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ALD work status and next plan Nov-23-2010

Detailed update on current work status, progress, challenges, and upcoming plans for Atomic Layer Deposition research program. Includes achievements, goals, and near-term requirements.

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ALD work status and next plan Nov-23-2010

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  1. ALD work status and next planNov-23-2010 Anil Mane, Qing Peng, Jeff Elam ALD Research Program, Process Technology Research Group Energy Systems Division.

  2. ALD work current status: • Two 33mm MCPs to Prof. Ossy (10/22/10) • Working MCPs (4) to Matt and presented data and testing continue • Processed 3x 33mm AAO MCPs with active area of ~1.5cm2 20µm pores form Hau • Prior to ALD coating 2 MCP has cracked and chip off • These MCPs are very fragile and got random crack during handling but active area is good • Sent for electrode coating at Fermi lab • Demonstrated 8”x8” Grid spacer coating by ALD with appropriate resistance (3M) • Demonstrated first time 8”x8” MCP coating by ANL ALD group • Processed with ALD resistive chemistry (1 ,2) and SEE ( 1, 2) • MCP sent to Prof. Ossy for electrode deposition, gain test and many more test…. • Note: these MCPs has cracked prior to deposition (during shipping from Incom to ANL)

  3. ALD Plan-1: Goal: • Mock tile we need following items to prepare: (Target date = Feb/11) • 4x pairs of 33mm MCPs with same resistance (ALD chemistry -2) • 2 pair will have MgO and other 2 pairs will have ALO SEE layer • 3x  8”x8” grid spacers coating • Resistance of grid will be depend on the MCP resistance and current flowing through circuit • 2x “George space” glass pate with 4x 33 mm holes • 10x higher resistance than MCP for charge dissipation • Ship mock tile to Prof. Ossy for testing • 2x pairs (4x  33mm MCPs) with same chemistry to Matt RGeorge >>RMCP

  4. Resistance calculations for one section: The resistance calculation will based on MCP resistance

  5. ALD Plan-2: Goal: To study simulation vs. experimental data comparison (Target date: Mid Dec/10) • 3x 33mm MCPs to Matt gain test: • Half resistive-only, half 2 nm MgO • Half resistive-only, half 20 nm MgO • Half resistive-only, half 20 nm Al2O3 • Coupons to Slade for SEE measurements: • Only resistive • 2nm MgO on resistive • 20 nm MgO on resistive • 20 nm Al2O3 on resistive • Both gain and SEE data will supply to Zeke, Valentin for simulation Resistive Layer Resistive Layer + SEE SEE layer Resistive layer Resistive layer Substrate Substrate

  6. Near term requirements: • Good 33mm MCPs (Received 11/22/10) • Good 8”x8” MCPs • Good 8”x8” Grids • Good 8”x8” George Spacers • For better electrical data: • 8”x8” MCP holder for electrode (design is given to Fermi lab) • 8”x8” Grid holder for electrode (Al plate with grid impression grove)

  7. 8”x8” Grid holder for electrode Grove in Al plate as per 8”x8” Grid dimension Push rods/screws To hold the MCP 8.5”x8.5”x10mm Al plate

  8. 8”x8” Grid holder for electrode

  9. 8”x8” Grid holder for electrode

  10. 8”x8” Grid holder for electrode Evaporation source

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