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Tomsk Polytechnic University

Nuclear Physics Institute. Faculty of Natural Sciences and Mathematics. Tomsk Polytechnic University. Department of Hydrogen Energy and Plasma Technologies. Research of Technologies based on Plasma Treatment of Materials in Tomsk Polytechnic University Prof. Valery P. Krivobokov.

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Tomsk Polytechnic University

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  1. Nuclear Physics Institute Faculty of Natural Sciences and Mathematics Tomsk Polytechnic University Department of Hydrogen Energy and Plasma Technologies Research of Technologies based on Plasma Treatment of Materials in Tomsk Polytechnic University Prof. Valery P. Krivobokov 2A Lenina Avenue, Tomsk, 634050 Russia e-mail: krivobokov@npi.tpu.ru, Phone/Fax: 7-3822-417956

  2. Tomsk Polytechnic University Report Outline • General information. Organization of researches. • Solids surface erosion under the action of high-power pulsed beams of charged particles. • Plasma sources in diodes of magnetron type. 4. Ion sources with closed drift of electrons. • Setups and technologies on plasma coating deposition. • Conclusion. 2

  3. Tomsk Polytechnic University Place of Nuclear Physics Institute and Hydrogen Energy and Plasma Technologies Department in the Structure of TPU Tomsk Polytechnic University Research Institutes Faculties Customers Faculty of Natural Sciences and Mathematics Nuclear Physics Institute Strategic partners Laboratory of Plasma Technologies (#23) Department of Hydrogen Energy and Plasma Technologies SPO PM HCEI 3

  4. Tomsk Polytechnic University Nuclear Physics Institute 4

  5. Tomsk Polytechnic University 5

  6. Tomsk Polytechnic University 6

  7. Tomsk Polytechnic University Department of Hydrogen Energy and Plasma Technologies • Number of employees – 13; • Number of students – 60. • There are three professors including Professor V. E. Nakoryakov the laureate of Global Energy Prize. • Curriculum of Bachelor’s degree • Major - Physics • CurriculumMaster’s degree: • 1. Plasma Physics • 2. Beam and Plasma Technologies • 3. Hydrogen Energy 7

  8. Tomsk Polytechnic University The following employees of laboratory #23 of Nuclear Physics Institute and department “Hydrogen Energy and Plasma Technologies” took an active part in this work: 8

  9. Tomsk Polytechnic University • Organizations in cooperation with which the researches have been performed: - Public corporation“Cathode” (Novosibirsk, Russia); - Plasma Tech. Co , Ltd (Southern Korea); - Preciosa, Ltd (Czech Republic); - ITAC Ltd (Japan); - Sunic Syst. Ltd (Southern Korea); - High-Current Electronics Institute Russian Academy of Sciences (Tomsk); - Scientific Production Organization of applied Mechanics (Krasnoyarsk region, Russia); - Siberian Chemical Plant (Tomsk region, Russia) - Shinco Pantec,Ltd (Japan) and others. 9

  10. Tomsk Polytechnic University • The most important application areas of material radiation and plasma treatment • Modification of mechanical properties of materials (increase of wear resistance of cutting tools, decrease of friction factor etc.). • Improvement of optical properties (reflection, antireflection, low-emission, decorative coatings, production of multi-layer light filters and so on). • Increase of surface durability in aggressive and/or high-temperature media (deposition of passive materials on the important details, increase of wear resistance and so on). • Creation of conductive coatings (electrodes, microchips, sensor elements, resistance films, signal systems, superconducting coatings etc.). • Coatings for medical application (calcium-phosphate layers, tool treatment, medical optics and so on). • Technological coatings (production of photomasks, deposition of adhesion layers and others). 7. Plasma chemical processes and so on. 10

  11. Tomsk Polytechnic University The most critical place of any material or detail is surface. To improve the material properties = to remove defects from surface. There are two main tasks when treating the material surface by plasma or charged particle beams: 1) To remove spare atoms from surface (by means of erosion with assistance of high-energy particle beams or plasma chemical cleaning); 2) To apply atoms which will improve the physical properties of material on the surface (by means of formation thin-layer coatings with high functional parameters on the surface). 11

