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Session 4: Using Images: Visualizing Concepts

Session 4: Using Images: Visualizing Concepts. Internet: a Source for Technical Writing. Use the Internet to : Gather information See what competitors are doing Learn how to write about your product Learn how not to write about your product.

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Session 4: Using Images: Visualizing Concepts

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  1. Session 4: Using Images: Visualizing Concepts

  2. Internet: a Source for Technical Writing Use the Internet to: • Gather information • See what competitors are doing • Learn how to write about your product • Learn how not to write about your product

  3. What do you think of the writing in the following passage? Dielectric Etch Enabler Centura The Dielectric Etch Enabler is the most integration worthy, all-in-one system for high-volume dual damascene applications. Enabler's design and operation differ dramatically from those of other etchers and are the product of extensive modeling and analysis encompassing hardware, materials, and process parameter properties and behaviors. The result is a powerfully versatile, highly controllable product able to process all advanced low-k materials with selectivity and uniformity control demanded for the 65nm node and beyond. With multiple films and integration schemes for future dual damascene applications still under evaluation by the industry, Enabler's versatility makes it the ideal next-generation etch system. Its broad processing capability derives from a unique high frequency source capable of operating in either the low dissociation, high selectivity regime needed for effective and efficient removal of the photoresist or post-etch residues and for chamber cleaning. The capability of sustaining a stable plasma over an unusually wide pressure range make it possible to perform all the steps of the dual damascene integration scheme (i.e., mask open, via, trench, PR strip and residue removal, barrier open) in one chamber with no "fluorine memory" effect or alteration of k-value. Enabler also addresses volume production requirements for accuracy and repeatability. Its superb on-wafer precision is achieved through independent control of etch rate and CD uniformities by means of the Charged Species Tuning Unit (CSTU) and the Neutral Species Tuning Unit (NSTU). The system's tuning flexibility, innovative cathode cooling design, extremely stable chamber conditions, and integrated etch rate monitor (iRM) produce excellent repeatability of on-wafer performance. Efficient plasma confinement and chamber cooling complement high purity, plasma resistant chamber materials to dramatically reduce the frequency of wet cleans. These features make the Enabler the most productive system for complex advanced dual damascene applications at significant cost and cycle time savings.

  4. What do you think of the writing in the following passage? About the Etch ProcessThe etching process removes selected areas from the surface of the wafer. "Dry" (plasma) etching is used for critical circuit-defining steps, while "wet" etching (using chemical baths) is mainly used to clean wafers. Dry etching is one of the most frequently used processes in semiconductor manufacturing. Before etching begins, a wafer is coated with photoresist and exposed to a circuit pattern during photolithography. Etching removes material only from areas dictated by the photoresist pattern. Plasma etching is performed by applying an electrical field to a gas containing some chemically reactive element, like fluorine or chlorine. The plasma releases chemically reactive ions that can remove (etch) materials very rapidly. It also gives the chemicals an electric charge, which directs them toward the wafer vertically. This allows chipmakers to achieve nearly perfect vertical etching profiles, a very important requirement for etching features on today's chip designs.

  5. 3 Points: Collect, Collect, Collect!

  6. Uses of TW materials from the Net: • Use it for background • Use it for structuring your information • Use it to help you describe features in your product that are similar to those of a competitor • Use it to define the level of documentation • Use specs and graphics • “Thou shalt not steal?” I would never steal !! Borrow, maybe!!!

  7. Use Graphics to Make a Point! • The idea comes before the graphic! • What do I need to illustrate? • Why do I need a graphic? • Which graphic will do? • Where can I find graphics? • If I can’t find it, can I make it? ?

  8. Inserting Graphics: 1. Insert  Picture  Clip Art or From File 2. Browse the Clip Art Collection

  9. or Browse Your Own Collection of Clip Art You don’t have one? Start today!!

  10. Types of Graphics • Clip Art (PP collection; Net) • Editable (.wmf) • Non-editable (.bmp, .jpg, .gif, .tif, etc.) • AutoShapes • WordArt • Photographs • Graphic output of other programs (e.g.,Visio, AutoCAD)

  11. Not all graphic files can be edited from PP.

  12. Editing: .bmp no .gif no .gif no .jpg no .tif no .wmf yes

  13. Navigating to Graphic Editing Features Draw Toolbar Format Picture Draw Menu

  14. For Next Time: • To Do: • Change the colors of the parts of the cow. • Change the direction that the cow is facing. • Change its size and proportions. • Use your edited cow either by itself or in combination with other graphic elements to illustrate: • A segment of code from one of your C++ programs, or • An aspect of a PC based product (your choice), or • Anything else that incorporates the above elements.

  15. Joint Class Assignment: ongoing • On the Internet, find a Technical White Paper on technology that interests you. • Save the link. If you have to, register with the site. You must figure out a way to download and save the white papers. • Working together, organize a library/database of technical whitepapers with a real hierarchical structure. • Write a 1 par. summary of the content and save it with the white paper. • Each week between now and the end of the semester, add at least 1 white paper to the collection. • Burn a disk for everyone in the class to be distributed last class. Good Ass-ignment!!

  16. Final Assignment: Due Last Class • On the Internet, find a Technical White Paper on a product that interests you. A competing product must be produced by an Israeli company. You are on the development team of the Israeli company. • Create a PP presentation of 6 slides only that explains the technical information contained in the White Paper. • No more than 2 of the slides may be dedicated to background information. The rest must be about the product. • You must write the text with a native English speaker who will serve as your TW. I want his name, ID, phone number, city of birth, etc. Good bye bye!

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