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This study focuses on the difference in resistive strip alignment between TQF1 and Tmm3 chambers, examining the impact on chamber performance when strips are displaced relative to readout (RO) strips. The chambers are divided into four regions with varying strip configurations. X-ray and MM chamber setups are manually controlled, allowing for scanning under specific conditions. The resistive strips in each region are printed differently, affecting their alignment with readout strips. Various rotational and positional shifts are applied to the resistive strips to analyze their influence on cluster size and reconstructed position. Overall, this study presents insights into the performance variations observed in the chambers under different strip alignment scenarios.
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TQF1 chamber’s difference from the usual ones • The resistive strips are NOT aligned with the read out strips. • The chamber is divided in four different regions, as seen below. • The aim is to study the chamber performance in case of displacement of Resistive strips vs RO strips (3) (4) Left Side Right Side (1) (2) HV Distribution Side
In each region, the resistive strips are printed differently. • (1) Resistive strips aligned with the read out strips • (2)Resistive strips shifted by a half pitch, w.r.t. the readout strips • (3)Resistive strips rotated by -2°, w.r.t. the read out strips • (4)Resistive strips rotated by 1°, w.r.t. the read out strips
In region (4), the resistive strips cross read out strips each 2.29 cm. In region (3), the resistive strips cross the read out strips each 1.15 cm. The angular shift in regions (3) and (4) causes the resistive strips to cross the read out strips. 1° 2°
X-Ray / MM chamber setup RO Side Chamber and X-ray movements are manually controlled with possible error in positioning of about half mm X-Ray collimator MM HV Side
TQF1 Scanning conditions • The chamber was scanned using the X-Ray gun. • To apply HV on the resistive strips and the drift, the N71A power supply was used. X-Ray gun: HV = 14.00kV Beam intensity = 3.500mA HV-resistive strips = +470/490/520V HV-drift = -300V (monitored by power supply)
TQF1_Left (Standard + 1° rot) Standard 1° rot Strip 1 cm X-Ray Y pos [cm]
TQF1_Left (Standard + 1° rot) Effect on cluster size Standard 1° rot Strip Y = 12 CL size 3.288 Y= 12.5 CL = 3.155 Y= 13 CL = 3.17 Y = 13.5 CL = 3.294 X-Ray Y pos [cm] CL size = 3.2
TQF1_right (1/2 pitch + 2° rot) Strip 0.5 cm X-Ray Y pos [cm]
Tmm3 Scanning conditions • The chamber was scanned using the X-Ray gun. • To apply HV on the resistive strips and the drift, the N71A power supply was used. X-Ray gun: HV = 14.00kV Beam intensity = 3.500mA HV-resistive strips = +510/550V HV-drift = -300V (monitored by power supply)
Tmm3 Strip X-Ray Y pos [cm]
Summary • TQF1 response with X-Ray has been studied • A small effect on reconstructed position has been observed comparing 1° rot area Vs standard area and 2° rot Vs half pitch shifted • No easy way to compare the half pitch Vs standard area. • Similar small effect has been found also on the cluster size.