Media Lario Technologies Company Presentation

1. Media Lario Technologies Company Presentation 2nd ASPERA Technology Forum EGO/VIRGO site 20th – 21th October 2011 D. Vernani on behalf of MLT teamdervis.vernani@media-lario.com

2. Founded in 1993 under ASI/INAF and ESA sponsored projects Media Lario Technologies (MLT) is a Lecco (Italy) headquartered high precision optics company. It has a 15-year track record in reflective optics for applications in Space & Terrestrial Optics and from 2004 in Semiconductor Capital Equipment and Imaging Optics Markets. COMPANY OVERVIEW Locations • HQ, R&D, Mnfctrg.: Lecco (Milan), Italy • Adv. R&D, S & M Pleasanton, CA, USA Management Team • CEO Dr. Ing. Giovanni Nocerino • CFO Dr. Andrea Maini • CTO Dr. Natale Ceglio • ST-IO Director Dr. Giuseppe Borghi Key indicators • Revenue 2004 & 2010 €1.6m & € 13m • Headcount 2004 & 2010 12 & 95 Employees • “Virtual MLT” 15 Individuals Consultants & Sponsored Student • Supply Chain engaging ~ 30 + “dedicated” personnel Accomplishments • World leader high-prec., electroformed reflective optics • Space: 15-year record (Beppo-Sax, Jet-X, XMM, SWIFT) • Terrestrial: (ALMA, LMT, MAGIC) • Semiconductor: EUVL key (unique) Collector Optics Supplier • Other: initial sales in medical devices Customers & strategic partners • ESA, ASI, ESO , Thales Alenia, MPE, INAOE • Intel, ASML, Nikon, Canon, Philips, Ushio Consortia & Centers of Excellence • EUVA, INAF(OAB), INFN, Sematech, IOF, LLNL, Medea+, SPIE HQ ,R&D, Production facility Lecco , Italy XMM X-Ray Telescope International footprint Nested EUVL collector

3. Customers & strategic partners Consortia & affiliations MLT is an integral part of the EUV , X-Ray & Terrestrial Telescopes supply chain and works with all of the industries leaders and standards setting bodies. MLT CUSTOMERS, PARTNERS & AFFILIATIONS

4. Media Lario Technologiesa successful example of an Italian Space Technology Spin-off. Continuous and synergistic technology evolution from Space Technologies to Industrial Applications & vice versa. From the XMM Mission • High Precision 58-shell Nested Mirrors • Complex Structure Electroforming Eng. • Shape, Thermal & Structural control • X-Ray Reflective Surface & Material Tech. • High Accuracy Replication Manufacturing • System Integration and Testing The Space Technology Spin-off XMM – Newton / X-Ray Telescope “The most powerful X-ray Telescope ever built” Prof. Dr. Roger Bonnet, ESA Director of Science, Kourou, 10 Dec. 99. XMM-Newton TERRESTRIAL TELESCOPES IMAGING OPTICS EUV LITHOGRAPHY

5. EUVL Lithography • The challenge for EUVL is to scale to higher throughput and lower Cost of Ownership • The challenge is greater at the source and collector: • Higher power loading • More precise optical performance Collector Optics Current and evolving success Next Generation of Lithography Collector

6. MLT Optics for X-ray Astronomy BEPPO-SAX JET-X XMM eROSITA NHXM 1990-1993 1993-1995 1995-2000 2006 …2015

7. TERRESTRIAL TELESCOPES - ALMA The Atacama Large Millimeter/SubmillimeterArray (ALMA), will be a single research instrument composed of up to 80 high-precision antennas, located in Atacama, 5000 m above sea level. Resolutions as fine as 0.005" will be achieved at the highest frequencies, a factor of ten better than the Hubble Space Telescope. 4 The MLT contribution is the MAIT of 3.000 high precision primary reflector panels for the ALMA European Antennas. ESA strongly contributed to this success through TRP programs.

