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NanoFab Simulator Update

NanoFab Simulator Update. Nick Reeder, March 30, 2012. Update to Etch Code. Etch code asks user for etchant and time, and uses etch rates from Williams’ papers to compute amount of materials to remove. For unknown rates, warns user and assumes 0.

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NanoFab Simulator Update

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  1. NanoFabSimulator Update Nick Reeder, March 30, 2012

  2. Update to Etch Code • Etch code asks user for etchant and time, and uses etch rates from Williams’ papers to compute amount of materials to remove. • For unknown rates, warns user and assumes 0. • Process is highly iterative, simulating one minute of etching at a time. Lengthy etch times take a while to execute.

  3. Questions • One-minute etch resolution okay? • Etch rate assumptions okay? • Need to distinguish materials based on method of deposition? (E.g., wafer silicon vs. sputtered vs. evaporated….) • What parameter(s) should user provide for Polish operation?

  4. Questions • Looking ahead to photolithography, how many states do we need to distinguish for photoresists? • Freshly applied • Soft-baked, unexposed • Soft-baked, exposed • Hard-baked, unexposed • Hard-baked, exposed • …?

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