340 likes | 485 Views
Aeroflex RadHard FPGA Reliability Update 10 May 2006. Gerald Matia Manager, Analytical Services Aeroflex Colorado Springs (719) 594-8137 matia@aeroflex.com. Outline. Qualification Status HTOL / LTOL Stress Status and Results HTOL / LTOL Capacity Static Burn-in Assessment
E N D
Aeroflex RadHard FPGA Reliability Update10 May 2006 Gerald Matia Manager, Analytical Services Aeroflex Colorado Springs (719) 594-8137 matia@aeroflex.com
Outline • Qualification Status • HTOL / LTOL Stress Status and Results • HTOL / LTOL Capacity • Static Burn-in Assessment • Reliability Test Vehicles and Test Results • ViaLink Structural and Elemental Analysis Status • Wafer and Package Level ViaLink Monitors • Future Studies • Summary
RadHard Eclipse FPGA Status • QML Q qualification completed August 2005 • Standard Microcircuit Drawing (SMD): 5962R04229 • First QML FPGAs shipped September 2005 • Continuing work on QML V with DSCC and Industry Team • Coming Soon: QML Q+ • Assembled and screened using QML V like flow • For customers requiring a higher quality and reliability level
QML Qualification Compliance Matrix Aeroflex versus Aerospace Team Guidance
Qualification Lot Stress Summary • 3 Wafer lots currently in progress • HTOL • 77 units to 1000 hours (LTPD = 3) • 45 units 1000 to 6000 hours (LTPD = 5) • No ViaLink related failures to date • LTOL • 77 units to 1000 hours (LTPD = 3) • 45 units 1000 to 6000 hours (LTPD = 5) • No ViaLink related failures to date • New wafer lot on order • Delivery in August
RadHard FPGA Low Temperature Operating Life – Timeline (Multiple Lots/6000h)
RadHard FPGA High Temperature Operating Life – Timeline (Multiple Lots/6000h)
HTOL / LTOL Capacity • Implementing Capacity Increase to facilitate faster reliability data collection • Currently 44 Stress boards available • 560 socket positions • 68 additional boards on order • Increases capacity by 544 units • Delivery mid-May 2006 • HTOL Chamber • 1 additional on order • Increases capacity by 26 boards • Delivery July / August • LTOL Chambers • 2 additional on order • Increases capacity by 48 boards • Delivery July / August
Static Burn-in Evaluation • Static burn-in demonstration performed on five programmed qualification lots • This demonstration is to determine if static B/I activated any failure mechanisms not found by dynamic B/I • Programmed HTOL and LTOL lots used (Rel3 pattern) • Lots had completed 120 hours of dynamic B/I during assembly and from between 168 hours and 2000 hours of dynamic life-test stress prior to static B/I • Static stress duration: 24 hours, max. operating voltages • A minimum of 77 units / lot were stressed • A total of 385 devices • No failures found at post static B/I electrical test • 2 additional lots should complete stress and ET by 5/12/06
REL3 Design: Analysis Issues • Issues Identified with REL3 • Limited number of combinational paths (4) • Shift register chains only measure CLK-Q delays on final stage • Memory test block contains only 128x18 SRAM cell • Hardwired clock lightly loaded • Quadrant clock overloaded • No intermediate taps on delay chains
Test Lessons Learned • Intentionally overloaded clock networks (implemented for design rule validation) corrupt some test results • Race conditions can be manifested by temperature and/or stress • Results in bi-modal distributions on select AC tests • Select functional sub-blocks may be off 1 cycle on data shifts • Next generation test chip will conform to all timing related design rules • Repeatability of test results impacted by multi-temp test flow • Multi-temp flow implemented to minimize device handling on small lots • Iddq measurements very sensitive to small temperature shifts • Increasing device soak times to compensate • Improved thermocouple attachment positioning hardware
Test Lessons Learned • Need built-in oscillator monitoring on the reliability test vehicle • Used on un-programmed devices for speed binning • Include on reliability test vehicle for a “non-ViaLink” AC parameter measurements • Provides ability to distinguish between CMOS vs ViaLink induced shifts • Need Screening enhancements to un-programmed devices: • Increase fault coverage on embedded RAM blocks • Increase IDDQ tests to improve fault detection • Enhance unprogrammed I/O parametric test coverage