8. TERRESTRIAL TELESCOPES – MAGIC II MAGIC II is a telescopes for the detection of very high energy electromagnetic particles, gamma rays, via atmospheric Cherenkov imaging, with a mirror surface of 236 m2. Located on the Canary island of La Palma, it is operated by an international collaboration of 17 institutes. MLT produced and tested more than 100 cold slumped high accuracy glass Panels for MAGIC II.

9. Reflective optical components & subsystems MLT is a fully integrated designer and manufacturer of reflective optical components & subsystems, from design to qualification MLT develops and manufactures customized designs to meet application requirements

10. The CENTRE of EXCELLENCE (CoEAP) MLT has developed proprietary methodologies and processes for substrates polishing and superpolishing allowing to reach high surface accuracy and ultra low roughness on highly aspherical optics. These capabilities have been integrated into CoEAP able to compete at European level and to support the MLT grow. Ability to polish and measure work pieces with cylindrical, spherical and aspherical geometry. 240 m2 Clean room 2 Deterministic Polishing machines 3 super-polishing machines 3 State of the Art metrology instruments 11 Personnel (PhD, Eng. And techs) Established in 2010-Q1 the CoEAP in collaboration with INAF-OAB Developed and qualified proprietary polishing, superpolishing, and metrology processes for ultra low roughness master series production and u.d. for aspherical Normal Incidence Mirrors Produced 12 X-Ray masters for ASI and MPE in 9 months Produced three for ESA Large Simulator Reflectors Optimized performances of EUVL grazing incidence masters Ongoing aspherical lenses process development study

11. THANK YOU VERY MUCH FOR YOUR ATTENTION

12. Grazing Incidence Mirrors by e-forming • MLT production process uses a master of different materials (such as glass, NiP, Al, Steel) with sub-nano surface roughness finish in different geometries depending on the type of application: • This master is cleaned with a special cleaning process to remove particulate and molecular contamination • Completed this process, the matrix is usually coated with a coating by vacuum evaporation technique • The master is fitted with special attention on suitable racks and electroformed via a galvanic process • the mirror is separated from the master by cooling

13. Grazing Incidence Mirrors by e-forming e-beam evaporation cleaning e-forming integration release coating

14. Cold Slumping Technique

15. Product Design Media Lario Technologies has developed optical design expertise, with particular reference to reflective grazing incidence optics for Extreme Ultra-Violet Lithography (EUVL) at 13.5 nm and Imaging Optics Multispectral sensors Optical design & simulation Optical analysis & design coupled to thermo-structural FEA 3 Zemax licenses Proprietary codes for fast design & analysis of nested grazing incidence optics Optical design of choice for Canon EUV small field exposure tool ASML / Nikon EUV lithography alpha-tool Philips EUV lithography beta-source 7 pending patents on optical design Thermal and structural design of fluid-cooled optics capable of removing > 6 kW. Evolving design to ~40 kW High efficiency lithography collector design Finite Element Model of a EUVL collector

16. Mandrels manufacturing (1/2) MLT has developed and established a core competence for designing and manufacturing of extreme accurate and low roughness masters enabling the production of non conventional optics X-ray masters ROUGHNESS HSFR about 3 Å Ra X-ray masters SHAPE ACCURACY better than 6 arcsec HEW (Half Energy Width) Dimensional Tolerances better than 10 m Normal Incidence Spherical masters SHAPE ACCURACY up to λ/20 P-V (λ = 632.8nm) Super-smooth Mandrels for Hard X-Ray optics compliant with scientific requirements ACHIEVEMENTS CAPABILITIES • Masters OPTICAL and MECHANICAL design • Normal Incidence Spherical/Aspheric masters • GRAZING Incidence Aspheric masters • Diameter up to 750 mm • Height up to 700 mm • Superpolishing down to sub-nanoscale • TechnologicalEdgemetrologicalequipments Grazing Incidence Wolter-I type master for X-ray mirror (Diameter = 300 mm; Height = 680 mm ) Surface microroughness achieved on grazing incidence master as measured by Optical Profiler (area 150 x 110 m)

17. Mandrels manufacturing (2/2) MLT has developed and established a proprietary process for improving the shape accuracy of grazing incidence mandrels enabling the production of non conventional optics Grazing Incidence mandrel under figuring (Diameter = 300 mm; Height = 680 mm ) Shape accuracy obtained by figuring on grazing incidence master as measured by Optical Profilometer MPR

