: • increases barrier • height • increases depletion • width
Current versus Drain Voltage Not flat due to Early effect (channel length modulation)
Current versus Drain Voltage Not flat due to Early effect (channel length modulation) In BJTs --- Base Modulation Effects
Current versus Drain Voltage Not flat due to Early effect (channel length modulation) Id = Id(sat) (1 + (Vd/VA) ) or Id = Id(sat) eVd/VA In BJTs --- Base Modulation Effects
GND Iout Rout Id(sat) Current versus Drain Voltage Not flat due to Early effect (channel length modulation) Id = Id(sat) (1 + (Vd/VA) ) or Id = Id(sat) eVd/VA In BJTs --- Base Modulation Effects
Early Voltage Length Dependence Width of depletion region depends on doping, not L Might expect Vo to linearly vary with L
Full Range of Effects 7 Punchthrough 6 Slow / Exponential Increase: Channel Modulation / DIBL Effect 5 4 Current (nA) 3 2 Other (faster) effects: Punchthrough --- depletion regions converge Avalanche Breakdown --- impact ionization 1 0 100 (Punchthrough voltage = 2 * VA) Current (nA) 10 Exp model VA = 5V 1 0 1 2 3 4 5 6 7 8 9 10 Voltage (V)
Drain Induced Barrier Lowering Data taken from a popular 1.2mm MOSIS process Data taken from a popular 2.0mm MOSIS process
Drain Voltage Effects • Channel Length Modulation / Early Effect • Exponential Modeling • Drain Induced Barrier Lowering (DIBL): Source of Exponential I-V dependence • Punchthrough: Highest Drain-Source voltage available