REL4 Design: Improvements for Delay Analysis • Enhancement implemented with REL4 • Multiplexing of combinational logic allows for 13 path measurements • Preset function on shift register allows chain of 100 register delays • 11 separate preset register chains measured • 5 additional shift registers used to analyze routing and clocking schemes • Multiple taps on chains allow for measurement of intermediate delays • Memory test evaluates 128x18, 512x4 and 1024x2 SRAM cells • Counters used to evaluate maximum frequency shift • PLL implemented
Rel3: Core IDDQ Temperature instability induced shift
Structural / Elemental Evaluation • Structural Evaluation (The Aerospace Corp. Lab) • FIB X-sections, SEM / TEM Imaging, EELS (elemental analysis) • Output – 3 dimension model (colorized)
Programmed Via Link TEM Image Aeroflex Programmed ViaLink
Wafer Level ViaLink Test Descriptions • BUVp1 = programming voltage of a single isolated ViaLink • TDVp1 = programming voltage of a single isolated ViaLink • TDVpD = programming voltage of a single ViaLink in the center of an array of an array of fuses • TDVp1K = programming voltage of ViaLinks in an array of 1,000 • TDVp25K = programming voltage of ViaLinks in an array of 25,000
Step-Stress Vialink Characterization and Screening (Packaged Units) • Step Stress to failure routine was developed to assess wafer to wafer and lot to lot programming voltage variations • Test program vectors are monitored for the cumulative number failing locations • Testing starts at 3.0 volts and increases in 100mV increments until 100% of vectors fail • The number of failing vectors relate to the number of failing ViaLinks • 3.2 million ViaLinks per device – 100% are stressed • Implemented as an lot and wafer screening tool • Remove any out of family wafers for further study • Resulted in unprogrammed devices initially tested at 3.8 volts to remove all lower end of population • All subsequent tests after the initial test are limited to 3.6 volts to insure no damage (auto-programming) of weak ViaLinks
Additional Studies • ViaLink Resistivity Measurements • Attempts to measure scribe line test structures were unsuccessful • The programming infrastructure of the device is not present • Programming was inconsistent • Resitivity measurements were not repeatable • DC stress provided inconsistent results for time to failure • Work in Progress and Plans • Isolate programmed ViaLinks in the array using FIB cuts • Probe metal on each side of ViaLink • Measure resistivity on samples pre and post stress • Sample size TBD • Results available in December
Additional Studies • Read Cycle to Disturb (failure) Testing • In the planning stage – timeline and detailed plan TBD • ViaLinks on a programmed device are only subjected to AC capactive current during operation • Create a test chip with a CMOS inverter driving capacitive loads to characterize the affect on AC delays • Use differing capacitive loads (small, medium, high) • Increase current density to perform accelerated testing • 10 years of operation at 50MHz is equivalent to 1.5 x 1016 cycles
Additional Studies (future) • Accelerated Voltage Stress • Testing for LTOL and HTOL stresses • Core max. operating voltage is 2.75 volts • Stress at up to 3.4 volts • Maintains margin to 3.6 volts maximum test voltage • Allows for chamber noise / spikes • Increases e-field stress for CMOS gate oxide defects for improved screening • Improves packaged device screening for dielectric breakdown, hot carriers and mobile ions • Testing will occur when chamber capacity allows • Activation Energies for Failure Mechanisms • Continue work on validating activation energies published by the wafer foundry and QuickLogic
Summary • Summary • No ViaLink Failures from HTOL or LTOL stress to date • 3 Wafer lots in progress heading toward 6000 hours of stress • Improvements to test program • Better test methodologies • Improved fault coverage • Lessons learned from Rel3 being implemented in new a Reliability Test Vehicle (Rel4) • Improved wafer screening and lot assessment using step stress to failure routine • Capacity Increases for additional reliability data collection • Ability to stress approximately 1000 devices simultaneously in-house • No failures found after static B/I when preceded by dynamic B/I • Future Work • Complete Long Term Reliability Studies (HTOL / LTOL stress) • Complete Structural and Compositional Analysis with Aerospace Corp. • Continue ViaLink resistivity and read cycle studies reliability studies • Complete validation of activation energies • Several others not mentioned in this update