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ALD functionalization of AAO microchannel plates. May 25 2010. Anil Mane, Qing Peng, Jeff Elam ALD Research Program, Process Technology Research Group Energy Systems Division. Objective: To test AAO MCPs with ALD coatings. Received 4 AAO MCPs from Synkera
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ALD functionalization of AAO microchannel plates May 25 2010 Anil Mane, Qing Peng, Jeff Elam ALD Research Program, Process Technology Research Group • Energy Systems Division.
Objective: To test AAO MCPs with ALD coatings • Received 4 AAO MCPs from Synkera • Functionalized with resistive coating by ALD • Al:ZnO 20:80% (Targeted thickness = 50) • ANL Chemistry 1 (Targeted thickness = 100A)
Photographs of AAO discs as received and with ALD coating As received AAO MCP Coated with AZO Coated with new chemistry 1 (AAO # 4483) (AAO # 4482) • Stains on one side After resistive coating Active area After Cr electrode at CNM (Active area pop-up) • Stains side shows non-uniformity and different appearance
I-V plot for AAO disc (# 4484) with ALD of “new chemistry-1” • Resistance is higher than expected
I-V plot for AAO disc (# 4483) with ALD of “Al:ZnO (20:80)” • Resistance is higher than expected
Summary • As received AAO MCPs has stains on one side • Tested two AAO MCPs with resistive coating by ALD • Resistance is higher than expected (calculation check?) Next plan • Need clean AAO MCPs with both side similar opening • Coating penetration depth and uniformity (SEM) • Tuning workable resistance • Thermal coefficient • Workable pair for gain testing