Enhancing a -Si and nc -Si Deposition Rates for Low-Cost Thin Film Solar Cells

1. Enhancing a-Si and nc-Si Deposition Rates for Low-Cost Thin Film Solar Cells Daniel C. Ralph, Cornell University, ECCS - 0335765 P. T. Hurley and R. G. Ridgeway, Air Products and Chemicals, Inc. Allentown, PA. The Penn State NNIN Site is being used to develop and validate an advanced plasma chemical vapor deposition process to increase the growth rates and reactant utilization for a-Si:Hand nc-Si thin films for solar cells. These new processes are directly compatible with manufacturing facilities for early and rapid deployment. Once developed and commercialized, these additives could be used by all thin-film Si (TF-Si) manufacturers, whose production is expected to be ~5.2 GW by 2012. If all 5.2 GW of TF-Si manufacturing were to adopt these additives and save ~$0.115 per watt, this would result in annual savings of ~$600 million per year to the photovoltaic industry. TF-Si Solar Cell Manufacturing Process New additives provide controlled bonding environment and superior a-Si:H material for solar industry νSi-H (1995 cm-1) νSi-H2 (2071 cm-1) Work performed at Penn State Nanofabrication Laboratory Wavenumber (cm-1) Penn State maintains strong partnerships to support corporate research program that would result in annual savings of ~$600 million to photovoltaic industry