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The 2003 ITRS Assembly and Packaging Roadmap Joe Adam TWG Co-Chair. Ryo Haruta – Hitachi Dan Evans – Palomar Tech Enboa Wu – ITRI Shoji Uegaki – Kyocera Kuniaki Takahashi – Toshiba Hisao Kasuga – NEC Coen Tak - Philips Mark Bird - Amkor Bill Bottoms - 3MTS Steve Adamson - Asymtec
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The 2003 ITRS Assembly and Packaging Roadmap Joe Adam TWG Co-Chair
Ryo Haruta – Hitachi Dan Evans – Palomar Tech Enboa Wu – ITRI Shoji Uegaki – Kyocera Kuniaki Takahashi – Toshiba Hisao Kasuga – NEC Coen Tak - Philips Mark Bird - Amkor Bill Bottoms - 3MTS Steve Adamson - Asymtec Ted Zarbuck - Intel Chi Shih Chang – Bill Chen – ASE Greg Hotchkiss – TI Ed Fulcher - LSI Mahadevan Iyer - IME Bernd Roemer - Infineon Henry Utsunomiya – ICT Jurgen Wolf – IZM Joe Adam – Skyworks Rainer Kyburtz - ESEC Alex Oscilowski Jack Fisher - IPC George Harmin – NIST Mike Varnou – Delphi Yuji Shirai – ASET Michio Sono - Fujitsu Key Packaging Chapter Contributors
Assembly and Packaging Major Update Issues • Product sectors changed based on new market structure • A new difficult challenge in System In Package • Three new requirement tables being added on Substrate Technology, System In Package, Materials • Cost per pin number increased in low end products • Change in the power being made from max watts to watts/cm2 • Frequency tables being split into digital and RF based on inputs from PIDS and Design TWGS • RF will be based on carrier frequency • Digital will be based on clock
New Market Sectors • Low cost/hand held/memory - <$300 consumer products • These were consolidated based on coomon market requirements • Cost performance <$3000 notebooks, desktop • High performance >$3000 workstations, servers, network switches • Harsh - Under the hood, and other hostile environment
Difficult Challenges Near Term • Tools and methodologies to address chip and package co-design • Mixed signal co-design and simulation (SI, Power, EMI) • For transient and localized hot spots - simulation of thermal mechanical stresses, thermal performance and current density in solder bumps • Improved Organic substrates • Increased wireability and dimensional control at low cost • Higher temperature stability and lower moisture absorption • TCE and Modulas better matched to low K flip chip requirements • Improved underfills for flip chip and encapsulations • Improved underfill integration, adhesion, faster cure, higher temperature • Improved encapsulation and molding materials for SIP and Wafer scale packages • Impact of Cu/low k on Packaging • Direct wire bond and UBM/bump to Cu to reduce cost • Lower TCE and modulus substrates to reduce die level stress in flip chip • Lower strength in low k which creates a weaker mechanical structure
Difficult Challenges Long Term • Package cost may exceed die cost • Present R&D investments do not address this effectively • System level view to integrate chip, package, and system design • Design will be distributed across industry specialist • Small high frequency, high power density, high pin count die • Die sizes well below 1mm with multiple watts and several hundred I/O • Increasing gap between device, package and board wiring density • Cost of high density package substrates will dominate product cost • Global interconnect shift to packaging will be limited by size of this gap
Crosscut issues • Modeling of thermal and mechanical issues at package and device level which impact interconnect, test, design, modeling groups • Stress transfer from package to device level • Handling of lower strength low k dielectric structures • Materials properties are not available for many applications • Device performance skew due to temperature differences that are driven by package design and system applications • SIP drives changes in test, reliability, and design requirements