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工作進度 2004/09/06 張峯榮

工作進度 2004/09/06 張峯榮. 練習黃光製程 製作 LM4374 之 hall bar 樣品 量測 Close Cycle ( 跟學姊與莊武軒 ) 測試雙層光阻. 電機系黃光. 2004 年 08 月 31 日 黃光 ︰CPW Substrate︰GaAs Cleaning︰TCE→ACE→Methanol→DI-Water Spin︰AZ1500 , step1﹕6500 rpm , 5 sec step2︰7000 rpm , 40 sec Baking︰80℃ 1min

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工作進度 2004/09/06 張峯榮

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  1. 工作進度 2004/09/06 張峯榮 • 練習黃光製程 • 製作LM4374之hall bar樣品 • 量測Close Cycle (跟學姊與莊武軒) • 測試雙層光阻

  2. 電機系黃光 • 2004年08月31日 • 黃光︰CPW • Substrate︰GaAs • Cleaning︰TCE→ACE→Methanol→DI-Water • Spin︰AZ1500 , step1﹕6500 rpm , 5 sec step2︰7000 rpm , 40 sec • Baking︰80℃ 1min • Exposure︰6.5 sec ( OAI-500 ) • Development︰AZ300 20sec • Ti (500A) / Au (500A)

  3. Close Cycle • Cleaning︰TCE→ACE→Methanol→DI-Water • Spin︰AZ1500 , step1﹕6500 rpm , 5 sec step2︰7000 rpm , 20 sec • Baking︰80℃ 1min • etching:H2SO4:H2O2:DIWATER • 1 : 8 : 40 6 SEC • 點銦 • ANNEL 420。C 15mins

  4. E-Beam測試 • 2004年09月05日 • Substrate︰GaAs • Cleaning︰TCE→ACE→Methanol→DI-Water • Spin︰PMMA 6 ,3% , step1﹕5000 rpm , 5 sec step2︰5000 rpm , 25 sec • Baking︰156℃,15min • Exposure︰140μC/cm2 • Development︰(MIBK/IPA) ,75Sec (IPA) ,35Sec • Al (200A)

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