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Measurements @ Dortmund on TESLA-ON wafers

Measurements @ Dortmund on TESLA-ON wafers. J.Kudlaty on behalf of the group of Dortmund April 2004. Mask alignment. Mask Alignment (H-V) Wafer n-side L n-side R p-side L p -side R ID marking. very bad wafers cut ! see next slide.

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Measurements @ Dortmund on TESLA-ON wafers

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  1. Measurements @ Dortmund on TESLA-ON wafers J.Kudlaty on behalf of the group of Dortmund April 2004

  2. Mask alignment Mask Alignment (H-V) Wafer n-side L n-side R p-side Lp-side R ID marking very bad wafers cut ! see next slide Atlas Pixel Italia Apr 2004

  3. All 4 wafers from batch #5371 have got bad mask alignment. Test structures are partially or at all unseen ? Atlas Pixel Italia Apr 2004

  4. All 5 wafers from batch #6260 have got asymmetric cut of edges Atlas Pixel Italia Apr 2004

  5. Planarity ( 40µm) Atlas Pixel Italia Apr 2004

  6. 5371-10 5371-08 5371-11 5371-18 Atlas Pixel Italia Apr 2004

  7. I-V on diodes 16,17 (IVD) Atlas Pixel Italia Apr 2004

  8. C-V on diodes 16,17 (CVD) Atlas Pixel Italia Apr 2004

  9. I-V on tiles 01,02,03 Atlas Pixel Italia Apr 2004

  10. I-V on SC’s 04-09 and MC’s 10-13 Atlas Pixel Italia Apr 2004

  11. I-t on good tiles (ITS)so far has been measured 1 wafer Wafer-tileS Atlas Pixel Italia Apr 2004

  12. I-V on MOS 22,24 (BOX) Atlas Pixel Italia Apr 2004

  13. C-V on MOS 22,24 (COX) Atlas Pixel Italia Apr 2004

  14. I-V on gate-controlled diode (IVG)so far 5 wafers have been measured Atlas Pixel Italia Apr 2004

  15. I-Vg on MOSFET (MFE) Atlas Pixel Italia Apr 2004

  16. Vpix-V (PUT) Atlas Pixel Italia Apr 2004

  17. Overview Atlas Pixel Italia Apr 2004

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