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Status of ALD MCP Program at Argonne within last Six Months

Status of ALD MCP Program at Argonne within last Six Months. Qing Peng, Anil Mane, Joe Libera, Jeffrey Elam Energy Systems Division. MCP Structure. pore. resistive coating (ALD) emissive coating (ALD) conductive coating (thermal evaporation). Work Plan and Deliverables. Year 1

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Status of ALD MCP Program at Argonne within last Six Months

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  1. Status of ALD MCP Program at Argonne within last Six Months Qing Peng, Anil Mane, Joe Libera, Jeffrey Elam Energy Systems Division

  2. MCP Structure pore • resistive coating (ALD) • emissive coating (ALD) • conductive coating (thermal evaporation)

  3. Work Plan and Deliverables • Year 1 • Emissive coatings • Resistive coatings • Year 2 • Stripe coating (“Dynode Chain”) • MCPs from AAO templates • Begin scale-up • Year 3 • Scale-up Majority of Year One goals completed!!!

  4. Six months Ago • Only ALD available

  5. Right NowNew Hardware: Measurement Mercury probe – conductance of thin films in air, computer controlled Order placed Various substrate holders Have been built Vacuum setup – HV conductance and thermal coefficient of MCPs Fixture for electrode evaporation with end spoiling on 3 MCPs Shadow mask – measure lateral resistance of thin films

  6. General procedures for Fabrication of MCPs 30mins 2 hrs Acetone sonication clean Air dry at 200C >2h Loading in Vacuum reactor Pristine MCPs 2 hrs 4 hrs Electrode coating Baking at 400C under N2 Ozone clean ALD coatings 10 hrs 6 hrs For fabricating one pair MCPs: ~20-30hrs if everything is right Testing resistance Deliver for testing 3 hrs

  7. Resistive Coatings: Al2O3/ZnO (AZO) • Good: existing process • Bad: hard to control (etching of ZnO by trimethyl aluminum precursor) • Can we make working MCPs with AZO? • Still working on it • Problem: • Big slope (105 resistance change over 10% composition change) • Etching of ZnO by trimethyl aluminum precursor • Strong dependence of resistivity on Annealing conditions • Strong dependence of resistivity on environment etching • AZO can be prepared by a variety of methods • Unable to eliminate etching

  8. Temperature dependence of 20% AZO conductivity 120C 80C 100C Gas chromatograph (GC) for temperature control 60C 40C 25C Standard Glass MCP: βT=-0.02 Micromachined silica MCP: βT=-0.036 Commercial MCP (using our setup): βT=-0.045 20% AZO MCP: βT=-0.06 MCPs in in GC with leads

  9. Resistive coatings: MgO/ZnO (MZO) Quartz Microbalance Data: • No etching in MZO • Resistance is tunable • MgO is candidate for SEY layer • No MCPs made yet with MZO Thickness (Angstroms) Will work more on this system.

  10. Resistive Coatings: “New Chemistry 1” MCP Resistance (Ohms) Relative Composition • No etching • Resistance is tunable, small slope (102 over 10%) • Very reproducible (different locations, different batches) • MCPs work: (20 micron, 60 L/D, 1x106 gain at 1200V) • 11 MCPs to testing group

  11. Temperature coefficient – “New1” Standard Glass MCP (literature): βT=-0.02 Commercial MCP (using our setup): βT=-0.045 20% AZO MCP: βT=-0.06 New1: βT=-0.027

  12. Emissive Coatings • Substrates: • Si(100) - conductive, smooth, flat, cheap • Photonis MCPs • ALD MCPs • Films: • Al2O3, MgO, SiO2, ZnO/Al2O3 • 1-100 nm • Major parameters to investigate: • Annealing conditions • Deposition conditions • 55 samples to characterization group • Goals: • Manuscript on ALD emissive coatings • Optimal thickness and composition for ALD MCPs No ALD ALD

  13. Electrode Deposition • Thermal evaporator (Au) • Hau Wang, MSD: Au has poor adhesion, can’t do endspoiling • E-beam coaters (NiCr) • Orlando Auciello, MSD • Beihai Ma, ES • Robert Erck, ES • John Pearson, MSD • Wai Kwok, MSD • Eileen Hahn (FermiLab) • CNM • Proposal accepted, Ebeam working for three weeks. Can’t do endspoiling • Outside ANL: Clausing, Arradiance, Photonis (sent samples 3 weeks ago) • Electrode first???

  14. Future Plans • AZO: • Manuscript on AZO MCPs • Explore anisotropy of conductance (thru film vs. across film) • MZO: • Manuscript on “ALD method” • Make and test MCPs • “New1”: • Complete study • Continue making and testing MCPs • “New2”, “New3”… • Scale-up • large area coater, Beneq (4/26/10)

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