1 / 22

Development of Scanning Probe Lithography (SPL)

Development of Scanning Probe Lithography (SPL). 1) “ Device fabrication by scanned probe oxidation ”, Science, 1995 2) “ Nanofabrication by scanning probe microscope lithography: A review ”, J. Vac. Sci. Tech., 2005 3) “ Scanning Probe Parallel Nanolithography with Multiprobe Cantilever

bethany-duffy
Download Presentation

Development of Scanning Probe Lithography (SPL)

An Image/Link below is provided (as is) to download presentation Download Policy: Content on the Website is provided to you AS IS for your information and personal use and may not be sold / licensed / shared on other websites without getting consent from its author. Content is provided to you AS IS for your information and personal use only. Download presentation by click this link. While downloading, if for some reason you are not able to download a presentation, the publisher may have deleted the file from their server. During download, if you can't get a presentation, the file might be deleted by the publisher.

E N D

Presentation Transcript

  1. Development of Scanning Probe Lithography (SPL) 1) “Device fabrication by scanned probe oxidation”, Science, 1995 2) “Nanofabrication by scanning probe microscope lithography: A review”, J. Vac. Sci. Tech., 2005 3) “Scanning Probe Parallel Nanolithography with Multiprobe Cantilever Array Fabricated by Bulk Silicon Micromachining”, IEEJ, 2008 EE C235/NSE C203 Nanofbrication Jun SukRho

  2. Scanning Probe Lithography • Bottom Up Technique • - Chemical and molecular patterning (DPN) • Top down Technique • - Mechanical Patterning • Scratching • Nano Indentation • - Voltage bias application • Field Enhanced Oxidation • Electron exposure of resist materials • Substitution Technique • - Manipulation of nanostructures Mar. 9th. 2009 Rho, Jun Suk

  3. Achievements Dec. 10th. 2008 Mar. 9th. 2009 Rho, Jun Suk

  4. Scanning Probe Lithography (SPL) Atomic Force Microscopy (AFM) Scanning Tunneling Microscopy (STM) Scanning Probe Parallel Lithography (SPL Array) Dec. 10th. 2008 Mar. 9th. 2009 Rho, Jun Suk

  5. Began at NIST in 1989 Typical line width: below 50nm Scan rate: 10~20um/s Creating patterns with high resolution but are limited in throughput Scanning Probe Lithography (SPL) J. A. Dagata, Vol. 270, pp1625-1626, Science, 1995 Mar. 9th. 2009 Rho, Jun Suk

  6. AFM Lithography Scratching The advantages of nanoscratching for lithography - The absence of additional processing steps (i.e etching) Dec. 10th. 2008 Mar. 9th. 2009 Rho, Jun Suk

  7. Electric Field Enhanced Oxidation • Voltage bias between a sharp probe tip and sample • generates an intense electric field at the tip • Oxidization of silicon & Anodization of metals • The high field desorbs the hydrogen on the silicon • surface and enables exposed silicon to oxidize • Oxidation depends on humidity • Can achieve sub-50nm feature sizes J. A. Dagata, Vol. 270, pp1625-1626, Science, 1995 Dec. 10th. 2008 Mar. 9th. 2009 Rho, Jun Suk

  8. Scanned Probe Oxidation- Applications Fabrication of single tunneling transistor(SET) Fabrication of Si nanowire J. A. Dagata, Vol. 270, pp1625-1626, Science, 1995 Mar. 9th. 2009 Rho, Jun Suk

  9. Electric Field Enhanced Oxidation AFM anodic Oxidation (Left) AFM Nanolithography (Below) Dec. 10th. 2008 Mar. 9th. 2009 Rho, Jun Suk

  10. Parallel Field Enhanced Oxidation Dec. 10th. 2008 Mar. 9th. 2009 Rho, Jun Suk

  11. Profile vs. Resist by AFM Lithography M. Rolandi et al. NANOLETTERS. 2004Vol. 4, No. 5889-893 Mar. 9th. 2009 Rho, Jun Suk

  12. Non Contact AFM Lithography • Silicon probe tip acts as a source of electrons • The field emission current from the tip is used as the • feedback signal to control the tip sample spacing Dec. 10th. 2008 Mar. 9th. 2009 Rho, Jun Suk

  13. Pros & Cons of SPL (AFM Lithography) Pros • Making nano patterns without optical apparatus • Making arbitrary patterns by controlling AFM tips • Good linearity allowing excellent line width control • No backscattering which exists in EBL • No proximity which exists in EBL Cons • Low throughput: serial scan and low speed • Small scan area • Requires higher incident electron dose than EBL Mar. 9th. 2009 Rho, Jun Suk

  14. Scanning Probe Lithography (SPL) Atomic Force Microscopy (AFM) Scanning Tunneling Microscopy (STM) Scanning Probe Parallel Lithography (SPL Array) Dec. 10th. 2008 Mar. 9th. 2009 Rho, Jun Suk

  15. 1D tunneling Dec. 10th. 2008 Mar. 9th. 2009 Rho, Jun Suk

  16. STM Lithography • Application of voltage pulse between tip and sample • “Pushing” atoms • Advantages of STM Litho • Information storage devices • Nanometer patterning atoms M. Crommie (UC Berkley), Vol. 262, Science, 1993 Dec. 10th. 2008 Mar. 9th. 2009 Rho, Jun Suk

  17. Scanning Probe Lithography (SPL) Atomic Force Microscopy (AFM) Scanning Tunneling Microscopy (STM) Scanning Probe Parallel Lithography (SPL Array) Dec. 10th. 2008 Mar. 9th. 2009 Rho, Jun Suk

  18. Scanning Probe Arrays Lithography HensyGandjar, Yuki Takagi, Naoki Matsuzuka, YoshitadaIsono, IEEJ, 2008 Mar. 9th. 2009 Rho, Jun Suk

  19. Scanning Probe Arrays Lithography HensyGandjar, Yuki Takagi, Naoki Matsuzuka, YoshitadaIsono, IEEJ, 2008 Mar. 9th. 2009 Rho, Jun Suk

  20. Comparison Mar. 9th. 2009 Rho, Jun Suk

  21. Conclusion Although Several basic issues are still unresolved with respect to these techniques, (i.e. the details of The mechanism of ink transport in DPN are still unclear), it is very promising and developing technique. Polymer Pen Lithography SPL with NSOM SPL with SECM Self Assembly Monolayer (SAM) ETC On-wire Lithography Dec. 10th. 2008 Mar. 9th. 2009 Rho, Jun Suk

  22. Thank You ! Dec. 10th. 2008 Mar. 9th. 2009 Rho, Jun Suk

More Related