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ITRS 2003 - Environmental, Safety and Health Chapter. December 2, 2003 – HsinChu, Taiwan. Agenda. Acknowledgements 2003 Edition Highlights ESH Chemical Reference Table Changes to ESH Requirements Energy Water Plans for 2004 Update. Acknowledgement. Shinya Hashimoto – NEC Corp
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ITRS 2003 - Environmental, Safety and Health Chapter December 2, 2003 – HsinChu, Taiwan
Agenda • Acknowledgements • 2003 Edition Highlights • ESH Chemical Reference Table • Changes to ESH Requirements • Energy • Water • Plans for 2004 Update
Acknowledgement • Shinya Hashimoto – NEC Corp • Jim Jewett – Intel Corp • Shou-Nan Li – ITRI • Michael Mocella – DuPont • Coleen (Miller) Regan – ISMT • Dawn Speranza – Intel Assignee to ISMT • Walter Worth – ISMT • Technical WG Members from each Association
Chemical Restrictions Table • Ready reference for identifying chemicals with restrictions • Use • Product content • Classification of chemicals is not owned by ITRS; based on existing bans or potential restrictions • Linked from requirements in ESH and focus thrusts
Water Conservation • Rationale for Adjustments: • Values for “Net Feed Water Use” were raised, since earlier values assumed 70-80% UPW production efficiency, which is not normally the case • Water metric for equipment was per cm2 per wafer pass and referred to both CMP tools and wet benches • Values in ITRS are more representative of CMP tools • Values are expressed “per 300mm wafer”, since ITRS focuses on 300mm technology
Plans for 2004 • Update “Chemical Restrictions” table • Re-evaluate roadmap ESH metrics (realized at end of year that energy and water metrics may need further revision) • Re-map technology thrust requirements against critical ESH challenges