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Semiconductor Device Modeling and Characterization EE5342, Lecture 5-Spring 2002. Professor Ronald L. Carter ronc@uta.edu http://www.uta.edu/ronc/. Minority hole lifetimes. Taken from Shur 3 , (p.101). Minority electron lifetimes. Taken from Shur 3 , (p.101). Parameter example.
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Semiconductor Device Modeling and CharacterizationEE5342, Lecture 5-Spring 2002 Professor Ronald L. Carter ronc@uta.edu http://www.uta.edu/ronc/
Parameter example • tmin = (45 msec) 1+(7.7E-18cm3)Ni+(4.5E-36cm6)Ni2 • For Nd = 1E17cm3, tp = 25 msec • Why Nd and tp ?
Direct rec forexcess min carr • Define low-level injection as dn = dp < no, for n-type, and dn = dp < po, for p-type • The recombination rates then are R’n = R’p = dn(t)/tn0, for p-type, and R’n = R’p = dp(t)/tp0, for n-type • Where tn0 and tp0 are the minority-carrier lifetimes
S-R-H rec fordeficient min carr • If n < ni and p< pi, then the S-R-H net recomb rate becomes (p < po, n < no): U = R - G = - ni/(2t0cosh[(ET-Efi)/kT]) • And with the substitution that the gen lifetime, tg = 2t0cosh[(ET-Efi)/kT], and net gen rate U = R - G = - ni/tg • The intrinsic concentration drives the return to equilibrium
The ContinuityEquation • The chain rule for the total time derivative dn/dt (the net generation rate of electrons) gives
Poisson’sEquation • The electric field at (x,y,z) is related to the charge density r=q(Nd-Na-p-n) by the Poisson Equation:
Poisson’sEquation • For n-type material, N = (Nd - Na) > 0, no = N, and (Nd-Na+p-n)=-dn +dp +ni2/N • For p-type material, N = (Nd - Na) < 0, po = -N, and (Nd-Na+p-n) = dp-dn-ni2/N • So neglecting ni2/N, [r=(Nd-Na+p-n)]
p-type Ec Ec Ev EFn qfn= kT ln(Nd/ni) EFi Ev Energy bands forp- and n-type s/c n-type EFi qfp= kT ln(ni/Na) EFp
JunctionC (cont.) r +Qn’=qNdxn +qNd dQn’=qNddxn -xp x -xpc xn xnc Charge neutrality => Qp’ + Qn’ = 0, => Naxp = Ndxn -qNa dQp’=-qNadxp Qp’=-qNaxp
JunctionC (cont.) • The C-V relationship simplifies to
JunctionC (cont.) • If one plots [C’j]-2vs. Va Slope = -[(C’j0)2Vbi]-1 vertical axis intercept = [C’j0]-2 horizontal axis intercept = Vbi C’j-2 C’j0-2 Va Vbi
Arbitrary dopingprofile • If the net donor conc, N = N(x), then at xn, the extra charge put into the DR when Va->Va+dVa is dQ’=-qN(xn)dxn • The increase in field, dEx =-(qN/e)dxn, by Gauss’ Law (at xn, but also const). • So dVa=-(xn+xp)dEx= (W/e) dQ’ • Further, since N(xn)dxn = N(xp)dxp gives, the dC/dxn as ...
Example • An assymetrical p+ n junction has a lightly doped concentration of 1E16 and with p+ = 1E18. What is W(V=0)? Vbi=0.816 V, Neff=9.9E15, W=0.33mm • What is C’j? = 31.9 nFd/cm2 • What is LD? = 0.04 mm
Ideal JunctionTheory Assumptions • Ex = 0 in the chg neutral reg. (CNR) • MB statistics are applicable • Neglect gen/rec in depl reg (DR) • Low level injections apply so that dnp < ppo for -xpc < x < -xp, and dpn < nno for xn < x < xnc • Steady State conditions
Ideal JunctionTheory (cont.) Apply the Continuity Eqn in CNR
References • 1Device Electronics for Integrated Circuits, 2 ed., by Muller and Kamins, Wiley, New York, 1986. • 2Physics of Semiconductor Devices, by S. M. Sze, Wiley, New York, 1981. • 3 Physics of Semiconductor Devices, Shur, Prentice-Hall, 1990.