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Design and Implementation of VLSI Systems (EN0160)

Design and Implementation of VLSI Systems (EN0160). Sherief Reda Division of Engineering, Brown University Spring 2007. [sources: Weste/Addison Wesley]. Last time:. Lecture 04: CMOS Gate Layout. CMOS Fabrication http://www.appliedmaterials.com/HTMAC/animated.html. Today:.

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Design and Implementation of VLSI Systems (EN0160)

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  1. Design and Implementation of VLSI Systems (EN0160) Sherief Reda Division of Engineering, Brown University Spring 2007 [sources: Weste/Addison Wesley]

  2. Last time: Lecture 04: CMOS Gate Layout • CMOS Fabricationhttp://www.appliedmaterials.com/HTMAC/animated.html • Today: • CMOS Gate Layout

  3. Summary of Terminology • body • diffusion (n/p) • source • drain • well • tap • contact • metal track • via • polysilicon gate length/width • gate oxide • channel • All these structures must obey the dimensions and separation rules dictated by the process fabrication facility

  4. Design rules change from fab to fab Fab examples: IBM, Intel, TI, TSMC, UMC, MOSIS Design rules change according to the process technology Process design rules

  5. Lambda rules • Feature Size: minimum distance between source and drain of transistor • Feature size = 2λ (@ 90nm feature size λ=45) • According to Moore’s Law, how much does the feature size scale by every ~2 years?

  6. Design rules and gate layout • Lambda rules are conservative

  7. More design rules

  8. More and more design rules

  9. Inverters with taps

  10. Layout of a 3-input NAND gate

  11. Stick diagrams • No need to be drawn to scale

  12. Pitch of routing tracks

  13. Gate area estimation

  14. Exercises 1.6, 1.8, 1.12, 1.16, 1.18 Code of ethics: You can discuss with your colleagues You cannot copy from your colleagues/web/printed material Assignments are to be done individually Cheating will not be tolerated First Assignment

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