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The 2004 ITRS Assembly and Packaging Roadmap Joe Adam TWG Co-Chair. Ryo Haruta – Renesas Dan Evans – Palomar Tech Enboa Wu – ITRI/NTU Shoji Uegaki – Kyocera Kuniaki Takahashi – Toshiba Hisao Kasuga – NEC Coen Tak - Philips Mark Bird - Amkor Bill Bottoms - 3MTS
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The 2004 ITRS Assembly and Packaging Roadmap Joe Adam TWG Co-Chair
Ryo Haruta – Renesas Dan Evans – Palomar Tech Enboa Wu – ITRI/NTU Shoji Uegaki – Kyocera Kuniaki Takahashi – Toshiba Hisao Kasuga – NEC Coen Tak - Philips Mark Bird - Amkor Bill Bottoms - 3MTS Steve Adamson - Asymtec Chi Shih Chang – SMS Bill Chen – ASE Mahadevan Iyer - IME Bernd Roemer - Infineon Henry Utsunomiya – ICT Jurgen Wolf – IZM Joe Adam – Skyworks Rainer Kyburtz - ESEC Jack Fisher - IPC George Harman – NIST Chuck Woychik – Plexus Sanjay Dandia – Philips Keith Newman – Sun Key Packaging Chapter Contributors
Near Term Industry Challenges • We need to close the gap between semiconductor interconnect density and next level substrate density • Both Organic and Ceramic substrate density is improving but not as fast as silicon I/O density • Higher temperature capability to support lead free solder in high density organic substrates • Low cost embedded passives • The impact of BEOL and Cu/low K on packaging • Direct wirebond to Cu or improved barrier systems for bondable pads • Improve interfacial adhesion of dielectrics • Integrated fab/packaging process development, reliability, and test criteria to identify and resolve interaction problems early in the technology development cycle
Near Term Industry Challenges • Tools and methodologies to address chip and package co-design • More efficient mixed signal co-design and simulation for chip and package within the same environment RF requirements • More accurate thermal and mechanical simulation of complex package microstructures, including materials data • Assembly equipment productivity is not improving fast enough to meet package cost improvement requirements • Reliability degradation due to electromigration in lead free and other package metallurgies
Long Term Industry Challenges • Small high frequency, high power density, high pin count die • Very high chip I/O density which require reliable bumpless connections to meet thermal and electrical performance requirements • New devices and materials (organic, MEMS, nanostructures, optical, biological) which require new packaging technologies • System level design capability to integrate semiconductor, passive, interconnect and new device technologies in 3 dimensions • 450 mm wafer technical issues ( thinning, wafer level packaging, etc.)
Crosscut issues • BEOL and low K/Cu integration into packaging • Wafer Level packaging impact on interconnect • Thinned die issues (test, FEOL) • New device types and structures impact on packaging • Design and Simulation (SIP, RF, etc.)