18. Mirror manufacturing With respect to XMM program, MLT has developed and established innovations in electroforming process control able to keep internal stress within 100 kPa accuracy. Capabilities for NIM performances has been achieved allowing for imaging applications Mirror design and e-forming simulation Ni, Cu electroforming Controlled stress electroforming ElectroformingwithalloysNiCo, NiCoP. Electronic Stress Monitor for plating Fixture and shielding designs Special galvanic plating Rh and Ru X-ray and EUV Mirror ROUGHNESS HSFR and MSFR about 3 Å RMS NIM Mirror SHAPE ACCURACY better than λ /4 P-V (λ = 632.8nm) Mirror for Hard X-Ray optics compliant with scientific requirements eROSITA, Simbol X, NHXM Normal Incidence Mirror (above) and NiCo Grazing Incidence Wolter-I type mirror for X-ray application (right) Comparison of the on-axis HEW for the MS286, MS291+295, EM#3, as measured with the PSPC in monochromatic setup at PANTER, and with TRoPIC in energy-dispersive setup

19. Reflective Coatings MLT has capabilities for design and production of leading edge coating specific for the products and served applications Internal and Outsourced Coating processes and equipment qualified for a variety of applications Constantly expanding technology portfolio Industrial Approach Inside cylinders and dishes Large dimensions possible Visible (Al/SiO2) UV (Al/SiO2) EUV Grazing Incidence (Ru) EUV Normal Incidence (Mo/Si) Soft X-ray 1-10keV (Au, Pt) Hard X-ray 10-80keV (Ni/C - W/Si – Pt/C multilayer) SEM image of the Ru layer surface

20. METROLOGY (1/2) Micro-roughness, Figuring and Reflectivity metrology capabilities are supporting and qualifying masters, mirrors, and optical subsystems developments Micro-roughness measurement facilities: Atomic force microscope: spatial wavelength range 100–10 nm, accuracy 0.05 nm Two White light Interferometer: spatial wavelength range 2mm–1 µm, accuracy 0.1 nm Figuring error and 3D measurement facilities: 3D coordinate measuring machine (Zeiss UPMC) measuring vol. 1200x1000x1000mm3 3D coordinate measuring machine (POLI TCX) 3000 x 2000 x 1000 mm3 Master and shell profilometers accuracy down to 70nm Reflectivity measurement facilities: In-band (at λ = 13.5 nm) compact reflectometer for samples In-band (λ =13.5 nm) reflectometer for mirror shells Established full metrology chain for a complete dimensional and surface texture characterization of optical component and subsystems Large metrology facilities for micron accuracy measurements (i.e. ALMA panels) In-band (at λ = 13.5 nm) collection efficiency qualification for grazing incidence EUVL collectors

21. METROLOGY (2/2) High performances dedicated profilometershave been design, developed and qualified for full geometrical chracterization of optics for Space, Litho and Imaging Optics applications, providing high accuracy Free Form optics measurement capabilities Optics profilometerrotondimeter Grazing incidence shell profilometerrotondimeter

22. INTEGRATION AND OPTICAL METROLOGY Capability for design, manufacturing and qualification of custom tailored optical benches exploited during integration and optical verification of final products Optical benches: Collimator 800 mm  for telescopes Wyko 6” interferometer Shack-Hartmann wavefront sensor Dedicated benches for grazing incidence optics for litho collectors (conjugate planes distance to 2.5 m) Dedicated benches for UV verification of XRAY telescopes up to 12m focal length and 700 mm in diameter Robot assisted laser welding Five grazing incidence telescopes of XMM (lunched by Ariane 5 on Dec.99) >20 Grazing incidence collectors for EUV lithography at 13.5 nm Commercial Ritchey-Chretien telescopes for telecommunications (free-space optics at 1550 nm) >100 Spherical panels for Cherenkov Telescope Array (Magic)

23. Metrologia di forma Strumenti per la metrologiadimensionale

24. Misure di rugosità Strumenti per la misuradirugosità