  12. а) b) c) Tomsk Polytechnic University Surface Sputtering by Accelerated Ions Dependence of Cu sputtering factor on ion energy [Yu. A. Ryzhov, I. I. Shkarban. Summary of experimental data on mass-transfer between atomic fluxes and polycrystalline surfaces, Proceedings of Moscow Aviation Institute. 1975.] Schemes of collisions leading to sputtering : а – ricochet sputtering, b – sputtering primary knocked-out atoms response, c–sputtering of atoms as the result of collision cascade 12

  13. Tomsk Polytechnic University Evaporated layer j Pulse Beam i+Beam Permanent Beam τ = 100 ns t i Ion Beam Energy Consumption Zone Evaporated Atoms t Surface sputtering by high-power nanosecond ion beams 13

  14. Tomsk Polytechnic University Beam parameters: • е- , С+, (Н+ + С+), Ar; - pulse duration =10-8…10-6s; • Initial energy of particles E= 10 … 1000 keV; • power densityP= 107…1010W/cm2; • time base of voltage and current density made by experimental data. Target material: Mainly the following metalswere used(Cu, Al, Fe, Pb, W and so on). 14

  15. Tomsk Polytechnic University • Ion beams•Electron beams D= S + Q; D = Q; (atP>107 W/cm2Q>>S) Here: S – sputtering coefficient conditioned by atom collision processes; Q – component of erosion coefficient induced by evaporation; D – summary coefficient of surface erosion. 15

  16. Tomsk Polytechnic University Hydrodynamic Model of Evaporation • Equation of continuum: • Equation of matter state: Е = ЕХ(V) + ЕТ (V,T)+ Ее(V,T), Р = РХ(V) + РТ (V,T) + Ре(V,T). Position of boundary between vapor and condensed phases Z: ЕT(,Т)= L()= L0 - EX() (для  < 0) • Erosion coefficient: 16

  17. Tomsk Polytechnic University Heat Model for Evaporation Calculation[P<(1..5)·109 W/cm2] Equation of thermal conductivity in co-ordinates related to the evaporated surface: Boundary condition on the irradiated surface: Erosion coefficient: 17

  18. Tomsk Polytechnic University Heat model of surface evaporation: comparison of calculations and experimental data Dependence of evaporated quartz layer thickness Z irradiated by mix beam 50%Н+ + 50%С+ с Е=500 keV, τ=150 ns on current density j: 1 – experiment (measurement by profile meter “Tallysurf 5-20” with resolution 0.05 µm); 2 - calculation 18

  19. Tomsk Polytechnic University Parameters of pulsed beams of charged particles within the range of 10..1000 keV to provide maximal values D 19

  20. Anode Substrate Conditional Anode Plasma Spattered Atom Operating Gas Ion Elektron Traectory of Second Electron Target Magnet System Tomsk Polytechnic University Plasma Deposition of Coatings Idea of magnetron operation Spatial distribution of potential on magnetron diode Processes in diode space 20

  21. Tomsk Polytechnic University Types of magnetrons 21

  22. Tomsk Polytechnic University Planar Magnetron 22

  23. Tomsk Polytechnic University Cylindrical Magnetrons 23

  24. Magnetron Magnetron Power supply Tomsk Polytechnic University Construction of Twin Magnetron: Purpose is deposition of dielectric coatings in reactive gas medium 24

  25. Tomsk Polytechnic University Magnetron with Liquid-Phase Target 25

  26. Target ГУ-95 Magnetron Substrate Vacuum chamber Driving generator Water F = 13,56 MHz, Р ~ 1-10 kW Main purpose is deposition of coatings made of dielectric targets Tomsk Polytechnic University High-Frequency Magnetron 26

  27. Magnetic enhancer i i i Plasma Anode N S Body Tomsk Polytechnic University Ion source with closed drift of electrons Motion direction of ion beam 27

  28. Substrate Ion source with closed drift of electrons Coating Target atom sputtered by ion beam Target Tomsk Polytechnic University Magnetron with Ion Assistance 28

  29. Tomsk Polytechnic University Setup with magnetron sources of plasma “Yashma” 29

  30. Tomsk Polytechnic University Laboratory magnetron setup “Yashma-2” 30

  31. Tomsk Polytechnic University The Amethist-3 Setup Intended for glass treating. Maximal size of glass sheets is 1600x2500 mm. Productivity is 15 sq. meters per hour. 31

