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This chapter discusses the intuitive picture, charge modulation effects, and basic RF performance factors of SiGe transistors. It covers topics such as dynamic characteristics, linear two-port parameters, stability, base and emitter transit times, and ECL gate delay.
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SiGe Chapter5 Dynamic characteristic 5-1 Intuitive picture 5-2 Charge Modulation effects 5-3 Basic RF Performance Factors 5-4 Linear Two-Port Parameters 5-5 Stability,MAG,MSG,and Mason’s U 5-6 Base and Emitter Transit Times 5-7 ECL Gate Delay
5-1 Intuitive Si BJT: -Electron must diffusion across the base (constant doping) base transit time is significant limit cutoff frequency -Applied forward bias on EB juntion back injection of holes from B to E emitter charge storage delay time is reciprocally related to ßac SiGe HBT: -Ge-gradient-induced drift field decrease base transit time ex: 0~10% linearly graded Ge profile over 10nm base , yield 75mV/50nm=15kV/cm electric field electron saturation velocity = 1e7cm/sec -Ge-induced band offset at EB juntion exponentially enhance Jc decrease emitter charge storage delay time increase ßac
5-3 Basic RF Performance Factors For high frequencies Current density versus speed :
-low low • but Kirk effect roll off • increase collector doping decrease breakdown voltage
Base Resistance -limits transistor power gain -noise performance “circle impedance base resistance” extraction method
Power gain and Assume: 1. Large open circuit 2. 3. I(test) through small When decrease to unity
5-4 linear two-port parameters Z-parameter Y-parameter H-parameter S-parameter (voltage waves) square with power dimension
5-6 Base and Emitter Transit Times Moll-Ross transit time relation: BJT: SiGe:
Relevant approximations : not much larger than 1
in SiGe HBTs • Implications and optimization issues for • 1.the presence of Ge in base of HBT affects its frequency response through the base and emitter transit time. • depends reciprocally on the Ge grading across the base. • 3. for enhancement • ,triangular Ge profile is better than box Ge profile • ,box one is better, for • a compromise trapezoidal profile ,which generally favors both and improvement, is a logical compromise profile design point. • 4. versus power dissipation trade-off . • Ex: portable application(power minimization)