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ESH ITWG

ESH ITWG. 2001 ITRS Status Update. Junichi Aoyama - JEITA (SONY) Jim Jewett - SIA (Intel) Coleen Miller - SIA (ISMT/TI) Alain Roche - ESIA (ST Micro) Francois Tardif - ESIA (CEA-LETI). ITWG Participants.

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ESH ITWG

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  1. ESH ITWG 2001 ITRS Status Update

  2. Junichi Aoyama - JEITA (SONY) Jim Jewett - SIA (Intel) Coleen Miller - SIA (ISMT/TI) Alain Roche - ESIA (ST Micro) Francois Tardif - ESIA (CEA-LETI) ITWG Participants

  3. Improved Resource Conservation Metrics (energy, water, materials) will be tied to Manufactured Functions Concentrate on Materials (~80% of looming ESH Issues) in ITRS Reference table in Roadmap Identify Banned, Restricted and Unrestricted materials and material classes Characterization requirement for downstream residues (wastes, emissions, etc) Rating Method for ESH Properties/Risks (e.g.. – Green/Yellow/Red Flag) PROPOSED CHANGES

  4. Reset tables to reflect Lead and Brominated flame retardant restrictions Revise Material Section to better define Restrictions and Timing Issues Implement concept of Absolute, Restricted and Unrestricted Materials (specific and generic) Evaluate Need for Metrics related to Resource Conservation (Energy & Water) ASSEMBLY/PACKAGING Issues

  5. Sub-Fab Space Resource Reduction Metrics TBD FACTORY INTEGRATION Issues

  6. Realign key ESH issues with FEP, Interconnect, and Lithography Clearly identify any potential technology show-stoppers (such as PFOS, pre-cursor selection) TBD OTHER CROSS-ITWG Interactions

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