  32. Стеклопакет Structure of coating 20оС SnO2 34 nm 2 nm 10 nm 2 nm 34 nm Ni (80%) – Cr (20%) Ag SnO2 Glass -20оС Double-glass unit Tomsk Polytechnic University Low-Emission Plasma Coatings on Glass Ni (80%) – Cr (20%) 32

  33. 1 - sluice; 2 – slit shutter; 3 – reversing chamber; 4 – operation chamber; 5 - zone of glass-holder motion while treating Ion source Magnetron I 4 3 2 1 Glass 5 II 4 3 1 2 5 III 4 1 2 2 1 5 IV 3 4 1 2 3 5 V 1 1 2 4 2 3 3 5 Tomsk Polytechnic University Construction of Double-Row Plasma Setups of “Opal”-Series 33

  34. Tomsk Polytechnic University The Opal-2 Plasma Setup Intended for Low Emission Coating on glass. Maximal size of glass sheets is 1600x2500 mm. Productivity is 25 sq. meters per hour. 34

  35. 1- sluice; 2 – slit shutter; 3 – reversing chamberI; 4 - operation chamber; 5 – reversing chamber II; 6 – diffusion pump; 7 - electric energy supply; 8 - control board; 9 - working place of operator; 10 – glass after treatment; 11 – glass before treatment; 12 – washing system; 13 - rotation device; 14 - hoisting appliance; 15 - carriage with holders; а) zone of glass preparation; b) zone of plasma treatment 4 5 3 7 2 1 6 15 14 13 8 12 9 10 11 b а Tomsk Polytechnic University Technological line on the base of setup “OPAL-3Pro” 35

  36. Томский политехнический университет Tomsk Polytechnic University Setup “Opal-3 PRO” 36

  37. Томский политехнический университет Magnetron with silver target Magnetrons with titanium targets Magnetrons with titanium targets Ion sources Glass unload Glass load Chambers of velocity smoothing Chambers of velocity smoothing Pumping units Sluice chamber Slit shutter Magnetrons with targets of [Ni (80% - Cr (20%)] Slit shutter Sluice chamber Tomsk Polytechnic University Construction scheme of setup “Opal-5” (frame details) This configuration is intended for the deposition of five-layer low-emission coatings of the following type TiO2 (32 nm) – [Ni (80%) – Cr (20%)](2 nm) – Ag (10 nm) – [Ni (80%) – Cr (20%)] (2 nm) – TiO2 (32 nm). In case it is necessary to deposit the easier film structures the freed magnetrons can have their targets changed. 37

  38. Tomsk Polytechnic University Томский политехнический университет Technological line basing on “Opal-5” 38

  39. Томский политехнический университет In2O3(95%)- SnO2(5%) (антистатик) Стекло Ag Ni(80%) – Cr (20%) Клеящее вещество Установка АРМ НТП-2 Tomsk Polytechnic University Плазменные покрытия для защиты искусственных спутников Земли 39

  40. Оборудование для учебной лаборатории кафедры ВЭПТ 1. Плазменная установка для нанесения тонких плёнок 2. Плазменная установка с Twin-магнетроном 2

  41. Установка для контролируемого нанесения многослойных плазменных покрытий «Яшма-5» 3

  42. Автоматизированная установка АРМ УВК для нанесения модифицирующих плазменных покрытий на бортовые элементы космических летательных аппаратов На установке реализованы шесть новых технологий нанесения плазменных покрытий 5

  43. Томский политехнический университет Tomsk Polytechnic University Summary: 1. Technologies of material treatment basing on the use of plasma and charged particle beams have good perspectives of practical application in the nearest future. Their market rapidly grows and Tomsk Polytechnic University is an active participant here. 2. We see the development of new technologies, creation of new sources of accelerated ions and plasma fluxes, plasma wider application in hydrogen energy technology as the main perspectives. 3. Team of plasma experts of TPU has intention to continue working in this direction and to unite the experience of other universities especially of Europe for the development of hydrogen energy and plasma technologies. 40

  44. Томский политехнический университет Tomsk Polytechnic University Thank you for attention

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