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Plasma synthesis and processing

Girshick. Plasma synthesis and processing. Goals. Develop plasma process for synthesis of Al nanoparticles Study effects of process conditions on particle properties Develop process for passivating particle surfaces Develop computational simulations of flow in reactor

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Plasma synthesis and processing

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  1. Girshick Plasma synthesis and processing Goals • Develop plasma process for synthesis of Al nanoparticles • Study effects of process conditions on particle properties • Develop process for passivating particle surfaces • Develop computational simulations of • flow in reactor • particle formation • particle coating • particle dynamics

  2. Girshick (cont.) Progress • Synthesized Al particles over range of conditions fromAlCl3 feed system in plasma torch apparatus • Determined effects of reactant feed rates and of counterflow on particle-size distributions with scanning mobility particle sizer • Characterized particles off-line by • transmission electron midroscopy • energy dispersive X-ray spectroscopy • In progress: • thin oxide growth on Al nanoparticles • passivation with polymer films

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