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Block diagram showing the major components of a typical electron beam lithography (EBL) system. PMMA fjölliða:. -. e. PMMA fjölliða:. +. -. e. PMMA fjölliða:. +. -. -. Lausn: MIBK (methyl isobutyl ketone): IPA (isopropylacohol). sameindabrot. +.
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Block diagram showing the major components of a typical electron beam lithography (EBL)system.
- e PMMAfjölliða: +
- e PMMAfjölliða: +
- - Lausn: MIBK (methyl isobutyl ketone): IPA (isopropylacohol) sameindabrot +
Micrograph of a portion of an integrated circuit fabricated by electron beam lithography. The minimum dimensions are less than 0.1 um. [Courtesy of S. Rishton and E. Ganin, IBM]