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Electron Beam Lithography System HS50

Reaching sub-micron scales unachievable via laser lithography. Designed for low volume device fabrication with minimal line edge roughness. Schedule a demo!<br>

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Electron Beam Lithography System HS50

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  1. ELS-HS50 sts-elionix.com/product/els-hs50/ *Brochure will be sent to the email entered Name Email Business Consent* I am not robot* *Brochure will be sent to the email entered Name Email 1/3

  2. Business Consent* I am not robot* *Brochure will be sent to the email entered Name Email Business Consent* I am not robot* *Brochure will be sent to the email entered Name Email Business Consent* I am not robot* *Brochure will be sent to the email entered Name Email Business Consent* I am not robot* Key Features: Largest beam current – 1uA 10nm beam spot size at 100nA of beam current 20nm minimal feature size at 1nA 2/3

  3. Both single cassette or multiple cassette autoloaders are available *Brochure will be sent to the email entered Name Email Business * I am not robot* HIGHER THROUGHPUT THAN EXISTING EBL SYSTEMS Reaching sub-micron scales unachievable via laser lithography. Designed for low volume device fabrication with minimal line edge roughness. Download Brochure Inquiries 3/3

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