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NanoFab Trainer Update

NanoFab Trainer Update. Nick Reeder, January 31, 2014. Updates to User Interface. Revised “Operate” dialog boxes to incorporate rate graphs. To address concern of Jamshid’s student Rajput, added code to ensure that Tutorials tab displays Introduction page on first visit. Bug Fixes.

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NanoFab Trainer Update

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  1. NanoFabTrainer Update Nick Reeder, January 31, 2014

  2. Updates to User Interface • Revised “Operate” dialog boxes to incorporate rate graphs. • To address concern of Jamshid’s student Rajput, added code to ensure that Tutorials tab displays Introduction page on first visit.

  3. Bug Fixes • Found and fixed a problem with code that adds a new layer: previously, the thickness of new layers was truncated if the layer extended beyond the top of the display window. • Found and fixed a problem with Develop code, which previously incorrectly handled unexposed positive photoresist.

  4. Lift-Off Code • To let users perform lift-off, added code that removes any isolated regions floating in air after an etch process has removed the underlying material.

  5. To-Do List • Implement look-up tables to compute deposition rates forCVDbased on user-supplied pressure & temperature. • Populate evaporation look-up tables with values. • Populate sputter look-up tables for Au, Ni, Pt, W, Si3N4, Ta2O5, TiO2, Si. • Fix expose,develop, polish code to compute depth from user-supplied values. • Continue writing bake code; need realistic values for S0 and . • In expose code, implement diffraction of UV in air and absorption within resist, with dependence on solvent content from bake code. • Fix etch code so that (for photoresist) etch rates depend on solvent content from bake code. • Fix spin-coat code so that resist does not adhere to underside of horizontal surfaces. • Write new code for • Clean • Profilometer • Write time-cost-quality code for all operations. • Write online help text. • Produce videos for Videos tab.

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