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Electronics, microelectronics, nanoelectronics, … Part II. Mizsei , János www.eet.bme.hu. Outline. nanoscale effects 3-2-1-0 dimensions atomic scales : different transport mechanisms ( thermal , electrical , mechanical ) technology at nanoscale lithography by nanoballs nanoimprint
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Electronics, microelectronics, nanoelectronics, …Part II Mizsei, Jánoswww.eet.bme.hu
Outline • nanoscaleeffects • 3-2-1-0 dimensions • atomicscales: differenttransportmechanisms (thermal, electrical, mechanical) • technologyatnanoscale • lithographybynanoballs • nanoimprint • Langmuir-Blodgetttechnology • MBE – molecularbeamepitaxy • FIB – focused ion beam • AFM, STM processes • nanoscaledevices • QWFET • singleelectrondevices • nanotubes • nanorelays • organic molecular integrated circuits • vacuum-electronics • spintronics • kvantum-computing • oxideelectronics • thermalcomputing
Nanoscale effects • density of states for • 3 • 2 • 1 • 0 dimension objects • tunnelling • surface/interfacescattering • ballistictransport
Technologies at nanoscale • lithographybynanoballs • nanoimprint • Langmuir-Blodgetttechnology • MBE – molecularbeamepitaxy • FIB – focused ion beam • AFM, STM processes
Langmuir-Blodgett technology formolecularmonolayer
MBE – molecular beam epitaxy Computer controlledevaporation (PVD)
FIB – focused ion beam • Applications of FIB: • cross-sectional imaging through semiconductor devices (or any layered structure) • modification of the electrical routing on semiconductor devices • failure analysis • preparation for physico-chemical analysis • preparation of specimens for transmission electron microscopy (TEM) or other analysis • micro-machining • mask repair
FIB – focused ion beam FIB drilled nanoholeforthermalnanoswitchwithPtoverlayer
AFM processes Hotplatefor AFM excitedagglomeration and peeloff Nanostructures by AFM tip excitation of hot (120 oC) silver nanolayers
AFM processes Quantum corall by AFM tip (Fe on Cu surface)
Microscopic charges on SiO2 surfaces Si: P type, <100>, 10 ohmcm 100 nm native oxide oxide
Charging process:(AFM, “conducting wire”) Measuring process: (Kelvin electric force microscopy) Low resolution, compared to the charging process !
11:30:29 AM Fri Aug 19 2005 3 V 2 1 -1 -2 -3 04:11:07 PM Thu Aug 18 2005 3 V 2 1 -1 -2 -3
11:30:29 AM Fri Aug 19 2005 Only after 300 C heat treatment ! 3 V 2 1 -1 -2 -3 04:11:07 PM Thu Aug 18 2005 3 V 2 1 -1 -2 -3
Microscopic charge on the SiO2 surface Extremely high and inhomogeneous electric field: 700000V/m
Nanoscale devices • QWFET • singleelectrondevices • nanotubes • nanorelays • organic molecular integrated circuits • vacuum-electronics • spintronics • oxideelectronics • thermalcomputing
QWFET – quantum well fet • low bandgap enables lower supply voltage • higher bangap substrate helps to keep electrons in the channel • higher mobility results in higher current Schottky-barriertype (depletion) device
QWFET • Problematic point: compound semiconductor in Si based technology
Advantages of QWFET • higher speed at lower power dissipation
Single electron devices: charge-memory • SET read-out • 50 nm head-surfacedistance • ~10 nm grainsize • ~10 Terabit/inch2
Carbon • diamond • graphite
Carbon nanotubes as quantum wires density of statesdependingofchirality
Micro-, and nanorelays • nanorelays: instable mechanical movement, stick down Nanorelays
Molecularsingleelectronswitchingtransistor (MOSES) Atom relaytransistor (ART)
Organic molecular integrated circuits • Problems with the organic molecular ICs: • technology (it has not been realised until now) • metal contacts and wires (atomic contact) • chemical instability • slow operation depending on number of electrons/bit ratio
Vacuum-electronics: nanosised „Vacuum tube” • Vertical field emission: Lateral field emission: • MOSFET- like • gated devices
Field emission • by gate control
Technology resistplasmatreatment and reflow
Spin: Einstein–de Haas effect Switch on and off with the resonance frequency of the suspended mass
GMR - giant magnetoresistance Lowresistancehighresistance